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Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23F-001/00
출원번호 US-0458136 (1995-06-02)
발명자 / 주소
  • Roth John Reece
출원인 / 주소
  • The University of Tennessee Research Corporation
대리인 / 주소
    Weiser and Associates, P.C.
인용정보 피인용 횟수 : 59  인용 특허 : 35

초록

The surface of a workpiece is cleaned by generating a steady-state one atmosphere glow discharge plasma above the surface of the workpiece. The use of one atmosphere, uniform glow discharge plasmas generated by a low frequency RF ion trapping mechanisms is preferred. The plasma used to effect surfac

대표청구항

[ What is claimed is:] [35.] A method for removing contaminants from a surface of a workpiece to provide a cleaned workpiece, comprising the steps of generating a steady-state, radio-frequency (RF), uniform glow discharge plasma at a pressure of about one atmosphere between electrodes using an RF po

이 특허에 인용된 특허 (35)

  1. Deeds William E. (Knoxville TN), Charged collector apparatus for the production of meltblown electrets.
  2. Gupta Anand (San Jose CA) Ye Yan (Campbell CA) Lanucha Joseph (Sunnyvale CA), Control of particle generation within a reaction chamber.
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  5. Thomas Michael E. (Milpitas CA), Gas distribution head for plasma deposition and etch systems.
  6. Singh Bawa (Vorhees NJ), Inductive coil for inductively coupled plasma production apparatus.
  7. Roth John R. (Knoxville TN) Tsai Peter P. (Knoxville TN), Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure.
  8. Roth John R. (Knoxville TN) Tsai Peter P. (Knoxville TN) Wadsworth Larry C. (Knoxville TN) Liu Chaoya (Knoxville TN) Spence Paul D. (Knoxville TN), Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure.
  9. Buhl Rainer (Sargans CHX) Peyer Christof (Schaan LIX), Method and apparatus for vacuum vapor deposition.
  10. Ueno Susumu (Ibaraki JPX) Kamata Hideaki (Ibaraki JPX), Method for imparting improved surface properties to a polymeric shaped article.
  11. Monroe Marvin E. (Sunbury OH), Method for removing contaminants by maintaining the plasma in abnormal glow state.
  12. Otsubo Toru (Fujisawa JPX) Suzuki Yasumichi (Yokohama JPX) Sasaki Shinji (Yokohama JPX) Ohara Kazuhiro (Kudamatsu JPX) Sasaki Ichirou (Yokohama JPX), Method of and apparatus for removing foreign particles.
  13. Belke ; Jr. Robert E. (N. Syracuse NY) Shirk Raymond A. (N. Syracuse NY), Method of bonding a poly (vinylidene fluoride) solid to a solid substrate.
  14. Su Yuh-Jia (Cupertino CA) Muh Richard (Fremont CA), Method of cleaning of an electrostatic chuck in plasma reactors.
  15. Fujimura Shuzo (Tokyo JPX) Hikazutani Kenichi (Kuwana JPX), Method of removing a layer of organic matter.
  16. Ribner Aaron (1327 Aaron Rd. North Brunswick NJ 08902), Microwave plasma etching machine and method of etching.
  17. Sonobe Tadasi (Iwaki JPX) Suzuki Kazuo (Hitachi JPX) Fukuda Takuya (Hitachi JPX) Ohue Michio (Hitachi JPX), Microwave-excited plasma processing apparatus.
  18. Moslehi Mehrdad M. (Dallas TX) Davis Cecil J. (Greenville TX) Jones John (Plano TX) Matthews Robert T. (Plano TX), Multi-electrode plasma processing apparatus.
  19. Moslehi Mehrdad M. (Dallas TX), Multi-zone plasma processing method and apparatus.
  20. Roth John R. (Knoxville TN) Tsai Peter P. (Knoxville TN) Liu Chaoyu (Knoxville TN) Laroussi Mounir (Knoxville TN) Spence Paul D. (Knoxville TN), One atmosphere, uniform glow discharge plasma.
  21. Zarowin Charles B. (Rowayton CT), Optical figuring by plasma assisted chemical transport and etching apparatus therefor.
  22. Legge, Ronald; Rice, Jr., M. John; Sarma, Kalluri R., Oxidation of material in high pressure oxygen plasma.
  23. Savas Stephen E. (Newark CA), Particulate contamination prevention using low power plasma.
  24. Spiegelberg Karl (Berlin DDX) Hoffmann Herbert (Hennigsdorf DDX) Jeske Helmfried (Hennigsdorf DDX) Kolm Alexander (Hennigsdorf DDX) Ebeling Fred (Berlin DDX), Plasma burner operated by means of gaseous mixtures.
  25. Tsukada Tsutomu (Fuchu JPX) Tamaki Toshio (Fuchu JPX) Yoshida Tatsuhiko (Fuchu JPX), Plasma etching apparatus with dielectrically isolated electrodes.
  26. Nishimura Eiichi (Yamanashi JPX) Toda Akihito (Yamanashi JPX) Sugiyama Kazuhiko (Hachioji JPX) Naitou Yukio (Kofu JPX), Plasma generating apparatus.
  27. Babu Suryadevara V. (Potsdam NY) Lu Neng-hsing (Endwell NY) Nilsen Carl-Otto (Vestal NY), Plasma processing apparatus including three bus structures.
  28. Ishida Tomoaki (Itami JPX), Plasma processing method.
  29. Gorin Georges J. (Pinole CA), Plasma reactor apparatus and method.
  30. Kubota Tadahiko (Kanagawa JPX), Secondary battery with graft-polymerized separator.
  31. Moslehi Mehrdad M. (Dallas TX), Semiconductor wafer cleaning using condensed-phase processing.
  32. Miller John D. (Homer NY) Verrando Marcel G. (Ocala FL), Sorbing apparatus.
  33. Roth John R. (Knoxville TN) Tsai Peter P. (Knoxville TN) Liu Chaoyu (Knoxville TN), Steady-state, glow discharge plasma.
  34. Akimoto Takeshi (Tokyo JPX), Two parallel plate electrode type dry etching apparatus.
  35. Tezuka Masashi (Zama JPX), Vacuum processing apparatus wherein temperature can be controlled.

