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Apparatus for coating a moving glass substrate 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0464113 (1995-06-05)
발명자 / 주소
  • Neuman George A.
  • Sopko John F.
  • Dauson Douglas S.
출원인 / 주소
  • PPG Industries, Inc.
대리인 / 주소
    Lepiane
인용정보 피인용 횟수 : 42  인용 특허 : 20

초록

An apparatus for coating a moving substrate which provides means for directing a coating composition vapor toward a substrate surface and moving portions of the vapor in opposite directions. The apparatus of the present invention may have the exhaust means on either side of the vapor directing means

대표청구항

[ We claim:] [1.] A coating apparatus comprising:a means for directing a vapor in a first direction, said vapor directing means having a first side and an opposing second side;a first means for directing an inert gas in the first direction, the first gas directing means in a spaced facing relationsh

이 특허에 인용된 특허 (20)

  1. Proscia James W. (Dearborn MI), Anti-iridescent coatings with gradient refractive index.
  2. Terneu Robert (Thimon BEX) Thomas Jean-Francois (Ottignies BEX), Apparatus for pyrolytically forming an oxide coating on a hot glass substrate.
  3. Henery Vern A. (Pittsburgh PA), Chemical vapor deposition of tin oxide on float glass in the tin bath.
  4. Chesworth Peter (Longton ; Near Preston GB2), Coating glass.
  5. Gordon Roy G. (Cambridge MA), Coating process using alkoxy substituted silicon-bearing reactant.
  6. Gordon Roy G. (22 Highland St. Cambridge MA 02138), Deposition method for coating glass and the like.
  7. Lane Andrew P. (Westminster TX) Webb Douglas A. (Allen TX) Frederick Gene R. (Mesquite TX), Deposition of silicon-containing films using organosilicon compounds and nitrogen trifluoride.
  8. Gordon Roy G. (23 Highland St. Cambridge MA 02138), Electrically conductive, infrared reflective, transparent coatings of stannic oxide.
  9. Kawahara Hideo (Toyonaka JPX) Nagayama Hirotsugu (Nishinomiya JPX) Honda Hisao (Itami JPX), Method for making a silicon dioxide coating.
  10. Mayer Bruce E. (Soquel CA), Method for producing highly conductive and transparent films of tin and fluorine doped indium oxide by APCVD.
  11. Gordon Roy G. (22 Highland St. Cambridge MA 02138), Method of depositing electrically conductive, infra-red reflective, transparent coatings of stannic oxide.
  12. Gordon Roy G. (22 Highland St. Cambridge MA 02138), Non-iridescent glass structures.
  13. Gordon Roy G. (22 Highland St. Cambridge MA 02138), Non-iridescent glass structures.
  14. Gordon Roy G. (22 Highland St. Cambridge MA 02138), Non-iridescent glass structures.
  15. Gordon Roy G. (22 Highland St. Cambridge MA 02138), Non-iridescent glass structures.
  16. Gordon, Roy G., Non-iridescent glass structures.
  17. Proscia James W. (Dearborn MI), Step gradient anti-iridescent coatings.
  18. Proscia James W. (Dearborn MI), Step gradient anti-iridescent coatings.
  19. Hofer Peter H. (Perrysburg OH), Stripe coating on glass by chemical vapor deposition.
  20. Lindner George H. (Vlissingen NLX), Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass.

이 특허를 인용한 특허 (42)

