$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

[미국특허] Modification of subsurface region of polymers and carbon-based materials 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/06
출원번호 US-0870068 (1997-06-05)
발명자 / 주소
  • Gudimenko Yuri,CAX ITX M6B 2E8
  • Kleiman Jasha I.,CAX ITX L4J 7C3
  • Cool Grant R.,CAX ITX P4R 1L5
  • Iskanderova Zelina A.,CAX ITX L4J 3W3
  • Tennyson Roderick C.,CAX ITX L0G 1K0
대리인 / 주소
    Riches,McKenzie & Herbert
인용정보 피인용 횟수 : 29  인용 특허 : 47

초록 ▼

An an improved process for surface modification of solid substrates, such as polymers and carbon-based materials, is disclosed. The preferred process comprises three steps: a first activation step wherein reactive hydrogen groups are formed in a surface layer of a polymeric or carbon-based material;

대표청구항 ▼

[ We claim:] [1.] A process for modification of a surface of a solid substrate selected from the group consisting of organic polymers, metallized polymer films, graphite and carbon fiber reinforced composite materials, the substrate prior to modification being substantially unreactive with a silylat

이 특허에 인용된 특허 (47) 인용/피인용 타임라인 분석

  1. Oldham Susan L. (Torrance CA) Elias William E. (Redondo Beach CA) Bigus Stephen J. (Long Beach CA) Lau Kreisler S. Y. (Alhambra CA), Aromatic silane polymer coatings.
    상세보기
  2. Koontz Steven L. (League City TX), Atomic oxygen reactor having at least one sidearm conduit.
    상세보기
  3. Wertheimer Michael R. (Quebec CAX) Schreiber Henry P. (Quebec CAX), Barrier coatings on spacecraft materials.
    상세보기
  4. Babich Edward D. (Chappaqua NY) Galligan Eileen A. (Hopewell Junction NY) Gelorme Jeffrey D. (Plainville CT) McGouey Richard P. (Carmel NY) Nunes Sharon L. (Hopewell Junction NY) Paraszczak Jurij R. , Base developable negative photoresist composition and use thereof.
    상세보기
  5. Yamamoto Keiji (Yokohama JPX), Dehydrogenative silylation process of organic compounds having active hydrogen.
    상세보기
  6. Douglas Monte A. (Coppell TX), Dry developable resist etch chemistry.
    상세보기
  7. Bargain Michel (Lyon FRX) Prud\Homme Christian (Lyon FRX), Elastomeric organopolysiloxane block copolymers and non-elastomeric organosilicic copolymer blocks therefor.
    상세보기
  8. Fujino Takeshi (Hyogo JPX), Fabrication of fine patterns by selective surface reaction and inspection method therefor.
    상세보기
  9. Misium George R. (Richardson TX) Garza Cesar M. (Plano TX) Davis Cecil J. (Greenville TX), High pressure photoresist silylation process and apparatus.
    상세보기
  10. Brunsvold William R. (Poughkeepsie NY) Chiu Philip (Edison NJ) Conley ; Jr. Willard E. (Cornwall NY) Crockatt Dale M. (Somers NY) Montgomery Melvin W. (New Windsor NY) Moreau Wayne M. (Wappingers Fal, Highly sensitive dry developable deep UV photoresist.
    상세보기
  11. Burns Gary T. (Midland MI) Fontaine Leslie D. (Blue Springs MO) Reaoch Ronald S. (Elizabethtown KY), Infusible preceramic polymers via ultraviolet treatment in the presence of a reactive gas.
