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Apodizing filter system useful for reducing spot size in optical measurements and other applications 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01J-003/50
출원번호 US-0835533 (1997-04-08)
발명자 / 주소
  • Norton Adam E.
  • Johnson Kenneth C.
  • Carter Joseph R.
출원인 / 주소
  • KLA-Tencor Corporation
대리인 / 주소
    Majestic, Parsons, Siebert & Hsue P.C.
인용정보 피인용 횟수 : 129  인용 특허 : 6

초록

Because of diffraction effects caused by slits or apertures in optical measurement systems, the radiation energy which is directed towards a particular region on a sample will be spread over a larger area than desirable. By employing an apodizing filter in the radiation path in such system, diffract

대표청구항

[ What is claimed is:] [1.] A method for measuring a sample, including the steps of:focusing radiation from a source into a sampling beam directed at the sample;detecting radiation of the sampling beam that has been modified by a portion of the sample, said portion defining a measurement spot; andap

이 특허에 인용된 특허 (6)

  1. Westell William E. (Weston MA), Apodization filter.
  2. Piwonka-Corle Timothy R. (Portland OR) Scoffone Karen F. (Redwood City CA) Chen Xing (San Jose CA) Lacomb ; Jr. Lloyd J. (Santa Clara CA) Stehle Jean-Louis (Colombes FRX) Zahorski Dorian (Vanves FRX), Focused beam spectroscopic ellipsometry method and system.
  3. Willenborg David L. (Dublin CA) Rosencwaig Allan (Danville CA) Opsal Jon (Livermore CA), Optical measurement device with enhanced sensitivity.
  4. Summers, Mark A.; Hagen, Wilhelm F.; Boyd, Robert D., Scattering apodizer for laser beams.
  5. Spanier Richard F. (Chester NJ) Wolf Robert G. (Succasunna NJ) Loiterman Robert M. (Hackettstown NJ) Haller Mitchell E. (Hackettstown NJ), Simultaneous multiple angle/multiple wavelength ellipsometer and method.
  6. And Hideo (Tokyo JPX), Super-resolution optical element for use in image forming apparatus.

이 특허를 인용한 특허 (129)

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