초록 ▼

A method for removing VOCs from a gas stream comprising irradiating the gas stream in intimate contact with a semiconductor catalyst under laminar flow conditions. The catalyst can be chosen from a wide range of semiconductor materials, including naturally occurring chalcopyrites, synthetic chalcopy

A method for removing VOCs from a gas stream comprising irradiating the gas stream in intimate contact with a semiconductor catalyst under laminar flow conditions. The catalyst can be chosen from a wide range of semiconductor materials, including naturally occurring chalcopyrites, synthetic chalcopyrites, CdTe, CdS, CuInSe.sub.2, CuS, FeS.sub.2, CuFeS.sub.2, Si, GaAs, GaSb, GaPS, ZnS, GaInP, and As.sub.2 S.sub.3. This process can be performed in a fluidized bed, in a tube reactor or in an irradiated reactor packed with catalyst adhering to a light conducting fibrous substrate. The method is capable of being practiced in a passive manner in a module have no moving parts and no requirement for routine maintenance or replenishment of reagents.

대표청구항 ▼

[ I claim:] [1.] A method for eliminating volatile organic carbons from a gas stream which comprises:inducing laminar flow in the gas stream, wherein inducing the laminar flow is accomplished in a plenum packed with a plurality of tubes;drying the gas stream;contacting the gas steam with a catalyst;

[ I claim:] [1.] A method for eliminating volatile organic carbons from a gas stream which comprises:inducing laminar flow in the gas stream, wherein inducing the laminar flow is accomplished in a plenum packed with a plurality of tubes;drying the gas stream;contacting the gas steam with a catalyst; andirradiating the catalyst with a source of light.