[특허]Surface modification using an atmospheric pressure glow discharge plasma source

[미국특허] Surface modification using an atmospheric pressure glow discharge plasma source 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B44C-001/22 C03C-015/00 C03C-025/06
출원번호	US-0632254 (1996-04-15)
발명자 / 주소	Li Kin Tanielian Minas
출원인 / 주소	The Boeing Company
대리인 / 주소	Gardner
인용정보	피인용 횟수 : 27 인용 특허 : 9

초록 ▼

A method for producing stable atmospheric pressure glow discharge plasmas using RF excitation and the use of said plasmas for modifying the surface layer of materials. The plasma generated by this process and its surface modification capability depend on the type of gases used and their chemical reactivity. These plasmas can be used for a variety of applications, including etching of organic material from the surface layer of inorganic substrates, as an environmentally benign alternative to industrial cleaning operations which currently employ solvents and degreasers, as a method of stripping paint from surfaces, for the surface modification of composites prior to adhesive bonding operations, for use as a localized etcher of electronic boards and assemblies and in microelectronic fabrication, and for the sterilization of tools used in medical applications.

대표청구항 ▼

[ What is claimed:] [2.] A method for modifying a surface comprising the steps of:generating an atmospheric pressure r.f. plasma of oxygen/inert gas mixtures having a temperature of less than 100 degrees C.;exposing the surface with said atmospheric pressure plasma having a temperature of less than

이 특허에 인용된 특허 (9) 인용/피인용 타임라인 분석

Moulton Kern A. (Livermore CA) Campbell Bryant A. (Los Gatos CA) Caputo Ross A. (Long Grove IL), Flash sterilization with plasma.
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Lemnios Zachary J. (Bowie MD) Kim He B. (Pasadena MD), Ion implant mask and cap for gallium arsenide structures.
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Sindzingre Thierry (Cachan FRX) Mellul Sylvie (L\Hay Les Roses FRX) Duchateau Eric (Versailles FRX), Method and apparatus for dry process fluxing.
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Kook Taeho (Lower Macungie Township ; Lehigh County PA) Kornblit Avinoam (Highland Park NJ) Olasupo Kolawole R. (Kutztown PA), Method for integrated circuit fabrication including linewidth control during etching.
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Minaee Behrooz (Campbell CA), Photoresist stripping apparatus using microwave pumped ultraviolet lamp.
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Koinuma Hideomi (Tokyo JPX) Yamazaki Shunpei (Tokyo JPX) Hayashi Shigenori (Kanagawa JPX), Plasma generating device and method of plasma processing.
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Jacob Adir (23 Juniper La. Framingham MA 01701), Process for dry sterilization of medical devices and materials.
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Gut Boucher Raymond M. (New York NY), Seeded gas plasma sterilization method.
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Moss Mary G. (Rolla MO) Brewer Terry L. (Rolla MO) Flaim Tony D. (Rolla MO), Soluble conducting polymers and their use in manufacturing electronic devices.
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이 특허를 인용한 특허 (27) 인용/피인용 타임라인 분석

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Dong,Chun Christine; McDermott,Wayne Thomas; Patrick,Richard E.; Schwarz,Alexander, Apparatus and method for removal of surface oxides via fluxless technique electron attachment and remote ion generation.
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Dong, Chun Christine; McDermott, Wayne Thomas; Patrick, Richard E.; Schwarz, Alexander, Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation.
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Dong,Chun Christine; McDermott,Wayne Thomas; Patrick,Richard E.; Schwarz,Alexander, Apparatus and method for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation.
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Dong, Chun Christine; McDermott, Wayne Thomas; Patrick, Richard E.; Schwarz, Alexander, Apparatus for removal of surface oxides via fluxless technique involving electron attachment and remote ion generation.
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Dong, Chun Christine; McDermott, Wayne Thomas; Schwarz, Alexander; Arslanian, Gregory Khosrov; Patrick, Richard E.; Orbeck, Gary A.; Seccombe, Jr., Donald A., Electrode assembly for the removal of surface oxides by electron attachment.
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Dong, Chun Christine; McDermott, Wayne Thomas; Schwarz, Alexander; Arslanian, Gregory Khosrov; Patrick, Richard E.; Orbeck, Gary A.; Seccombe, Jr., Donald A., Electrode assembly for the removal of surface oxides by electron attachment.
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Dong, Chun Christine; McDermott, Wayne Thomas; Schwarz, Alexander; Arslanian, Gregory Khosrov; Patrick, Richard E.; Orbeck, Gary A.; Seccombe, Jr., Donald A., Electrode assembly for the removal of surface oxides by electron attachment.
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Larson-Smith, Kjersta L.; Blohowiak, Kay Y.; Seebergh, Jill E.; Sirkis, Michael R.; Sundaram, Vasan S., Hybrid coatings and associated methods of application.
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Larson-Smith, Kjersta L.; Blohowiak, Kay Y.; Seebergh, Jill E.; Sirkis, Michael R.; Sundaram, Vasan S., Hybrid coatings and associated methods of application.
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Dong, Chun Christine; McDermott, Wayne Thomas; Patrick, Richard E.; Ross, Brenda F., Hydrogen fluxless soldering by electron attachment.
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Crowe,Richard; Korfiatis,George; Babko Malyi,Sergei, In situ sterilization and decontamination system using a non-thermal plasma discharge.
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Braune, Bert; Keith, Christina; Galesic, Ivan, Method and device for producing a parylene coating.
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Schulte, Eric Frank, Method of plasma preparation of metallic contacts to enhance mechanical and electrical integrity of subsequent interconnect bonds.
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Babayan,Steven E.; Hicks,Robert F., Method of processing a substrate.
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Lee,Sang Hun; Kim,Jay Joongsoo, Microwave plasma nozzle with enhanced plume stability and heating efficiency.
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Lee, Sang Hun; Kim, Jay Joongsoo, Plasma nozzle array for providing uniform scalable microwave plasma generation.
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Breton,Robert A.; Ambler,David M., Polyvinyl alcohol-based film exhibiting improved adhesion.
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Lee,Sang Hun; Kim,Jay Joongsoo, Portable microwave plasma discharge unit.
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Lee,Sang Hun; Kim,Jay Joongsoo; Kinoshita,Togo, Portable microwave plasma systems including a supply line for gas and microwaves.
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Lin, Chih-Hsiang; Kao, Hsin-Ching; Wu, Chi-Lang, Processing method of polymer products.
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Roth, J. Reece, Remote exposure of workpieces using a plasma.
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J. Reece Roth, Remote exposure of workpieces using a recirculated plasma.
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Dong, Chun Christine; Patrick, Richard E.; Arslanian, Gregory Khosrov, Removal of surface oxides by electron attachment.
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Dong, Chun Christine; Patrick, Richard E.; Arslanian, Gregory Khosrov; Ghosh, Ranajit, Removal of surface oxides by electron attachment.
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Dong, Chun Christine; McDermott, Wayne Thomas; Schwarz, Alexander; Arslanian, Gregory Khosrov; Patrick, Richard E., Removal of surface oxides by electron attachment for wafer bumping applications.
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Dong,Chun Christine; McDermott,Wayne Thomas; Schwarz,Alexander; Arslanian,Gregory Khosrov; Patrick,Richard E., Removal of surface oxides by electron attachment for wafer bumping applications.
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A	생활필수품
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A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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[미국특허] Surface modification using an atmospheric pressure glow discharge plasma source 원문보기