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Process detection system for plasma process 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B07C-017/00
  • G06F-017/00
  • G06F-007/00
  • G07F-007/00
출원번호 US-0954387 (1997-10-20)
발명자 / 주소
  • Vona Daniel F.
  • Gerrish Kevin S.
  • Nasman Kevin P.
출원인 / 주소
  • ENI Technologies, Inc.
대리인 / 주소
    Bryan Cave LLP
인용정보 피인용 횟수 : 86  인용 특허 : 3

초록

Plasma process control arrangement controls a plasma generator that provides electrical power to a plasma chamber for an RF or DC plasma process. A sensor system detects operating parameters of the electrical power, including voltage and current levels. A process detection system (pds) controller ha

대표청구항

[ We claim:] [1.] Plasma process control arrangement wherein a plasma generator means provides electrical power to a plasma chamber for conducting a plasma process at a controlled level, said electrical power having detectable operating parameters including voltage and current levels, and in which a

이 특허에 인용된 특허 (3)

  1. Gerrish Kevin S. ; Vona ; Jr. Daniel F., Baseband V-I probe.
  2. Turner Terry R. (Austin TX) Spain James D. (Georgetown TX) Swyers John R. (Austin TX), Plasma monitoring and control method and system.
  3. Faustini Antony Azio, System, method and article of manufacture for providing dynamic user editing of object oriented components used in an ob.

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