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[미국특허] Image processing device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06K-007/00
  • G06K-009/00
  • G06K-009/20
  • G06K-009/40
출원번호 US-0522083 (1995-08-31)
우선권정보 JP-0239426 (1994-09-07)
발명자 / 주소
  • Otsuka Itsuro,JPX
출원인 / 주소
  • Rohm Co., Ltd., JPX
대리인 / 주소
    Fay, Sharpe, Beall, Fagan, Minnich & McKee
인용정보 피인용 횟수 : 35  인용 특허 : 7

초록

An image processing device is provided with a scanning means which performs subscanning by a pitch corresponding to a width covering a number of pixels less than the number of detectable pixels by a one dimensional image sensor by two or more pixels so as to overlap two or more line pixels. An edge

대표청구항

[ I claim:] [1.] An image processing device in which the arranging direction of light receiving portions or light receiving elements in an image sensor arranged in correspondence with pixels to be detected is determined to correspond to the subscanning direction, through the main scanning by said im

이 특허에 인용된 특허 (7) 인용/피인용 타임라인 분석

  1. Otsuka Itsuro (Kyoto JPX), Bi-level halftone processing circuit and image processing apparatus using the same.
  2. Ishida Tokuji (Daito JPX) Hamada Masataka (Osaka JPX), Focus detecting device for use with cameras.
  3. Udagawa Yutaka (Machida JPX) Otsubo Toshihiko (Yokohama JPX) Nishio Masahiro (Tokyo JPX), Image processing system in which overlapping image data is deleted from a frame memory.
  4. Arimoto Shinobu (Tokyo JPX), Image signal processing apparatus with edge emphasis and variable magnification.
  5. Hino Makoto (Tokyo JPX) Takase Osamu (Yokohama JPX), Image signal processing method and apparatus with correction for a secondary light source effect.
  6. Takagi Shinji (Kawasaki JPX) Tanaka Hideki (Yokohama JPX) Kimura Tatsuo (Kawasaki JPX) Ashiwa Jun (Yokohama JPX), Multi-drop ink-jet recording method with compensation for image density non-uniformities.
  7. Blazek Henry (Brookfield CT), Optical inspection system for printing flaw detection.

