초록 ▼

A method of calibrating a temperature measurement system including the steps of heating a first substrate having a high emissivity value to a first process temperature; while the first substrate is at the first process temperature, calibrating a first probe and a second probe to produce temperature

A method of calibrating a temperature measurement system including the steps of heating a first substrate having a high emissivity value to a first process temperature; while the first substrate is at the first process temperature, calibrating a first probe and a second probe to produce temperature indications from the first substrate that are substantially the same, the first probe having associated therewith a first effective reflectivity and the second probe having associated therewith a second effective reflectivity, the first and second effective reflectivities being different; heating a second substrate having a low emissivity value to a second process temperature, the low emissivity value being lower than the high emissivity value; with the second substrate at the second process temperature, using both the first probe and the second probe to measure the temperature of the second substrate, the first probe producing a first temperature indication and the second probe producing a second temperature indication different from the first temperature indication; measuring a sensitivity of the temperature indication produced by the first probe to changes in substrate emissivity; and by using the measured sensitivity and the first and second temperature indications, computing a correction factor for the first probe, the correction factor to be applied to subsequent temperature readings of the first probe to produce corrected temperature readings.

대표청구항 ▼

[ What is claimed is:] [1.] A method of calibrating a temperature measurement system comprising:heating a first substrate having a high emissivity value to a first process temperature;while the first substrate is at the first process temperature, calibrating a first probe and a second probe to produ

[ What is claimed is:] [1.] A method of calibrating a temperature measurement system comprising:heating a first substrate having a high emissivity value to a first process temperature;while the first substrate is at the first process temperature, calibrating a first probe and a second probe to produce temperature indications from the first substrate that are substantially the same, said first probe having associated therewith a first effective reflectivity and said second probe having associated therewith a second effective reflectivity, said first and second effective reflectivities being different;heating a second substrate having a low emissivity value to a second process temperature, said low emissivity value being lower than said high emissivity value;with the second substrate at said second process temperature, using both the first probe and the second probe to measure the temperature of the second substrate, the first probe producing a first temperature indication and the second probe producing a second temperature indication different from the first temperature indication;measuring a sensitivity of the first probe to changes in substrate emissivity; andby using said measured sensitivity and the first and second temperature indications, computing a correction factor for the first probe, said correction factor to be applied to subsequent temperature readings of the first probe to produce corrected temperature readings.