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Flow-stabilized wet scrubber system for treatment of process gases from semiconductor manufacturing operations 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0708256 (1996-09-06)
발명자 / 주소
  • Lane Scott
  • Shah Dinesh
  • Colman Ronald,GB2
  • Heading Liam R.,GB6
  • Simpson Eric,GBX
출원인 / 주소
  • ATMI Ecosys Corporation
대리인 / 주소
    Hultquist
인용정보 피인용 횟수 : 32  인용 특허 : 21

초록

A flow stabilization system for damping pressure variations in a process discharging an effluent gas stream, in which the process is pressure-sensitive and downstream pressure variations can adversely affect the upstream process, said system comprising a motive fluid driver constructed and arranged

대표청구항

[ What is claimed is:] [1.] A flow stabilization system for damping pressure and flow rate increases and decreases in a process discharging an effluent gas stream, in which the process is pressure-sensitive and flow rate-sensitive, and downstream pressure and flow variations can adversely affect the

이 특허에 인용된 특허 (21)

  1. Hokynar Jiri (Fraunhoferstrabe 11 8033 Martinsried DEX), Apparatus and method for treating material surfaces.
  2. Berchem Rtger (Gelsenkirchen DEX), Assembly for the control of pressure and volume flow of a flowable medium.
  3. Bartholomew Lawrence D. (Santa Cruz CA) Gralenski Nicholas M. (Aptos CA) Richie Michael A. (Santa Cruz CA) Hersh Michael L. (Boulder Creek CA), Atmospheric pressure chemical vapor deposition apparatus.
  4. Sherman Robert C. (Austin TX), Baffle/settling chamber for a chemical vapor deposition equipment.
  5. Mahawili Imad (Sunnyvale CA), Chemical vapor deposition reactor and method of operation.
  6. Sarin Michael C. (Phoenix AZ), Closed loop method and apparatus for preventing exhausted reactant gas from mixing with ambient air and enhancing repeat.
  7. Rahimzadeh Ray A. (Arlington TX), Dehumidifier system using membrane cartridge.
  8. Jain Roop C. (7875 Norcanyon Way San Diego CA 92126), Emergency scrubbing system.
  9. Nakano Tomoiku (Tokyo JPX), Exhaust apparatus for epitaxial growth system.
  10. Kakizaki Jyunichi (Fujisawa JPX) Yamaga Kenichi (Sagamihara JPX), Heat-treatment apparatus having exhaust system.
  11. Carr William J. (San Jose CA) Krummen Raymond S. (Los Gatos CA), Hydrodynamic fume scrubber.
  12. Bartholomew Lawrence D. (Santa Cruz County CA) Provancha Kenneth M. (Santa Cruz County CA) Kamian George (Santa Cruz County CA) DeDontney Jay B. (Santa Cruz County CA) McDaniel Gregory M. (Santa Cruz, Injector and method for delivering gaseous chemicals to a surface.
  13. Ewing James H. (Lexington MA), Liquid pump and vaporizer.
  14. Zajac John P. (San Jose CA), Mass flow stabilized.
  15. Robles Stuardo A. ; Pham Thanh ; Nguyen Bang C., Method and apparatus for cleaning a throttle valve.
  16. Hagberg ; Lars, Output regulation in hydraulic and hydropneumatic systems.
  17. Padden Harvey F. (5 Iron Forge South Pompton Lakes NJ 07442), Pneumatic flow control system.
  18. Johnson Noel H. (San Jose CA) Elliott Gary C. (Manteca CA), Pulsewidth modulated pressure control system for chemical vapor deposition apparatus.
  19. Kamian George D. (Santa Cruz CA), Self cleaning flow control orifice.
  20. Palmer David W. (200 Berkeley Rd. North Andover MA 01845), System for controlling flow through a process region.
  21. Mabe William J. (Thornton CO), Variable speed control for centrifugal pumps.