이 특허를 인용한 특허 (35) 인용/피인용 타임라인 분석

  1. Lin, Tao, Color interpolator and horizontal/vertical edge enhancer using two line buffer and alternating even/odd filters for digital camera.
  2. Lin, Tao, Color interpolator and horizontal/vertical edge enhancer using two line buffer and alternating even/odd filters for digital camera.
  3. Safai, Mohammad A., Digital image processor for a digital camera.
  4. Safai, Mohammad A., Digital image processor for a digital camera.
  5. Safai, Mohammad A., Digital image processor for a digital camera.
  6. Safai,Mohammad A., Digital image processor for a digital camera.
  7. Naoya Nakanishi JP, Image conversion based on edges.
  8. Nakatani, Akihiko; Yamamoto, Tadashi; Kaneko, Kiyoshi, Image processing apparatus and image processing method.
  9. Lin, Tao; Yu, Vincent Chor-Fung; Tang, Tianhua; Hwang, Beong-Kwon, Merged pipeline for color interpolation and edge enhancement of digital images.
  10. Lin, Tao; Yu, Vincent Chor-Fung; Tang, Tianhua; Hwang, Beong-Kwon, Merged pipeline for color interpolation and edge enhancement of digital images.
  11. Fielden, John; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Nikoonahad, Mehrdad; Wack, Dan, Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process.
  12. Nikoonahad, Mehrdad; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Wack, Dan; Fielden, John, Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation.
  13. Fielden,John; Levy,Ady; Brown,Kyle A.; Bultman,Gary; Nikoonahad,Mehrdad; Wack,Dan, Methods and systems for determining a composition and a thickness of a specimen.
  14. Wack, Dan; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Nikoonahad, Mehrdad; Fielden, John, Methods and systems for determining a critical dimension an a presence of defects on a specimen.
  15. Nikoonahad, Mehrdad; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Wack, Dan; Fielden, John, Methods and systems for determining a critical dimension and a thin film characteristic of a specimen.
  16. Levy, Ady; Brown, Kyle A.; Bultman, Gary; Nikoonahad, Mehrdad; Wack, Dan; Fielden, John, Methods and systems for determining a critical dimension and overlay of a specimen.
  17. Levy, Ady; Brown, Kyle A.; Smedt, Rodney; Bultman, Gary; Nikoonahad, Mehrdad; Wack, Dan; Fielden, John; Abdul-Halim, Ibrahim, Methods and systems for determining a critical dimension and overlay of a specimen.
  18. Levy, Ady; Brown, Kyle A.; Smedt, Rodney; Bultman, Gary; Nikoonahad, Mehrdad; Wack, Dan; Fielden, John; Abdul-Halim, Ibrahim, Methods and systems for determining a critical dimension and overlay of a specimen.
  19. Levy, Ady; Brown, Kyle A.; Smedt, Rodney; Bultman, Gary; Nikoonahad, Mehrdad; Wack, Dan; Fielden, John; Abdulhalim, Ibrahim, Methods and systems for determining a critical dimension and overlay of a specimen.
  20. Nikoonahad, Mehrdad; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Wack, Dan; Fielden, John, Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimen.
  21. Bultman,Gary; Levy,Ady; Brown,Kyle A.; Nikoonahad,Mehrdad; Wack,Dan; Fielden,John, Methods and systems for determining a presence of defects and a thin film characteristic of a specimen.
  22. Bultman, Gary; Levy, Ady; Brown, Kyle A.; Nikoonahad, Mehrdad; Wack, Dan; Fielden, John, Methods and systems for determining a presence of macro and micro defects on a specimen.
  23. Bultman,Gary; Levy,Ady; Brown,Kyle A.; Nikoonahad,Mehrdad; Wack,Dan; Fielden,John, Methods and systems for determining a presence of macro and micro defects on a specimen.
  24. Wack, Dan; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Nikoonahad, Mehrdad; Fielden, John, Methods and systems for determining a presence of macro defects and overlay of a specimen.
  25. Wack, Dan; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Nikoonahad, Mehrdad; Fielden, John, Methods and systems for determining a presence of macro defects and overlay of a specimen.
  26. Levy, Ady; Brown, Kyle A.; Bultman, Gary; Nikoonahad, Mehrdad; Wack, Dan; Fielden, John, Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process.
  27. Wack,Dan; Levy,Ady; Brown,Kyle A.; Bultman,Gary; Nikoonahad,Mehrdad; Fielden,John, Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography.
  28. Fielden, John; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Nikoonahad, Mehrdad; Wack, Dan, Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen.
  29. Fielden,John; Levy,Ady; Brown,Kyle A.; Bultman,Gary; Nikoonahad,Mehrdad; Wack,Dan, Methods and systems for determining a thin film characteristic and an electrical property of a specimen.
  30. Wack,Dan; Levy,Ady; Brown,Kyle A.; Bultman,Gary; Nikoonahad,Mehrdad; Fielden,John, Methods and systems for determining an adhesion characteristic and a thickness of a specimen.
  31. Nikoonahad, Mehrdad; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Wack, Dan; Fielden, John, Methods and systems for determining an implant characteristic and a presence of defects on a specimen.
  32. Nikoonahad, Mehrdad; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Wack, Dan; Fielden, John, Methods and systems for determining at least four properties of a specimen.
  33. Wack, Dan; Levy, Ady; Brown, Kyle A.; Smedt, Rodney C.; Bultman, Gary; Nikoonahad, Mehrdad; Fielden, John, Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen.
  34. Fielden, John; Levy, Ady; Brown, Kyle A.; Bultman, Gary; Nikoonahad, Mehrdad; Wack, Dan, Methods and systems for determining flatness, a presence of defects, and a thin film characteristic of a specimen.
  35. Levy,Ady; Brown,Kyle A.; Nikoonahad,Mehrdad; Bultman,Gary; Wack,Dan; Fielden,John, Methods and systems for determining overlay and flatness of a specimen.

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