이 특허를 인용한 특허 (59)

  1. Burada, Venkata; Sekhar, Jainagesh; Batt, Jerod; Reddy, Ganta S.; Kandell, Brian, Anti-smudging, better gripping, better shelf-life of products and surfaces.
  2. Van Der Wilk, Ronald; Goorhuis, Ger-Wim Jan, Apparatus for cleaning an object.
  3. DeVries, Hindrik Willem; Bouwstra, Jan Bastiaan; Aldea, Eugen; Van De Sanden, Mauritius Cornelius Maria, Arrangement, method and electrode for generating a plasma.
  4. Huang, Wentong; Hu, Wenbin, Atmospheric-pressure plasma processing apparatus for substrates.
  5. Peter Maschwitz ; Jaime Li, Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source.
  6. Ashpis, David E., Dust removal from solar cells.
  7. Boughton, Daniel Robert; Jarvis, Scott Michael, Method and apparatus for adding thermal energy to a glass melt.
  8. Roy, Subrata, Method and apparatus for efficient micropumping.
  9. Roy, Subrata, Method and apparatus for multibarrier plasma actuated high performance flow control.
  10. Roy, Subrata, Method and apparatus for providing high control authority atmospheric plasma.
  11. Lee, Jim L., Method and apparatus for reducing ozone output from ion wind devices.
  12. Gaynes, Michael; Hill, William R., Method for bonding heat sinks to overmold material.
  13. Gaynes,Michael; Hill,William R., Method for bonding heat sinks to overmold material and resulting structure.
  14. Egitto Frank D. ; Gaynes Michael A. ; Kodnani Ramesh R. ; Matienzo Luis J. ; Pierson Mark V., Method for bonding heat sinks to overmolds and device formed thereby.
  15. Egitto, Frank D.; Gaynes, Michael A.; Kodnani, Ramesh R.; Matienzo, Luis J.; Pierson, Mark V., Method for bonding heat sinks to overmolds and device formed thereby.
  16. Egitto, Frank D.; Gaynes, Michael A.; Kodnani, Ramesh R.; Matienzo, Luis J.; Pierson, Mark V., Method for bonding heat sinks to overmolds and device formed thereby.
  17. Egitto, Frank D.; Gaynes, Michael A.; Kodnani, Ramesh R.; Matienzo, Luis J.; Pierson, Mark V., Method for bonding heat sinks to overmolds and device formed thereby.
  18. Silberberg, Eric; Michel, Eric; Reniers, Francois; Buess-Herman, Claudine, Method for the plasma cleaning of the surface of a material coated with an organic substance.
  19. Silberberg, Eric; Michel, Eric; Reniers, Francois; Buess-Herman, Claudine, Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method.
  20. Silberberg, Eric; Michel, Eric; Reniers, Francois; Buess-Herman, Claudine, Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method.
  21. Spiegelman, Jeffrey J.; Alvarez, Jr., Daniel; Holmes, Russell J.; Tram, Allan, Method for the removal of airborne molecular contaminants using oxygen and/or water gas mixtures.
  22. Spiegelman,Jeffrey J.; Alvarez, Jr.,Daniel; Tram,Allan; Holmes,Russell, Method for the removal of airborne molecular contaminants using oxygen gas mixtures.
  23. Alvarez, Jr., Daniel; Spiegelman, Jeffrey J., Method for the removal of airborne molecular contaminants using water gas mixtures.
  24. Alvarez, Jr.,Daniel; Spiegelman,Jeffrey J, Method for the removal of airborne molecular contaminants using water gas mixtures.
  25. Chaleix, Daniel; Choquet, Patrick; Baravian, Gerard; Lacour, Bernard; Puech, Vincent, Method of cleaning the surface of a material coated with an organic substance and generator and device for carrying out said method.
  26. Chaleix, Daniel; Choquet, Patrick; Baravian, Gérard; Lacour, Bernard; Puech, Vincent, Method of cleaning the surface of a material coated with an organic substrate and a generator and device for carrying out said method.
  27. Urban, Andrea; Laermer, Franz; Breitschwerdt, Klaus; Becker, Volker, Method of etching structures into an etching body using a plasma.
