초록 ▼

A semiconductor wafer furnace process tube includes one or more gas delivery lines which wind around the circumference of the process tube in a non-product region near one end to preheat the gas in the lines. The winding section begins within the non-product region of the heater and terminates prior

A semiconductor wafer furnace process tube includes one or more gas delivery lines which wind around the circumference of the process tube in a non-product region near one end to preheat the gas in the lines. The winding section begins within the non-product region of the heater and terminates prior to the location of the first wafer within the process tube. From the termination of the winding section, the delivery lines continue axially directly to the opposite end of the tube. The length of the lines within the winding section is preselected to adequately preheat the gas in the lines before the lines pass the wafers. In this manner, the gas is able to absorb energy from the non-product region of the furnace with minimal or no cooling of the wafers in the product region of the furnace. Additionally, the lines are routed to absorb energy equally around the circumference of the process tube and not create a cold side within the tube. Also, the straight runs past the wafers are equally spaced around the circumference of the tube. In this way, any remaining effect of the gas lines on the tube are balanced.

대표청구항 ▼

[ We claim:] [1.] A furnace for processing product with a heated gas, comprising:an insulated housing;a process tube disposed within the housing and having opposed first and second ends, the process tube defining a process chamber therein for receiving product;a product support member disposed withi

[ We claim:] [1.] A furnace for processing product with a heated gas, comprising:an insulated housing;a process tube disposed within the housing and having opposed first and second ends, the process tube defining a process chamber therein for receiving product;a product support member disposed within the process tube;a heating element disposed within the insulated housing to surround the process tube, a portion of the heating element lying in a first region between the product support member in the process tube and one of the opposed first and second ends;a gas distribution inlet in the process tube to direct a gas into the process chamber;a gas output port in the process tube to remove gas from the process chamber;a gas input port disposed near the first end of the process tube;at least one gas delivery line disposed between the gas input port and the gas distribution inlet, and comprising a first portion wrapped at least partially circumferentially about a portion of the process tube in the first region, the length of the first portion being preselected to preheat gas in the gas delivery line to a predetermined temperature prior to the gas reaching a product region of the process chamber.