    상세보기
  12. Koontz Steven L. (Seabrook TX) Cross Jon B. (Santa Fe NM), Method for anisotropic etching in the manufacture of semiconductor devices.
    상세보기
  13. Bobbio Stephen M. (Wake Forest NC), Method for anisotropically hardening a protective coating for integrated circuit manufacture.
    상세보기
  14. Babich Edward D. (Chappaqua NY) Gelorme Jeffrey D. (Plainville CT) Hatzakis Michael (Chappaqua NY) Shaw Jane M. (Ridgefield CT) Stewart Kevin J. (Lake Peekskill NY) Witman David F. (Pleasantville NY), Method for forming a pattern.
    상세보기
  15. Koshiba Mitsunobu (Shinyoshida JPX) Harita Yoshiyuki (Shirahatadai JPX) Furuto Yuuji (Nittamae JPX) Roland Bruno (Waverse Baan BEX) Lombaerts Ria (Kapellelei BEX), Method for high temperature reaction process.
    상세보기
  16. Torre Larry P. (Renton WA) Zornes ; Jr. Bruce L. (Bothell WA), Method for improving atomic oxygen resistance.
    상세보기
  17. Koontz Steven L. (League City TX), Method for preparation of a microporous structure with layered interstitial surface treatment.
    상세보기
  18. Sezi Recai (Rttenbach DEX) Borndrfer Horst (Erlangen DEX) Rissel Eva (Forchheim DEX) Leuschner Rainer (Erlangen DEX) Sebald Michael (Hessdorf-Hannberg DEX) Ahne Hellmut (Rttenbach DEX) Birkle Siegfri, Method for producing a resist structure.
    상세보기
  19. Sezi Recai (Rttenbach DEX) Borndrfer Horst (Erlangen DEX) Rissel Eva (Forchheim DEX) Leuschner Rainer (Erlangen DEX) Sebald Michael (Hessdorf-Hannberg DEX) Ahne Hellmut (Rttenbach DEX) Birkle Siegfri, Method for producing a resist structure.
    상세보기
  20. Leuschner Rainer (Erlangen DEX) Sezi Recai (Roettenbach DEX) Sebald Michael (Hessdorf-Hannberg DEX), Method for the production of a bottom resist.
    상세보기
  21. Bolon Donald A. (Scotia NY) Eddy Victoria J. (Schenectady NY) Hallgren John E. (Scotia NY), Method of coating and imaging photopatternable silicone polyamic acid.
    상세보기
  22. Hartney Mark A. (Carlisle MA), Method of patterning a phenolic polymer film without photoactive additive through exposure to high energy radiation belo.
    상세보기
  23. Akira Shuhara (Amagasaki JPX) Kenichiro Yamanishi (Amagasaki JPX) Yoshibumi Minowa (Amagasaki JPX), Method of producing silicon dioxide films.
    상세보기
  24. Hu, Ing-Feng; Tou, James C., Method of providing an abrasion resistant coating.
    상세보기
  25. Stillwagon Larry E. (Summit NJ) Taylor Gary N. (Bridgewater NJ) Venkatesan Thirumalai N. C. (Bridgewater NJ) Wolf Thomas M. (Succasunna NJ), Method with gas functionalized plasma developed layer.
    상세보기
  26. Mears Eric L. (Rockport MA), Methods for thermal transfer with a semiconductor.
    상세보기
  27. Pavelchek Edward K. (Waltham MA) Freeman Peter W. (Austin TX) Bohland John F. (Berlin MA) Jones Susan K. (Raleigh NC) Dudley Bruce W. (Durham NC), Methods for treating photoresists.
    상세보기
  28. Koontz Steven L. (League City TX), Microporous structure with layered interstitial surface treatment, and method and apparatus for preparation thereof.
