초록 ▼

The present invention also provides an apparatus for use in a laser processing process, characterized by that it is provided with an internal sample holder and a device which functions as a heating means of the sample, a window made of a material sufficiently transparent to transmit a laser beam, a

The present invention also provides an apparatus for use in a laser processing process, characterized by that it is provided with an internal sample holder and a device which functions as a heating means of the sample, a window made of a material sufficiently transparent to transmit a laser beam, a chamber comprising a vacuum evacuation device and a device for introducing a reactive gas containing an impurity element, a laser apparatus operating in a pulsed mode to irradiate a laser beam to said chamber, and a means to move said chamber synchronously with the laser irradiation.

대표청구항 ▼

[ What is claimed is:] [9.] An ion doping apparatus comprising:a chamber;means for introducing a gas containing dopant species into the chamber;means for producing a plasma of said gas;a substrate holder for holding a substrate in said chamber;doping means for introducing said dopant species from sa

[ What is claimed is:] [9.] An ion doping apparatus comprising:a chamber;means for introducing a gas containing dopant species into the chamber;means for producing a plasma of said gas;a substrate holder for holding a substrate in said chamber;doping means for introducing said dopant species from said plasma selectively into a portion of said substrate, said portion extending longitudinally in one direction on a surface of said substrate; andmeans for producing relative motion between said substrate and said doping means in a direction orthogonal to said one direction.