초록 ▼

A vacuum loadlock is provided for housing a pair of wafers in proper alignment for concurrent processing. In one embodiment, a single chamber loadlock is provided with a gas diffuser disposed therein to decrease venting times within the loadlock. In another embodiment, a dual chamber loadlock is pro

A vacuum loadlock is provided for housing a pair of wafers in proper alignment for concurrent processing. In one embodiment, a single chamber loadlock is provided with a gas diffuser disposed therein to decrease venting times within the loadlock. In another embodiment, a dual chamber loadlock is provided having first and second isolatable regions disposed adjacent a transfer region to increase throughput of the system.

대표청구항 ▼

[ What is claimed is:] [1.] An apparatus for loading wafers into a processing system, comprising:(a) a chamber disposed adjacent to the processing system, the chamber comprising:(i) an enclosure;(ii) a transfer region which communicates between the enclosure and the processing system through an aper

[ What is claimed is:] [1.] An apparatus for loading wafers into a processing system, comprising:(a) a chamber disposed adjacent to the processing system, the chamber comprising:(i) an enclosure;(ii) a transfer region which communicates between the enclosure and the processing system through an aperture formed in a sidewall of the chamber;(iii) a first and second loading/unloading port formed in the sidewall of the chamber; and(iv) one or more exhaust ports;(b) a first and a second isolatable compartment movably disposed in the chamber, each compartment positionable in communication with the aperture while the other compartment is in communication with one of the loading/unloading ports, each compartment comprising:(i) a top platform;(ii) a bottom platform substantially parallel to the top platform; and(iii) a support member interposed between the top platform and the bottom platform;(c) one or more actuators coupled to the first and second compartments to provide movement of the first and second compartments through the chamber; and(d) one or more exhaust pumps connected to the one or more exhaust ports for adjusting a pressure condition in the first and second isolatable compartments.