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Low temperature method of preparing GaN single crystals 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C30B-029/38
출원번호 US-0006431 (1998-01-13)
발명자 / 주소
  • DiSalvo Francis J.
  • Yamane Hisanori,JPX
  • Molstad Jay
출원인 / 주소
  • Cornell Research Foundation, Inc.
인용정보 피인용 횟수 : 139  인용 특허 : 5

초록

A low temperature method for preparing GaN single crystals for use, for example, for blue light emitting diodes and laser diodes, comprises using sodium as a flux in a reaction system containing only gallium, sodium and nitrogen, e.g., by thermally decomposing sodium azide in a closed reaction zone

대표청구항

[ What is claimed is:] [1.] A method for preparing GaN single crystals which comprises reacting gallium and nitrogen in a sodium flux in a reaction system containing only gallium, sodium, and nitrogen, optionally in the presence of a catalytic amount of an alkaline earth metal.

이 특허에 인용된 특허 (5)

  1. Nakamura Shuji (Anan JPX), Crystal growth method for gallium nitride-based compound semiconductor.
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  5. Nishizawa Junichi (Sendai JPX) Abe Hitoshi (Sendai JPX), Process for growing GaAs monocrystal film.

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