  28. Goldstein Laurie A. ; Warfield Timothy J. ; Gates Jane K. ; Apen Elizabeth, Method of manufacturing a semiconductor device that uses a calibration standard.
  29. Babayan,Steven E.; Hicks,Robert F., Method of processing a substrate.
  30. Kakkad, Ramesh H., Method to fabricate thin insulating film.
  31. Boughton, Daniel Robert, Methods and apparatus for material processing using atmospheric thermal plasma reactor.
  32. Boughton, Daniel Robert, Methods and apparatus for material processing using atmospheric thermal plasma reactor.
  33. Boughton, Daniel Robert, Methods and apparatus for material processing using dual source cyclonic plasma reactor.
  34. Boughton, Daniel Robert, Methods and apparatus for material processing using plasma thermal source.
  35. Hopwood, Jeffrey A.; Wu, Chen; Hoskinson, Alan R.; Sonkusale, Sameer, Microplasma generating array.
  36. Hopwood, Jeffrey A., Microplasma generator and methods therefor.
  37. Lee,Sang Hun; Kim,Jay Joongsoo, Microwave plasma nozzle with enhanced plume stability and heating efficiency.
  38. Sakai, Osamu; Okamoto, Satoshi; Akai, Toshio, Plasma deposition device for forming thin film.
  39. Sato, Takehiko; Nakatani, Tatsuyuki; Kimura, Tatsuo, Plasma generation system and plasma generation method.
  40. Sato, Takehiko; Nakatani, Tatsuyuki; Kimura, Tatsuo, Plasma generation system and plasma generation method.
  41. Lee, Sang Hun; Kim, Jay Joongsoo, Plasma nozzle array for providing uniform scalable microwave plasma generation.
  42. Harrington, Daniel, Plasma reactor with adjustable plasma electrodes and associated methods.
  43. Harrington, Daniel, Plasma reactor with adjustable plasma electrodes and associated methods.
  44. Hanson, Eric L., Plasma treatment of substrates prior to the formation a self-assembled monolayer.
  45. Lee,Sang Hun; Kim,Jay Joongsoo, Portable microwave plasma discharge unit.
  46. Lee,Sang Hun; Kim,Jay Joongsoo; Kinoshita,Togo, Portable microwave plasma systems including a supply line for gas and microwaves.
  47. Ramm, Juergen; Beck, Eugen, Process for manufacturing component parts, use of same, with air bearing supported workpieces and vacuum processing chamber.
  48. Tracey, Ashley C.; Westren, Anthony M.; Blohowiak, Kay Y.; Brei, Mark R.; Zimmerman, Tyler Jacob; Barclay, Richard C.; Baker, Tara Kovacs; Shafranyuk, Yuliya, Processing tool cleaning using laser ablation.
  49. Kin Li ; Minas Tanielian, Surface modification using an atmospheric pressure glow discharge plasma source.
  50. Li, Kin; Tanielian, Minas, Surface modification using an atmospheric pressure glow discharge plasma source.
  51. Corke, Thomas; Thomas, Flint; Shatzman, David; Wood, Tommie, System and method for aerodynamic flow control.
  52. Silkey, Joseph S.; Smereczniak, Philip, Systems and methods for controlling flows with pulsed discharges.
  53. Scott,Simon J; Johnson,Graham A; Thornton,Edward, Turbulent flow drag reduction.
  54. Scott,Simon J; Johnson,Graham A; Thornton,Edward, Turbulent flow drag reduction.
  55. Schmitt, Jacques; Sansonnens, Laurent; Elyaakoubi, Mustapha; Irzyk, Michael, Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates.
  56. Schmitt, Jacques; Sansonnens, Laurent; Elyaakoubi, Mustapha; Irzyk, Michael, Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates.
  57. Schmitt,Jacques; Sanonnens,Laurent; Elyaakoubi,Mustapha; Irzyk,Michael, Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates.
  58. Roy, Subrata, Wingless hovering of micro air vehicle.
  59. Roy, Subrata, Wingless hovering of micro air vehicle.
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