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Method for forming glass rib structures 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03B-021/00
  • C03B-019/01
  • C03B-019/09
  • C03B-023/00
출원번호 US-0820206 (1997-03-18)
발명자 / 주소
  • Carre Alain R.E.,FRX
  • Eid Bernard,FRX
  • Friske Mark S.
  • Johnson Ronald E.
  • Quinn Candace J.
  • Smith Frances M.
  • Themont Jean-Pierre,FRX
출원인 / 주소
  • Corning Incorporated
대리인 / 주소
    Carlson
인용정보 피인용 횟수 : 146  인용 특허 : 6

초록

A method and apparatus for making formed glass structures. A glass frit containing material is deposited within a recessed pattern, hardened in the recessed pattern, and transferred to a substrate. The method and apparatus of the invention are particularly useful for forming barrier rib structures f

대표청구항

[ What is claimed is:] [20.] A method of making a glass barrier rib plate for a flat panel display, comprising:contacting a formable glass, ceramic, or glass-ceramic frit containing material with an intaglio recessed pattern to thereby form said frit containing material into a shape of a desired bar

이 특허에 인용된 특허 (6)

  1. Fujii Satoru (Takatsuki JPX) Watanabe Hirotoshi (Osaka JPX), Conductive ink composition and method of forming a conductive thick film pattern.
  2. Wang Carl Baasun (Chapel Hill NC) Felten John James (Chapel Hill NC) Kanda Hiroshi (Kanagawa JPX) Tsuchiya Motohiko (Tokyo JPX), Insulator composition, green tape, and method for forming plasma display apparatus barrier-rib.
  3. Arimoto Hironobu (Hyogo JPX), Method for making a plasma display.
  4. Okazaki Satoshi (Tokyo JPX) Matsui Hiroyuki (Tokyo JPX) Takeuchi Satoshi (Tokyo JPX), Method including treatment of ink on a plate to cause hardening at other than the ink outer surface before printing.
  5. Matsuura Kiyoshige (Tokyo JPX), Plasma addressed display device.
  6. Seki Atsushi (Kanagawa JPX), Plasma discharge chamber arrangement for plasma-addressed display device.

이 특허를 인용한 특허 (146)

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