초록 ▼

This invention comprises a method to form a family of supported films film with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film depo

This invention comprises a method to form a family of supported films film with pore size in the approximate range 0.8-20 nm exhibiting highly ordered microstructures and porosity derived from an ordered micellar or liquid-crystalline organic-inorganic precursor structure that forms during film deposition. Optically transparent, 100-500-nm thick films exhibiting a unique range of microstructures and uni-modal pore sizes are formed in seconds in a continuous coating operation. Applications of these films include sensors, membranes, low dielectric constant interlayers, anti-reflective coatings, and optical hosts.

대표청구항 ▼

[ What is claimed is:] [1.] A process to form mesostructured films, comprising:a) preparing a precursor sol containing a soluble source of a metal oxide, water, an organic solvent, surfactant, and acid or base catalyst, wherein the surfactant concentration c.sub.o is much less than the critical mice

[ What is claimed is:] [1.] A process to form mesostructured films, comprising:a) preparing a precursor sol containing a soluble source of a metal oxide, water, an organic solvent, surfactant, and acid or base catalyst, wherein the surfactant concentration c.sub.o is much less than the critical micelle concentration and the surfactant is present as free surfactant; andb) depositing the precursor sol on a substrate wherein evaporation of solvent and water causes the formation of said mesostructured films on the substrate surface wherein said mesostructured films are identified by XRD peaks in the range 2.theta.=2.degree.-6.degree. hexagonal, cubic, or lamellar electron diffraction patterns.