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A liquid delivery system for delivery of an initially liquid reagent in vaporized form to a chemical vapor deposition reactor arranged in vapor-receiving relationship to the liquid delivery system. The liquid delivery system includes: (a) an elongate vaporization fluid flow passage defining a longit

A liquid delivery system for delivery of an initially liquid reagent in vaporized form to a chemical vapor deposition reactor arranged in vapor-receiving relationship to the liquid delivery system. The liquid delivery system includes: (a) an elongate vaporization fluid flow passage defining a longitudinal axis and bounded by an enclosing wall to define a cross-section of the fluid flow passage transverse to the longitudinal axis; (b) a vaporization element contained within the fluid flow passage transverse to the longitudinal axis; a source reagent liquid feed passage having a terminus arranged to discharge liquid in a direction perpendicular to a facing surface of the vaporization element; (d) a heating means for heating the vaporization element to a temperature for vaporization of the liquid reagent; and (e) a manifold for flowing vapor formed by vaporization of the liquid reagent on the vaporization element from the fluid flow passage to the chemical vapor deposition reactor, in which the manifold including a diverting means to prevent non-volatile residue from flowing to the chemical vapor deposition reactor. A heater assembly may be employed for heating a component of the liquid delivery system, and the system may utilize a replaceable vaporizer cap removably engageable with the vaporization chamber.

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[ What is claimed is:] [1.] A liquid delivery system for delivery of an initially liquid reagent in vaporized form to a chemical vapor deposition reactor arranged in vapor-receiving relationship to the liquid delivery system, said liquid delivery system comprising:(a) an elongate vaporization fluid

[ What is claimed is:] [1.] A liquid delivery system for delivery of an initially liquid reagent in vaporized form to a chemical vapor deposition reactor arranged in vapor-receiving relationship to the liquid delivery system, said liquid delivery system comprising:(a) an elongate vaporization fluid flow passage defining a longitudinal axis and bounded by an enclosing wall to define a cross-section of the fluid flow passage transverse to the longitudinal axis;(b) a vaporization element with a facing surface oriented in the fluid flow passage generally transverse to the longitudinal axis;(c) a source reagent liquid feed passage having a terminus arranged to discharge liquid in a direction perpendicular to the facing surface of the vaporization element;(d) a heating means for heating the vaporization element to a temperature for vaporization of said liquid reagent; and(e) a manifold for flowing vapor formed by vaporization of said liquid reagent on the vaporization element, from the fluid flow passage to the chemical vapor deposition reactor, the manifold including a diverting means to prevent non-volatile residue formed in the vaporization of the liquid reagent from flowing to the chemical vapor deposition reactor.