초록

Solution films of a photosensitive metal arylketone alcoholate are micro-patterned by exposure to ultraviolet radiation under a mask. The resultant patterns are developed in an apolar solvent and annealed to provide thin film metal oxides for use in integrated circuits.

대표청구항 ▼

[ We claim:] [1.] A method of photopatterning a thin film for use in integrated circuits, said method comprising the steps of:providing a photosensitive solution comprised of a solvent and a photosensitive material comprising a photodecomposable organic compound containing an aryl group bonded direc

[ We claim:] [1.] A method of photopatterning a thin film for use in integrated circuits, said method comprising the steps of:providing a photosensitive solution comprised of a solvent and a photosensitive material comprising a photodecomposable organic compound containing an aryl group bonded directly to a ketone group and an alkoxide group bonded with the oxygen being alpha to the ketone group where a metal is chelated through both the ketone and alkoxide groups;forming a solution film of said photosensitive solution on a substrate;soft-baking said solution film;exposing said solution film to a masked pattern of ultraviolet radiation to provide a film having an initial pattern;developing said final pattern;annealing said final pattern to yield a solid thin film metal oxide; andcompleting an integrated circuit formed around said solid thin film metal oxide.