초록 ▼

A vacuum processing apparatus includes: a vacuum processing chamber for processing a target object; a processing gas supply source for supplying a processing gas by which a process is performed to the target object in the vacuum processing chamber; a processing gas supply pipe for supplying the proc

A vacuum processing apparatus includes: a vacuum processing chamber for processing a target object; a processing gas supply source for supplying a processing gas by which a process is performed to the target object in the vacuum processing chamber; a processing gas supply pipe for supplying the processing gas from the processing gas supply source into the vacuum processing chamber; and a pressure reducing valve for keeping the gas supply pipe at a lower pressure than the atmospheric pressure when the processing gas is to be supplied to the vacuum processing chamber.

대표청구항 ▼

[ What is claimed is:] [1.] A vacuum processing apparatus comprising:a vacuum processing chamber housing a target object for applying a predetermined treatment to the target object;a mounting table, arranged within said vacuum processing chamber, for mounting a target object;a processing gas supply

[ What is claimed is:] [1.] A vacuum processing apparatus comprising:a vacuum processing chamber housing a target object for applying a predetermined treatment to the target object;a mounting table, arranged within said vacuum processing chamber, for mounting a target object;a processing gas supply system for independently supplying a processing gas for performing a specific process to the target object;a cleaning gas supply system, arranged independently of said processing gas supply system, for supplying a cleaning gas containing ClF.sub.3 to the mounting table; andliquefaction-prevention heating means for preventing liquefaction of the cleaning gas by heating said cleaning gas supply system, said liquefaction prevention heating means including first and second heating means which respectively heat first and second zones of said cleaning gas supply system, and wherein said second heating means heats said second zone to a temperature higher than a temperature to which said first heating means heats said first zone.