    상세보기
  29. Cahalan Patrick T. (Stein NLX) Verhoeven Michel (Maastricht NLX), Modification of polymeric surface by graft polymerization.
    상세보기
  30. Mirtich, Michael J.; Sovey, James S.; Banks, Bruce A., Oxidation protection coatings for polymers.
    상세보기
  31. Taylor ; Lynn J., Photochemical modification of polymers.
    상세보기
  32. Thackeray James W. (Braintree MA) Fine Stephen A. (Peabody MA), Photoresist pattern fabrication employing chemically amplified metalized material.
    상세보기
  33. Roland Bruno (Heverlee BEX) Vandendriessche Jan (Haasrode BEX) Jakus Catherine (Diegem BEX), Photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester of phenolic resin with.
    상세보기
  34. Babich Edward D. (Ridgefield CT) Hatzakis Michael (Chappaqua NY) Jacobs Scott L. (Fishkill NY) Parasczcak Juri R. (Pleasantville NY) Shaw Jane M. (Ridgefield CT) Witman David F. (Ossining NY), Plasma-resistant polymeric material, preparation thereof, and use thereof.
    상세보기
  35. Babich Edward D. (Ridgefield CT) Hatzakis Michael (Chappaqua NY) Jacobs Scott L. (Fishkill NY) Parasczcak Juri R. (Pleasantville NY) Shaw Jane M. (Ridgefield CT) Witman David F. (Ossining NY), Plasma-resistant polymeric material, preparation thereof, and use thereof.
    상세보기
  36. Hartney Mark A. (Carlisle MA) Melngailis John (Newton MA) Shaver David C. (Carlisle MA), Positive resist pattern formation through focused ion beam exposure and surface barrier silylation.
    상세보기
  37. Benz Gerhard (Bblingen DEX) Mutschler Gerda (Gerlingen DEX) Schneider Gnter (Tamm DEX), Process for applying a thin, transparent layer onto the surface of optical elements.
    상세보기
  38. Taniguchi Takashi (Shiga JPX) Mibae Jiro (Otsu JPX), Process for producing transparent shaped article having enhanced anti-reflective effect.
    상세보기
  39. Shirahata Akihiko (Yotsukaidoo JPX), Silylating agent.
    상세보기
  40. Bruynes Cornelis A. (Koudekerk a/d Rijn NLX) Jurriens Theodorus K. (Delft NLX), Silylation process.
    상세보기
  41. Treadgold Richard C. (Cardiff GB7), Silylation process.
    상세보기
  42. Hiraoka Hiroyuki (Saratoga CA), Spray silylation of photoresist images.
    상세보기
  43. Downey ; Jr. John F. (Lexington MA), Stabilized light-polarizing material.
    상세보기
  44. Hartney Mark A. (Carlisle MA), Surface barrier silylation of novolak film without photoactive additive patterned with 193 nm excimer laser.
    상세보기
  45. Zelez Joseph (R.D. #1 ; Box 473E Henryville PA 18332), Surface modification of plastic substrates.
    상세보기
  46. Iskanderova Zelina A. (35 Canyon Ave. ; #2011 Downsview ; Ontario CAX M3H 4Y2 ) Kleiman Jasha I. (205 Chelwood Drive Thornhill ; Ontario CAX L4J 7C3 ) Gudimenko Yuri (437 Glen Park Avenue Apt. 207 No, Surface modification of polymers and carbon-based materials by ion implantation and oxidative conversion.
    상세보기
  47. Holmes Steven J. (Burlington VT), Vapor phase photoresist silylation process.
    상세보기

