[특허]Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens

[미국특허] Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G01B-009/02
출원번호	US-0899688 (1997-07-24)
우선권정보	JP-0215400 (1996-07-25)
발명자 / 주소	Suzuki Jun,JPX Gemma Takashi,JPX Ichihara Yutaka,JPX
출원인 / 주소	Nikon Corporation, JPX
대리인 / 주소	Klarquist Sparkman Campbell Leigh & Whinston, LLP
인용정보	피인용 횟수 : 49 인용 특허 : 2

초록 ▼

Apparatus and methods are disclosed for measuring wavefront aberrations microlithography projection lenses such as i-line or excimer laser projection lenses. The apparatus comprises an argon-ion laser irradiating a Fizeau surface that reflects reference light and transmits test light. The test light is reflected by a spherical reflecting surface to pass twice through the test lens and the Fizeau surface, to interfere with the reference light. A piezoelectric element changes the fringes slightly. An image-pickup device receives the interference fringes and outputs data to a processor that calculates corresponding wavefront aberrations of the test lens. For testing an i-line lens, the argon laser can be a single-mode, 363.8 nm laser. For testing a lens used with a KrF excimer laser, the argon laser can emit second-harmonic light at 248.25 nm.

대표청구항 ▼

[ What is claimed is:] [1.] A wavefront aberration-measuring apparatus for measuring wavefront aberrations of an exposure projection lens for an exposure device for microlithography, the exposure projection lens being selected as a test lens to be observed with the apparatus, the apparatus comprising:(a) a reference surface,(b) a laser light source arranged to provide reference light to the reference surface and test light to the test lens;(c) a spherical reflective surface arranged to reflect the test light, that has passed through the test lens in a first direction back through the test lens in a second direction, opposite the first direction;(d) an image-pickup device arranged to receive reference light from the reference surface and test light from the test lens, returning from the test lens in the second direction, such that interference fringes are formed by the reference light and test light at the image-pickup device and are sensed by the image-pickup device;(e) an interference-fringe scanner arranged to scan the interference fringes sensed by the image-pickup device by altering a phase relationship between the test light and the reference light at the image-pickup device; and(f) a processor arranged to receive information from the image-pickup device to calculate wavefront aberrations of the test lens based on the scanned interference fringes sensed by the image-pickup device.

이 특허에 인용된 특허 (2) 인용/피인용 타임라인 분석

Shibuya Masato (Saitama-ken JPX) Ichihara Yutaka (Kanagawa-ken JPX) Gemma Takashi (Tokyo-to JPX) Toyonaga Shuji (Kanagawa-ken JPX) Inada Keiji (Chiba-ken JPX), Interferometric surface profiler with an alignment optical member.
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Burge James H. ; Anderson David S., System and method for interferometric measurement of aspheric surfaces utilizing test plate provided with computer-gene.
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이 특허를 인용한 특허 (49) 인용/피인용 타임라인 분석

