$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

[미국특허] Hartmann-type optical wavefront sensor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01J-001/00
  • G01J-001/20
출원번호 US-0984751 (1997-12-04)
발명자 / 주소
  • DeLong Raymond K.
  • Hutchin Richard A.
출원인 / 주소
  • TRW Inc.
대리인 / 주소
    Yatsko
인용정보 피인용 횟수 : 37  인용 특허 : 2

초록

An optical wavefront sensor for measuring phase tilt in two dimensions across the cross section of a beam (14), using only a single lenslet array (26) and a single camera sensor array (28). The rectangular lenslet array (26) is oriented at 45 degrees to first and second orthogonal sets of axes defin

대표청구항

[ What is claimed is:] [1.] A wavefront sensor for use in measuring local phase tilt in two dimensions over an optical beam cross section, along first and second orthogonal sets of grid lines intersecting at points of interest corresponding to positions of optical device actuators, the wavefront sen

이 특허에 인용된 특허 (2) 인용/피인용 타임라인 분석

  1. Feinleib Julius M. (Cambridge MA), Sensor system for detecting wavefront distortion in a return beam of light.
  2. Zmek William (Naugatuck CT), Wavefront sensor having a lenslet array as a null corrector.

이 특허를 인용한 특허 (37) 인용/피인용 타임라인 분석

  1. Takeuchi, Hitoshi, ABERRATION MEASURING APPARATUS, ABERRATION MEASURING METHOD, PROJECTION EXPOSURE APPARATUS HAVING THE SAME MEASURING APPARATUS, DEVICE MANUFACTURING METHOD USING THE SAME MEASURING METHOD, AND EXPOSU.
  2. Praus, II, Robert W.; Eastman, Daniel, Adaptive dynamic range wavefront sensor.
  3. Ai, Chia-Yu, Apparatus and method for measuring a wavefront using a screen with apertures adjacent to a multi-lens array.
  4. Cheung, Ken C. K.; Hugo, Ronald J., Array of lateral effect detectors for high-speed wavefront sensing and other applications.
  5. Haugen, Paul R.; Fishbaine, David; Rudd, Eric P.; Kranz, David M.; Haugen, Carl E.; Reinhardt, Adam, Automated system with improved height sensing.
  6. King, William B.; Chen, Chungte W.; Byren, Robert W.; McKearn, Chaunchy F., Beam director and control system for a high energy laser within a conformal window.
  7. Della Vecchia,Michael A.; Donoso,Larry; Vorontsov,Mikhail A., Clarifying an image of an object to perform a procedure on the object.
  8. Smith,Mark Anderson, Closed loop compensation system and method for a deformable mirror.
  9. Phillips,Alton; Sogard,Michael, Deformable mirror actuation system.
  10. Watson, Douglas C., Deformable mirror with passive and active actuators.
  11. Wirth, Allan, Dispersed Hartmann sensor and method for mirror segment alignment and phasing.
  12. Ishikawa, Jun, Exposure apparatus, exposure method, and device manufacturing method.
  13. Campbell, Charles E., Eye refractor with active mirror wavefront sensor.
  14. DellaVecchia, Michael A.; Donoso, Larry; Vorontsov, Mikhail A.; Cathcart, Gary; Beresnev, Leonid I.; Banta, Matt, High-resolution retina imaging and eye aberration diagnostics using stochastic parallel perturbation gradient descent optimization adaptive optics.
  15. DellaVecchia, Michael A.; Donoso, Larry; Vorontsov, Mikhail A.; Cathcart, Gary; Beresnev, Leonid I.; Banta, Matt, High-resolution retina imaging and eye aberration diagnostics using stochastic parallel perturbation gradient descent optimization adaptive optics.
  16. Andersen,Geoff P.; Reibel,Randy, Holographic wavefront sensor.
  17. Roy E. Williams ; James F. Freeman ; Jerre M. Freeman, Laser eye surgery system using wavefront sensor analysis to control digital micromirror device (DMD) mirror patterns.
  18. Oberdoerster, Thomas, Method and apparatus for measuring the shape of a wave-front of an optical radiation field.
  19. Wirth, Allan, Method and apparatus for wavefront measurement that resolves the 2-π ambiguity in such measurement and adaptive optics systems utilizing same.
  20. DellaVecchia, Michael A.; Donoso, Larry, Method for optically scanning objects.
  21. Donoso, Larry; DellaVecchia, Michael, Method for selecting images.
  22. Stephen A. Burns ; Robert H. Webb, Methods and apparatus for measurement and correction of optical aberration.
  23. Millerd James E. ; Brock Neal J., Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry.
  24. Ai, Chia-Yu; Asami, Takeshi, Multi-lens array of a wavefront sensor for reducing optical interference and method thereof.
  25. Wirth,Allan, Optical instrument employing a wavefront sensor capable of coarse and fine phase measurement capabilities during first and second modes of operation.
  26. Gross, Erik; Campbell, Charles, Optical surface shape determination by mapping a lenslet array spot pattern to a spatial frequency space.
  27. Gross, Erik; Campbell, Charles, Optical surface shape determination by mapping a lenslet array spot pattern to spatial frequency space.
  28. Li, Xiang; Zhao, Liping; Fang, Zhong Ping; Anand, Krishna Asundi; Ong, Lin Seng; Rinov, Herawan, Optical wavefront sensor and optical wavefront sensing method.
  29. Della Vecchia,Michael A.; Donoso,Larry; Vorontsov,Mikhail A., Optimizing the properties of electromagnetic energy in a medium using stochastic parallel perturbation gradient descent optimization adaptive optics.
  30. Mertz, Jerome Charles; Chu, Kengyeh Ken; Parthasarathy, Ashwin, Partitioned aperture wavefront imaging method and system.
  31. Yang, Juping; Fujii, Toru; Inoue, Fuyuhiko, Position detecting method and unit, optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method.
  32. Inoue, Fuyuhiko, Position detecting method optical characteristic measuring method and unit, exposure apparatus, and device manufacturing method.
  33. Sweatt,William C.; Vawter,G. Allen, Relaying an optical wavefront.
  34. Gross, Erik; Campbell, Charles, Spatial frequency wavefront sensor system and method.
  35. Daniel R. Neal ; Justin D. Mansell, Sub-lens spatial resolution Shack-Hartmann wavefront sensing.
  36. Mizuno, Yasushi, Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing micro device.
  37. Wirth,Allan; Jankevics,Andrew, Wavefront sensing system employing active updating of reference positions and subaperture locations on wavefront sensor.

활용도 분석정보

상세보기
다운로드
내보내기

활용도 Top5 특허

해당 특허가 속한 카테고리에서 활용도가 높은 상위 5개 콘텐츠를 보여줍니다.
더보기 버튼을 클릭하시면 더 많은 관련자료를 살펴볼 수 있습니다.

섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로