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[미국특허] Process monitoring system for real time statistical process control 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06F-019/00
출원번호 US-0803353 (1997-02-20)
발명자 / 주소
  • Li Hung-Yeh,TWX
출원인 / 주소
  • Taiwan Semiconductor Manufacturing Company, Ltd., TWX
대리인 / 주소
    Saile
인용정보 피인용 횟수 : 141  인용 특허 : 7

초록

This invention describes a method to monitor process parameters from multiple process machines to provide real time statistical process control (SPC). The particular implementation was derived from ion implantation of wafers, but has wide applicability where there are a number of process machines ha

대표청구항

[ What is claimed is:] [1.] A process parameter monitoring system for real time SPC, and comprising:a) production control computer connected to wafer fabrication machinery to monitor key parameters and provide control signals,b) said production control computer containing a database for storage and

이 특허에 인용된 특허 (7) 인용/피인용 타임라인 분석

  1. Iwakiri Eiji (Hiratsuka JPX) Fukushima Shingo (Hiratsuka JPX) Takitani Yukitaka (Hiratsuka JPX), Apparatus for and method of manufacturing semiconductor wafer.
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  7. Chen James N. (Austin TX) Christiansen Niels (Austin TX) Ross Joseph C. (Georgetown TX) Rowan Albert T. (Austin TX), System and method for concurrent recording and displaying of system performance data.

이 특허를 인용한 특허 (141) 인용/피인용 타임라인 분석

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