이 특허를 인용한 특허 (29) 인용/피인용 타임라인 분석

  1. Drzal,Lawrence T.; Tummala,Praveen, Chemical functionalization of material surfaces using optical energy and chemicals.
    상세보기
  2. Gopalanarayanan, Bhaskar; Killeen, Kelly Ann; Massie, II, Johnny Dale; Roe, Ronald Lloyd; Semler, James Joseph, Developer rolls having a tuned resistivity.
    상세보기
  3. Bernard D. Bauman ; Michael S. Cork, ECTFE surfaces modified by fluoro-oxidation and a process therefor.
    상세보기
  4. Uchida, Maki, Electrophotosensitive material and method of producing the same.
    상세보기
  5. Kodnani, Ramesh R.; Matienzo, Luis J.; Tran, Son K., Flip-chip package with optimized encapsulant adhesion and method.
    상세보기
  6. Kodnani, Ramesh R.; Matienzo, Luis J.; Tran, Son K., Flip-chip package with optimized encapsulant adhesion and method.
    상세보기
  7. Tsien,Roger Y.; Rao,Jianghong, Fluorogenic substrates for BETA-lactamase gene expression.
    상세보기
  8. Weitz, David A.; Holtze, Christian; Abate, Adam R.; Lee, Daeyeon; Do, Thao, Metal oxide coating on surfaces.
    상세보기
  9. Egitto Frank Daniel ; Matienzo Luis Jesus ; Morrison ; Jr. Bruce Otho, Method for Producing a Diffusion Barrier and Polymeric Article Having a Diffusion Barrier.
    상세보기
  10. Egitto Frank Daniel ; Matienzo Luis Jesus ; Morrison ; Jr. Bruce Otho, Method for producing a diffusion barrier and polymeric article having a diffusion barrier.
    상세보기
  11. Egitto Frank Daniel ; Matienzo Luis Jesus ; Morrison ; Jr. Bruce Otho, Method for producing a diffusion barrier and polymeric article having a diffusion barrier.
    상세보기
  12. Egitto Frank Daniel ; Matienzo Luis Jesus ; Morrison ; Jr. Bruce Otho, Method for producing a diffusion barrier and polymeric article having a diffusion barrier.
    상세보기
  13. Corry, Schuyler; Downey, William; Filanoski, Brian; Gee, Kyle; Greenfield, Lawrence; Hirsch, James; Johnson, Iain; Rukavishnikov, Aleksey, Optically-detectable enzyme substrates and their method of use.
    상세보기
  14. Corry, Schuyler; Downey, William; Filanoski, Brian; Gee, Kyle; Greenfield, Lawrence; Hirsch, James; Johnson, Iain; Rukavishnikov, Aleksey, Optically-detectable enzyme substrates and their method of use.
    상세보기
  15. Gilliam, Mary; Higuchi, Koichi, Organic resin laminate, methods of making and using the same, and articles comprising the same.
    상세보기
  16. Soper, Steven A.; McCarley, Robin L.; Vaidya, Bikas, Photoresist-free micropatterning on polymer surfaces.
    상세보기
  17. Hong S. Shim ; Mark C. S. Shu ; David L. Miller ; Edward Di Domenico ; Catherine E. Taylor ; Kenneth Keeney ; Mark T. Stewart ; Eileen L. Halverson, Plasma process for surface modification of pyrolitic carbon.
    상세보기
  18. Goodner, Michael D.; Kloster, Grant; Johnston, Steven W., Plating a conductive material on a dielectric material.
    상세보기
  19. Lohwasser, Wolfgang; Frei, Olaf; Muggli, Olivier Y., Process for manufacturing packaging film.
    상세보기
  20. Yamamoto, Kyoko; Shibuya, Takashi, Process for producing resin substrate having hard coating layer, and resin substrate having hard coating layer.
    상세보기
  21. Drzal, Lawrence T.; Rich, Michael J., Process for the treatment of a fiber.
    상세보기
  22. Saha, Atanu; Joshi, Salil Mohan; Zhang, An-Ping, SiOC membranes and methods of making the same.
    상세보기
  23. Egitto, Frank D.; Matienzo, Luis J., Structure and method for improved adhesion between two polymer films.
    상세보기
  24. Egitto,Frank D.; Matienzo,Luis J., Structure and method for improved adhesion between two polymer films.
    상세보기
  25. Egitto,Frank D.; Matienzo,Luis J., Structure and method for improved adhesion between two polymer films.
    상세보기
  26. Abate, Adam R.; Krummel, Amber T.; Holtze, Christian; Weitz, David A., Surfaces, including microfluidic channels, with controlled wetting properties.
    상세보기
  27. Mori, Kanji; Narita, Takeshi; Okamoto, Kazuo; Tsuji, Masao; Tachi, Kazuyuki, Weathering test apparatus.
    상세보기
  28. Mori,Kanji; Narita,Takeshi; Okamoto,Kazuo; Tsuji,Masao; Tachi,Kazuyuki, Weathering test apparatus.
    상세보기
  29. Mori, Kanji; Narita, Takeshi; Okamoto, Kazuo; Tsuji, Masao; Tachi, Kazuyuki, Weathering test method.
    상세보기

활용도 분석정보

상세보기
다운로드
내보내기

활용도 Top5 특허

해당 특허가 속한 카테고리에서 활용도가 높은 상위 5개 콘텐츠를 보여줍니다.
더보기 버튼을 클릭하시면 더 많은 관련자료를 살펴볼 수 있습니다.

관련 콘텐츠

저작권 관리 안내
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로