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Method for multi-zone high-density inductively-coupled plasma generation 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/461
출원번호 US-0678065 (1996-07-10)
발명자 / 주소
  • Moslehi Mehrdad M.
출원인 / 주소
  • CVC, Inc.
대리인 / 주소
    Gray Cary Ware & Freidenrich, LLP
인용정보 피인용 횟수 : 74  인용 특허 : 0

초록 ▼

Another aspect of this invention is a hermetically-sealed inductively-coupled plasma source structure and method of fabrication which eliminates the possibility of process contamination, improves the source hardware reliability and functionality, and improves the vacuum integrity and ultimate base p

대표청구항 ▼

[ What is claimed is:] [1.] A method for producing a plasma in a plasma processing equipment having a plasma processing chamber, comprising the steps of:producing a plasma from a plasma process gas using a first inductively-coupled antenna structure and at least one additional inductively-coupled an

이 특허를 인용한 특허 (74)

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