Nakauchi,Akihiro, Aberration measuring apparatus for an optical system utilizing soft x-rays.
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King, William B.; Chen, Chungte W.; Byren, Robert W.; McKearn, Chaunchy F., Beam director and control system for a high energy laser within a conformal window.
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De Groot, Peter; Davidson, Mark; Liesener, Jan; De Lega, Xavier Colonna; Deck, Leslie L., Compound reference interferometer.
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Ohsaki Yoshinori,JPX, Exposure apparatus.
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Ouchi, Chidane, Exposure apparatus and device manufacturing method using the same.
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Nakauchi, Akihiro, Exposure apparatus mounted with measuring apparatus.
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Kakuchi, Osamu; Murakami, Eiichi, Exposure apparatus with interferometer.
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Kakuchi,Osamu; Murakami,Eiichi, Exposure apparatus with interferometer.
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Kakuchi,Osamu; Murakami,Eiichi, Exposure apparatus with interferometer.
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Ishikawa, Jun, Exposure apparatus, exposure method, and device manufacturing method.
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Matsuyama, Tomoyuki, Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus.
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Deck, Leslie L.; De Groot, Peter; Davidson, Mark; Liesener, Jan; De Lega, Xavier Colonna, Fiber-based interferometer system for monitoring an imaging interferometer.
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Tsukakoshi,Toshio, Image forming characteristics measuring method, image forming characteristics adjusting method, exposure method and apparatus, program and storage medium, and device manufacturing method.
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Shimizu,Yasuo; Hirukawa,Shigeru; Suzuki,Kousuke; Matsuyama,Tomoyuki, Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium.
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Shimizu,Yasuo; Hirukawa,Shigeru; Suzuki,Kousuke; Matsuyama,Tomoyuki, Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium.
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Shimizu,Yasuo; Hirukawa,Shigeru; Suzuki,Kousuke; Matsuyama,Tomoyuki, Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium.
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Matsuyama,Tomoyuki, Imaging optical system evaluation method, imaging optical system adjustment method, exposure apparatus and exposure method.
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Richard D. Holscher, In-line method of measuring effective three-leaf aberration coefficient of lithography projection systems.
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Ouchi, Chidane, Interference system and semiconductor exposure apparatus having the same.
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Ouchi, Chidane, Interference system and semiconductor exposure apparatus having the same.
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Suzuki,Akiyoshi; Sekine,Yoshiyuki, Interferometer and interferance measurement method.
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Ichihara, Hiroshi, Interferometer system and method of manufacturing projection optical system using same.
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De Groot, Peter; Deck, Leslie L.; Zanoni, Carl, Interferometer system for monitoring an object.
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Groot, Peter de; Deck, Leslie L.; Zanoni, Carl A., Interferometer system for monitoring an object.
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de Groot, Peter; Deck, Leslie L.; Zanoni, Carl, Interferometer system for monitoring an object.
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Hiroshi Ichihara JP; Takashi Gemma JP; Shigeru Nakayama JP; Hajime Ichikawa JP, Interferometer that measures aspherical surfaces.
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Liesener, Jan; Davidson, Mark; De Groot, Peter J; Colonna De Lega, Xavier; Deck, Leslie L., Interferometric systems and methods featuring spectral analysis of unevenly sampled data.
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Van De Kerkhof, Marcus Adrianus; Thomas, Ivo Adam Johannes, Lithographic apparatus and method.
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Baselmans, Johannes Jacobus Matheus; Moers, Marco Hugo Petrus; Van Der Laan, Hans; Willekers, Robert Wilhelm; De Boeij, Wilhelmus Petrus; Van De Kerkhof, Marcus Adrianus, Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations.
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Liesener, Jan; Davidson, Mark; de Groot, Peter J.; Colonna de Lega, Xavier M.; Deck, Leslie L., Low coherence interferometry with scan error correction.
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Hayashi, Naoto; Kuramoto, Yoshiyuki, Measuring apparatus and measuring method.
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Kuramoto, Yoshiyuki, Measuring system for measuring performance of imaging optical system.
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Ozawa, Toshihiko, Method for evaluating image formation performance.
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Ichihara Hiroshi,JPX, Method of manufacturing an optical system.
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Yang, Juping; Fujii, Toru; Inoue, Fuyuhiko, Position detecting method and unit, optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method.
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Fujishima, Youhei; Ikezawa, Hironori; Ozawa, Toshihiko; Omura, Yasuhiro; Suzuki, Takeshi, Production method of projection optical system.
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Murakami, Eiichi; Kakuchi, Osamu, Projection exposure apparatus.
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Freimann,Rolf; Wagemann,Ulrich, Projection exposure system and method of manufacturing a miniaturized device.
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Freimann, Rolf; Philipps, Jens, Projection illumination system.
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Hirukawa,Shigeru; Nakashima,Toshiharu; Higashi,Kenji, Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method.
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Hirukawa,Shigeru; Nakashima,Toshiharu; Higashi,Kenji, Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method.
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Davidson, Mark; Liesener, Jan; De Groot, Peter; Colonna De Lega, Xavier; Deck, Leslie L., Scan error correction in low coherence scanning interferometry.
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Hamatani, Masato; Tsukakoshi, Toshio, Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system.
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Mizuno, Yasushi, Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing micro device.
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Kato, Seima, Wavefront aberration measuring method, wavefront aberration measuring apparatus and optical element manufacturing method.
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[미국특허] Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens 원문보기

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[미국특허] Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens 원문보기

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