초록 ▼

An apparatus for processing a substrate includes at least one closed chamber for containing the substrate in a controlled environment, and a non-evaporable gettering material in the chamber acting as an internal pump serving as the primary pumping means for removing contaminants from the controlled

An apparatus for processing a substrate includes at least one closed chamber for containing the substrate in a controlled environment, and a non-evaporable gettering material in the chamber acting as an internal pump serving as the primary pumping means for removing contaminants from the controlled environment. In this way the use of expensive and bulky cryogenic pumps can be avoided or minimized.

대표청구항 ▼

[ We claim:] [1.] An apparatus for processing a substrate, comprising:a closed processing chamber for providing a controlled environment, said closed processing chamber being openable to an atmosphere for access thereto;a support in said closed chamber for the substrate to be processed;an external p

[ We claim:] [1.] An apparatus for processing a substrate, comprising:a closed processing chamber for providing a controlled environment, said closed processing chamber being openable to an atmosphere for access thereto;a support in said closed chamber for the substrate to be processed;an external pump communicating with said closed chamber and capable of attaining an initial absolute pressure in said chamber of about 10.sup.-6 to 10.sup.-7 Torr;an isolation valve that isolates said external pump from said chamber during processing;an in-situ non-evaporable gettering material providing an internal pump with a pumping speed of at least 20,000 liters/sec for moisture located in said closed chamber adjacent said support, said non-evaporable gettering material serving as an internal pump acting as the primary pumping means for maintaining a vacuum and removing contaminants from said controlled environment during processing without the assistance of a cryopump;an antechamber communicating with said closed processing chamber for protecting said non-evaporable gettering material from the atmosphere when said closed processing chamber is opened to the environment; andf) a retractable support on which said non-evaporable gettering material is mounted, said retractable support being arranged so that it can be withdrawn from said closed processing chamber into said antechamber and sealed therein to permit said at least one closed processing chamber to be opened without exposing the non-evaporable gettering material to the atmosphere.