초록 ▼

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrot

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

대표청구항 ▼

[ What is claimed is:] [1.] An effluent gas stream treatment system comprising:a pre-treatment unit for reducing acid gas concentration and particulate components of an effluent gas stream entering the treatment system, the pre-treatment unit comprising a scrubber;an oxidation treatment unit arrange

[ What is claimed is:] [1.] An effluent gas stream treatment system comprising:a pre-treatment unit for reducing acid gas concentration and particulate components of an effluent gas stream entering the treatment system, the pre-treatment unit comprising a scrubber;an oxidation treatment unit arranged to receive the effluent gas stream having reduced acid gas concentration and particulate components from the pre-treatment unit, and to oxidize at least a portion of oxidizable components of the effluent gas stream;a post-oxidation treatment unit arranged (i) to receive the effluent gas stream from the oxidation treatment unit, and (ii) to scrub the effluent gas stream for enhancement of the character of the effluent gas stream for final discharge from the treatment system; anda clog-resistant inlet structure for introducing the effluent gas stream to the pre-treatment unit of said effluent-gas stream treatment system, said clog-resistant effluent gas stream inlet structure comprising a generally vertically arranged flow passage, for flowing the effluent gas stream containing particulate solids downwardly therethrough, said flow passage including a bounding wall having a weir opening therein, and an annular liquid supply reservoir circumscribing and in liquid feed relationship to the weir opening, with means for supplying liquid to the annular liquid supply reservoir for flow through the weir opening; andwhereby when liquid is flowed into the annular liquid supply reservoir, the introduced liquid flows through the weir opening and flows down the bounding wall of the flow passage to wash any particulate solids from the wall and to suppress the deposition or formation of solids on the interior surface of the bounding wall, as the effluent gas stream containing particulate solids is flowed through the flow passage of the inlet structure.