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Computer-aided engineering system for design of sequence arrays and lithographic masks 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C12Q-001/68
  • C12M-003/04
  • C12M-001/34
출원번호 US-0721689 (1996-09-27)
발명자 / 주소
  • Hubbell Earl A.
  • Morris MacDonald S.
  • Winkler James L.
출원인 / 주소
  • Affymetrix, Inc.
대리인 / 주소
    Townsend and Townsend and Crew LLPDurdik
인용정보 피인용 횟수 : 85  인용 특허 : 4

초록 ▼

An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a compute

대표청구항 ▼

[ What is claimed is:] [1.] A method of forming a lithographic mask comprising the steps of:inputting to a computer a sequence of monomer addition steps;generating a lithographic mask definition file using said sequence of monomer addition steps, said mask definition file defining a plurality of lit

이 특허에 인용된 특허 (4)

  1. Hubbell Earl A. (Mt. View CA) Morris MacDonald S. (San Jose CA) Winkler James L. (Palo Alto CA), Computer-aided engineering system for design of sequence arrays and lithographic masks.
    상세보기
  2. Pirrung Michael C. (Durham NC) Read J. Leighton (Palo Alto CA) Fodor Stephen P. A. (Palo Alto CA) Stryer Lubert (Stanford CA), Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof.
    상세보기
  3. Flamholz Alexander L. (Monsey NY) Rippstein Robert P. (Hopewell Junction NY) Vladimirsky Yuli (Chappaqua NY) Wasik Chester A. (Poughkeepsie NY), Segmented mask and exposure system for x-ray lithography.
    상세보기
  4. Ellman Jonathan A. (Berkeley CA), Solid phase and combinatorial synthesis of benzodiazepine compounds on a solid support.
    상세보기

이 특허를 인용한 특허 (85)

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