  1. Jenson, Mark L.; Klaassen, Jody J.; Sullivan, Jim, Active wireless tagging system on peel and stick substrate.
  2. Shakespeare,Stuart, Apparatus and method for depositing material onto a substrate using a roll-to-roll mask.
  3. Lee, Sang In, Atomic layer deposition using radicals of gas mixture.
  4. Jacobs, Harlan T.; Jenson, Mark L.; Klaassen, Jody J.; Yan, Jenn-Feng, Battery-operated wireless-communication apparatus and method.
  5. Jacobs, Harlan T.; Jenson, Mark L.; Klassen, Jody J.; Yan, Jenn-Feng, Battery-operated wireless-communication apparatus and method.
  6. Jacobs,Harlan Theodore; Jenson,Mark Lynn; Klaassen,Jody Jon; Yan,Jenn Feng, Battery-operated wireless-communication apparatus and method.
  7. Ganjoo, Ashtosh; Haskins, David R.; McCamy, James W.; Nelis, Gary J.; Tausch, Peter, Coated glasses having a low sheet resistance, a smooth surface, and/or a low thermal emissivity.
  8. Jenson,Mark Lynn, Continuous processing of thin-film batteries and like devices.
  9. Lee, Sang In; Hwang, Chang Wan, Deposition of layer using depositing apparatus with reciprocating susceptor.
  10. Jenson,Mark Lynn; Klaassen,Jody Jon; Weiss,Victor Henry; Yan,Jenn Feng, Device enclosures and devices with integrated battery.
  11. Lee, Sang In, Electrode for generating plasma and plasma generator.
  12. Lee, Sang In, Electrode structure, device comprising the same and method for forming electrode structure.
  13. Lee, Sang In, Enhanced deposition of layer on substrate using radicals.
  14. Tarnowski,Dave J.; Jenson,Mark L., Layered barrier structure having one or more definable layers and method.
  15. Klaassen,Jody J., Lithium/air batteries with LiPON as separator and protective barrier and method.
  16. Klaassen,Jody J., Lithium/air batteries with LiPON as separator and protective barrier and method.
  17. Jenson, Mark L., Low-temperature fabrication of thin-film energy-storage devices.
  18. Jenson, Mark L.; Klaassen, Jody J., Method and apparatus for integrated-circuit battery devices.
  19. Jenson, Mark L.; Klaassen, Jody J., Method and apparatus for integrated-circuit battery devices.
  20. Jenson,Mark L.; Weiss,Victor H., Method and apparatus for thin-film battery having ultra-thin electrolyte.
  21. Vaartstra, Brian A., Method for forming refractory metal oxide layers with tetramethyldisiloxane.
  22. Lee, Sang In, Method for forming thin film using radicals generated by plasma.
  23. Jenson, Mark Lynn, Method of continuous processing of thin-film batteries and like devices.
  24. Lu, Songwei; McCamy, James W.; Finley, James J., Method of depositing niobium doped titania film on a substrate and the coated substrate made thereby.
  25. Nakamura, Toshihiro; Toda, Sadayuki; Koaizawa, Hisashi, Method of forming continuous thin film and linear glass substrate with thin film.
  26. McCamy, James W.; Sopko, John F., Non-orthogonal coater geometry for improved coatings on a substrate.
  27. Lozano, Wagner R., Recovery of monobutyltin trichloride.
  28. Read, John B.; Sweeney, Daniel C., Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices.
  29. Sweeney, Daniel C.; Read, John B., Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices.
  30. Jenson,Mark L.; Klaassen,Jody J.; Sullivan,Jim; Lemaire,Charles A.; Billion,Richard E., Solid state MEMS activity-activated battery device and method.
  31. Jenson, Mark L.; Klaassen, Jody J.; Sullivan, Jim; Lemaire, Charles A.; Billion, Richard E., Solid state activity-activated battery device and method.
  32. Zhu Min, Symmetrical CVD coater with lower upstream exhaust toe.
  33. Vaartstra, Brian A.; Quick, Timothy A., Systems and methods for forming tantalum oxide layers and tantalum precursor compounds.
  34. Vaartstra,Brian A.; Quick,Timothy A., Systems and methods for forming tantalum oxide layers and tantalum precursor compounds.
  35. Vaartstra,Brian A.; Quick,Timothy A., Systems and methods for forming tantalum oxide layers and tantalum precursor compounds.
  36. Klaassen, Jody J., Thin-film batteries with polymer and LiPON electrolyte layers and method.
  37. Jenson,Mark L., Thin-film battery devices and apparatus for making the same.
  38. Jenson,Mark Lynn; Weiss,Victor Henry, Thin-film battery having ultra-thin electrolyte.
  39. Jenson,Mark Lynn; Weiss,Victor Henry, Thin-film battery having ultra-thin electrolyte and associated method.
  40. Lee, Sang In, Vapor deposition reactor and method for forming thin film.
  41. Lee, Sang In, Vapor deposition reactor using plasma and method for forming thin film using the same.
  42. Bartholomew Lawrence D. ; Bailey Robert J. ; Ewald Robert A. ; Boland John T., Wafer processing reactor having a gas flow control system and method.
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