이 특허를 인용한 특허 (32)

  1. Naderer, James P., Air supply control device.
  2. Pack, Brian W.; Guerra, Carlos; Willis, Peter M.; Mitchell, Joel C., Analyzing system for high accuracy nitrogen determination.
  3. Li,Lixiong; Campbell,Timothy J.; Nichols, Jr.,Robert K.; Cozart,Kristopher S., Apparatus and method for continuous depyrogenation and production of sterile water for injection.
  4. Pokharna,Himanshu; Le,Phong; Nemani,Srinivas D., Apparatus for abatement of by-products generated from deposition processes and cleaning of deposition chambers.
  5. Bartholomew, Lawrence D.; Bailey, Robert J.; Park, Seung G.; Yuh, Soon K., Atmospheric pressure wafer processing reactor having an internal pressure control system and method.
  6. Stanton, Gareth David, Chemical vapour deposition apparatus.
  7. Buse, Marcel; Van Aarsen, Mark, Compressor unit including a detection device to identify non-gaseous fluid in the suction line.
  8. Eriksson, Klas Goran; Olsen, Geir Inge; Stinessen, Kjell Olav, Control of subsea compressors.
  9. Turnbull, Robert Wellesley Heston; Srivastava, Sunit, Dynamic and continuous control for pressure swing adsorption.
  10. Lee, Seung Yong, Exhaust pressure detector.
  11. Lawrence Duane Bartholomew ; Jay Brian DeDontney ; Christopher A. Peabody, Free floating shield and semiconductor processing system.
  12. Yukimasa Saito JP; Hitoshi Murata JP; Hiroyuki Yamamoto JP, Heat treatment apparatus and cleaning method of the same.
  13. Saito, Yukimasa, Heat treatment device.
  14. Waldhauer, Ann P.; Chacin, Juan M.; Burrows, Brian H., High temperature anneal with improved substrate support.
  15. Hayes, Michael W.; Holst, Mark R.; Arno, Jose I.; Tom, Glenn M., Integrated ion implant scrubber system.
  16. Michael W. Hayes ; Mark R. Holst ; Jose I. Arno, Integrated ion implant scrubber system.
  17. Rusnak, Dennis M.; Ballard, Jason; Turley, Roger S., Intelligent pump system.
  18. Wollesen Donald L., Method and apparatus for controlling the thickness of a gate oxide in a semiconductor manufacturing process.
  19. Nguyen, Tue; Nguyen, Tai Dung, Nanolayer deposition process.
  20. Ditizio, Robert Anthony; Nguyen, Tue; Nguyen, Tai Dung, Nanolayer deposition using bias power treatment.
  21. Pokharna,Himanshu; Le,Phong; Nemani,Srinivas D., Process and apparatus for abatement of by products generated from deposition processes and cleaning of deposition chambers.
  22. Ikeda, Hiroshi; Kubota, Yasuhiro; Kyotani, Takashi, Process and apparatus for treating semiconductor production exhaust gases.
  23. Blotenberg Wilfried,DEX, Process for operating a compressor with a downstream user, and unit operating according to this process.
  24. Ollivier Patrice,FRX ; Charrier Christophe,FRX ; Jouvaud Dominique,FRX, Production plant and process comprising several treatment steps.
  25. Fairbourn,David C., Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings.
  26. Fairbourn, David C., Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings.
  27. Orito, Kohichi; Honma, Manabu; Tamura, Tatsuya, Substrate process apparatus, substrate process method, and computer readable storage medium.
  28. Chyang,Chien Song, System and method for flue gas treatment.
  29. Lim Yu-il,KRX, Systems and methods for removing residue from process gases exhausted from microelectronic device fabrication processes.
  30. Kuniaki Horie JP; Masahito Abe JP; Tsutomu Nakada JP; Yuji Araki JP, Trap apparatus.
  31. Salazar Abraham J. ; Saito Kozo ; Alloo Richard P. ; Tanaka Naoji,JPX, Wet scrubber and paint spray booth including the wet scrubber.
  32. Salazar Abraham J. ; Saito Kozo ; Alloo Richard P. ; Tanaka Naoji,JPX, Wet scrubber and paint spray booth including the wet scrubber.
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