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Optical apparatus for determining the height and tilt of a sample surface 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-011/14
출원번호 US-0960280 (1997-10-29)
발명자 / 주소
  • Lu Huizong
출원인 / 주소
  • International Business Machines Corporation
대리인 / 주소
    Tomlin
인용정보 피인용 횟수 : 21  인용 특허 : 17

초록

A device is provided for determining the height and/or tilt of local features on the surface of a sample. The device includes a laser projecting a collimated beam at an oblique angle at a reflection point on the sample surface and a converging lens having an optical axis extending at an angle of ref

대표청구항

[ What is claimed is:] [1.] Apparatus for measuring linear displacement of a sample surface from a nominal level in a direction perpendicular to said sample surface at a nominal inclination, wherein said apparatus comprises:projection means for projecting an energy beam at said sample surface to str

이 특허에 인용된 특허 (17)

  1. Barrett William A. (San Jose CA) Puri Amitabh (Santa Clara CA), Automatic leveling system and a method of leveling a workpiece based on focus detection.
  2. Nakamura Masahiro (Yokohama JPX), Inclination angle metering apparatus.
  3. Mizutani Hideo (Yokohama JPX) Amano Kesayoshi (Tokyo JPX) Wakamoto Shinji (Tokyo JPX) Imai Yuji (Ohmiya JPX), Inclination detecting apparatus and method.
  4. Shahar Arie (2800-187 Plaza Del Amo Torrance CA 90503) Schwartz Nira (2800-187 Plaza Del Amo Torrance CA 90503), Method and apparatus for measuring surface distances from a reference plane.
  5. Schuster Erich (Wetzlar DEX), Method and arrangement for aligning, examining and/or measuring two-dimensional objects.
  6. Penney Carl M. (Schenectady NY), Method and system for determining surface profile information.
  7. Hlzl Roland (Munich DEX), Method for scanning a plurality of optical measuring reflectors and an apparatus for performing the method.
  8. Concannon David J. (Farmington Hills MI) Copenhaver Gary B. (Canton MI) Catchpole Clive E. (Birmingham MI), Methods for aligning focusing and normalizing imaging system.
  9. Mizutani Hideo (Yokohama JPX) Suenaga Yutaka (Kawasaki JPX), Optical apparatus for the detection of position.
  10. van Rosmalen Gerard E. (Eindhoven) Opheij Willem G. (Eindhoven NLX), Optical device determining the position and orientation of an object, and optical recording and/or reproducing apparatus.
  11. Koike Manabu (Nagaokakyo JPX) Shikama Shinsuke (Nagaokakyo JPX) Toide Eiichi (Nagaokakyo JPX) Yoshihara Toru (Nagaokakyo JPX) Saito Takashi (Nagaokakyo JPX), Optical head with a tilt correction servo mechanism.
  12. Murao Noriaki (Tokorozawa JPX), Optical pickup and tilt control device including a plurality of photosensitive units for generating signals indicating w.
  13. Koyagi Yasuyuki (Tenjinkitamachi JPX), Optical position detecting method and apparatus therefor.
  14. Nikoonahad Mehrdad (Menlo Park CA) Rigg Philip R. (Saratoga CA) Wells Keith B. (Santa Cruz CA) Calhoun David S. (Mountain View CA), Optical wafer positioning system.
  15. Ido Satoshi (Tokorozawa JPX) Fujinami Minpei (Iruma JPX) Kato Yasuo (Zama JPX) Sakitani Yoshio (Iruma JPX) Ozasa Susumu (Kashiwa JPX), Position detecting system.
  16. Nikoonahad Mehrdad (Menlo Park CA) Tebelskis James A. (San Jose CA), Wafer alignment sensor.
  17. Pence Paul (Cedar Park TX) Pollock Greg (Austin TX), Wafer tilt gauge.

이 특허를 인용한 특허 (21)

  1. Satoru Fujisawa JP; Hisato Ogiso JP, Angle compensation method.
  2. Takahashi,Koichi; Arai,Masaki, Angle detection optical system, angle detection apparatus, optical signal switch system and information recording and reproduction system.
  3. Gregory, Donald David; Stokes, Sheldon David; Jordan, David Charles, Distance to angle metrology system (DAMS) and method.
  4. McCord, Mark; Pei, Jun, Dual beam symmetric height systems and methods.
  5. Masuyuki, Takashi, Face position detection method and apparatus, and exposure method and exposure apparatus, a production method for an exposure apparatus and a production method for a semiconductor device.
  6. Ohtomo Fumio,JPX ; Ishinabe Ikuo,JPX ; Kodaira Jun-ichi,JPX, Laser beam direction correcting optical system for a surveying instrument.
  7. Chien,Yang Chang, Method and apparatus for measuring displacement of an object.
  8. Yang, Ying-Hui; Chen, Chun-Ming; Cheng, Hui-Ta; Liu, Sung-Ho, Method and system of detecting tilt angle of object surface and method and system of compensating the same.
  9. Ookubo, Norio, Object-displacement detector and object-displacement controller.
  10. Hwang, Ing-Shouh; Hwu, En-Te; Huang, Kuang-Yuh, Optical multi-axis linear displacement measurement system and a method thereof.
  11. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  12. Mehdi Vaez-Iravani ; Stanley Stokowski ; Guoheng Zhao, Sample inspection system.
  13. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  14. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  15. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  16. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  17. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  18. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  19. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  20. Hu, Clark; Jeng, Hendrix; Jang, Bor Ping, Semiconductor wafer tilt monitoring on semiconductor fabrication equipment plate.
  21. Biellak,Steve; Stokowski,Stanley E.; Vaez Iravani,Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
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