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Tunable threshold SOI device using back gate well 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-027/01
출원번호 US-0092973 (1998-06-08)
발명자 / 주소
  • Burr James B.
  • Houston Theodore W.
출원인 / 주소
  • Texas Instruments, Inc.
대리인 / 주소
    Jones Volentine, LLP
인용정보 피인용 횟수 : 50  인용 특허 : 6

초록

A fully depleted SOI device includes a semiconductor substrate and a conductive well of a first conductivity type formed in a principal surface of the semiconductor substrate. An insulating layer is formed along the principal surface of the semiconductor substrate and extends across the conductive w

대표청구항

[ What is claimed is:] [1.] An SOI device comprising:a semiconductor substrate;a conductive well of a first conductivity type formed in a principal surface of said semiconductor substrate;an insulating layer formed along said principal surface of said semiconductor substrate and extending across sai

이 특허에 인용된 특허 (6)

  1. Lee Kwing F. (Red Bank NJ) Ourmazd Abbas (Colts Neck NJ) Yan Ran-Hong (Aberdeen NJ), Insulated gate field-effect transistor with pulse-shaped doping.
  2. Burr James B. ; Brassington Michael P., Low power, high performance junction transistor.
  3. Burghartz Joachim Norbert, MOS high frequency switch circuit using a variable well bias.
  4. Mandelman Jack A. (Stormville NY), Method of fabricating low leakage SOI integrated circuits.
  5. Bahraman Ali (Palos Verdes Estates CA), Radiation hardened CMOS on SOI or SOS devices.
  6. Voldman Steven H. (Burlington VT) Tong Minh H. (Essex VT) Nowak Edward J. (Essex Junction VT) Geissler Stephen F. (Underhill VT), Semiconductor diode with silicide films and trench isolation.

이 특허를 인용한 특허 (50)

  1. Horigan, John W.; Gilbride, Daniel F.; Nguyen, Don J., Auto-calibrating voltage regulator with dynamic set-point capability.
  2. Chang, Leland; Ji, Brian L.; Kumar, Arvind; Majumdar, Amlan; Saenger, Katherine; Shi, Leathen; Yau, Jeng-Bang, Back-gated fully depleted SOI transistor.
  3. Burr, James B., Device including a resistive path to introduce an equivalent RC circuit.
  4. Burr, James B., Device including a resistive path to introduce an equivalent RC circuit.
  5. Burr, James B., Device including a resistive path to introduce an equivalent RC circuit.
  6. Burr, James B., Device including a resistive path to introduce an equivalent RC circuit.
  7. Burr, James B., Device including a resistive path to introduce an equivalent RC circuit.
  8. Berinder Brar, Field effect transistor and method for making the same.
  9. Brar, Berinder, Field effect transistor and method for making the same.
  10. Anderson, Brent A.; Hook, Terence B.; Na, Myung-Hee; Nowak, Edward J., Field effect transistor having delay element with back gate.
  11. Mouli,Chandra V., FinFET device with reduced DIBL.
  12. Mouli,Chandra V., FinFET device with reduced DIBL.
  13. Forbes, Leonard, Fully depleted silicon-on-insulator CMOS logic.
  14. Forbes, Leonard, Fully depleted silicon-on-insulator CMOS logic.
  15. Forbes, Leonard, Fully depleted silicon-on-insulator CMOS logic.
  16. Forbes,Leonard, Fully depleted silicon-on-insulator CMOS logic.
  17. Bryant,Andres; Clark, Jr.,William F.; Nowak,Edward J., Hybrid orientation field effect transistors (FETs).
  18. Adamic ; Jr. Fred W., Integrated circuit including inverted dielectric isolation.
  19. Doyle Brian S. ; Roberds Brian ; Rios Rafael, Integrated circuit with dynamic threshold voltage.
  20. Burr, James B., Low voltage latch.
  21. Burr, James B., Low voltage latch with uniform sizing.
  22. James B. Burr, Low voltage latch with uniform stack height.
  23. Burr, James B., Method and structure for supply gated electronic components.
  24. James B. Burr, Method for coupling logic blocks using low threshold pass transistors.
  25. James B. Burr, Method for engineering the threshold voltage of a device using buried wells.
  26. Burr, James B., Method for introducing an equivalent RC circuit in a MOS device using resistive paths.
  27. Burr, James B., Method for supply gating low power electronic devices.
  28. Krishnan Srinath ; Buynoski Matthew S., Method of creating selectively thin silicon/oxide for making fully and partially depleted SOI on same waffer.
  29. Yamamoto,Naoki, Method of manufacturing a dual gate semiconductor device with a poly-metal electrode.
  30. Manning H. Montgomery, Methods of forming SOI insulator layers and methods of forming transistor devices.
  31. Manning H. Montgomery, Methods of forming SOI insulator layers, methods of forming transistor devices, and semiconductor devices and assemblies.
  32. Manning H. Montgomery, Methods of forming SOI insulator layers, methods of forming transistor devices, and semiconductor devices and assemblies.
  33. Manning H. Montgomery, Methods of forming SOI insulator layers, methods of forming transistor devices, and semiconductor devices and assemblies.
  34. Ning, Tak H.; Shahidi, Ghavam G.; Yau, Jeng-Bang, One time programmable read-only memory (ROM) in SOI CMOS.
  35. James B. Burr, Overdriven pass transistors.
  36. Hook, Terence B., Pseudo butted junction structure for back plane connection.
  37. Hook, Terence B., Pseudo butted junction structure for back plane connection.
  38. Mouli, Chandra V., SOI CMOS device with reduced DIBL.
  39. Mouli, Chandra V., SOI CMOS device with reduced DIBL.
  40. Mouli, Chandra V., SOI CMOS device with reduced DIBL.
  41. Mouli, Chandra V., SOI CMOS device with reduced DIBL.
  42. Mouli, Chandra V., SOI device with reduced drain induced barrier lowering.
  43. Mouli, Chandra V., SOI device with reduced drain induced barrier lowering.
  44. Mouli,Chandra V., SOI device with reduced drain induced barrier lowering.
  45. Srinath Krishnan ; Matthew Buynoski ; Witold Maszara, Selectively thin silicon film for creating fully and partially depleted SOI on same wafer.
  46. Manning H. Montgomery, Semiconductor devices and assemblies.
  47. Manning H. Montgomery, Semiconductor devices comprising semiconductive material substrates and insulator layers over the substrates.
  48. Zhu, Huilong; Liang, Qingqing; Luo, Zhijiong; Yin, Haizhou, Semiconductor structure and method for manufacturing the same.
  49. Vogelsang,Thomas, Standby current reduction over a process window with a trimmable well bias.
  50. Anderson, Brent A.; Nowak, Edward J., Structure and design structure having isolated back gates for fully depleted SOI devices.
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