초록 ▼

The apparatus includes a gas diffuser plate having an integral heat pipe for accurately controlling the temperature of the diffuser plate during CVD processing to prevent unwanted tungsten (or other material) deposition on the diffuser plate. The apparatus is also useful as an RF plasma cleaning dev

The apparatus includes a gas diffuser plate having an integral heat pipe for accurately controlling the temperature of the diffuser plate during CVD processing to prevent unwanted tungsten (or other material) deposition on the diffuser plate. The apparatus is also useful as an RF plasma cleaning device in which the diffuser plate acts as an RF electrode, the heat pipe tube acts as an RF input lead, and the apparatus further includes a connector to an RF power source. Additionally, in combination, the heat pipe-cooled gas diffuser plate and RF electrode may be used advantageously in plasma enhanced chemical vapor deposition (PECVD).

대표청구항 ▼

[ What is claimed is:] [1.] RF plasma cleaning apparatus for a CVD reactor, comprising:an RF electrode in the form of a gas diffuser plate;an RF input lead in the form of an upstanding tube mounted to said RF electrode;means for connecting said RF input lead to an RF power source;at least one isolat

[ What is claimed is:] [1.] RF plasma cleaning apparatus for a CVD reactor, comprising:an RF electrode in the form of a gas diffuser plate;an RF input lead in the form of an upstanding tube mounted to said RF electrode;means for connecting said RF input lead to an RF power source;at least one isolator tube surrounding at least a portion of said RF input lead to prevent at least some RF plasma formation during RF plasma cleaning, said isolator tube also for preventing electrical shorting; andmeans for mounting said RF electrode to a housing in a CVD reactor, said means for mounting includes a quartz ring for insulating said RF electrode from said housing in a CVD reactor when said RF electrode is mounted therein.