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Liquid, radiation-curable composition, especially for stereolithography 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-070/28
  • G03F-007/26
출원번호 US-0901303 (1997-07-28)
발명자 / 주소
  • Steinmann Bettina,CHX
  • Schulthess Adrian,CHX
출원인 / 주소
  • Ciba Specialty Chemicals Corp.
대리인 / 주소
    Kovaleski
인용정보 피인용 횟수 : 31  인용 특허 : 18

초록

A liquid, radiation-curable composition which in addition to a liquid, free-radically polymerizable component comprises at least the following additional components: (A) from 40 to 80 percent by weight of a liquid difunctional or more highly functional epoxy resin or of a liquid mixture consisting o

대표청구항

[ What is claimed is:] [1.] A liquid, radiation-curable composition which in addition to a liquid, free-radically polymerizable component comprises at least the following additional components:(A) from 40 to 80 percent by weight of a liquid epoxy resin having two or more then two epoxy groups per mo

이 특허에 인용된 특허 (18)

  1. Koleske Joseph V. (Charleston WV), Low viscosity adducts of poly(active hydrogen) organic compounds and a polyepoxide.
  2. Koleske Joseph V. (Charleston WV) Kwiatkowski George T. (Green Brook NJ), Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials and substituted cycloaliphati.
  3. Koleske Joseph V. (Charleston WV), Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials having primary hydroxyl conte.
  4. Tsao Jung-Hsien (Columbia MD) Ketley Arthur D. (Columbia MD), Photocurable epoxy-acrylate compositions.
  5. Gottschalk Peter (Centerville OH) Schuster Gary B. (Champaign IL), Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same.
  6. Lawton John Alan ; Nebe William John ; Thommes Glen Anthony ; Caspar Jonathan V., Photohardenable epoxy composition.
  7. Green, George E.; Irving, Edward, Photopolymerization by means of sulfoxonium salts.
  8. Green George E. (Stapleford GB2) Irving Edward (Burwell GB2), Photopolymerization by means of sulphoxonium salts.
  9. Kawabata Masami (Takatsuki JPX) Sato Akihiko (Suita JPX) Sumiyoshi Iwao (Osaka JPX), Photosensitive composition for volume hologram recording.
  10. Steinmann Bettina (Praroman CHX) Wolf Jean-Pierre (Courtaman CHX) Schulthess Adrian (Tentlingen CHX) Hunziker Max (Ddingen CHX), Photosensitive compositions.
  11. Gottschalk Peter (Centerville OH) Neckers Douglas C. (Perrysburg OH) Schuster Gary B. (Champaign IL), Photosensitive materials containing ionic dye compounds as initiators.
  12. Meier Kurt (Allschwil CHX), Process for preparing metallocene complexes.
  13. Adair Paul C. (Springboro OH) Moore Michael J. (Dayton OH), Radiation-curable ink and coating compositions containing ionic dye compounds as initiators.
  14. Lawton John Alan (Landenberg PA) Nebe William John (Wilmington DE) Thommes Glen Anthony (Wilmington DE), Stabilizers for use with photoacid precursor formulations.
  15. Green George E. (Stapleford GB2) Irving Edward (Burwell GB2) Stark Bernard P. (Great Shelford GB2), Sulfoxonium salts and their use as polymerization catalysts.
  16. Zweifel Hans (Basel CHX) Bauer Sigrid (Lutry CHX) Meier Kurt (Allschwil CHX), Thermally transferable layers of radiation sensitive epoxy resins used to prepare protective coatings and relief images.
  17. Zussman ; Hyman W. ; Knell ; Martin ; Dexter ; Martin, Unsaturated hydantoin coagents.
  18. Steinmann Bettina (Les Russilles 1724 Praroman CHX) Schulthess Adrian (Uff em Barg 22 1734 Tentlingen CHX) Hunziker Max (Chasseralstrasse 8 3186 Dudingen CHX), Vinyl ether compounds having additional functional groups other than vinyl ether groups and the use thereof in the formu.

이 특허를 인용한 특허 (31)

  1. Hayes, Barrie James; Messe, Laurence Josette, Actinic radiation curable compositions and their use.
  2. Liu,Wen Feng; Bucquet,Barbara; Chabut,Barbara, Adhesive compositions.
  3. Liu, Wen-Feng; Bucquet, Barbara; Chabut, Barbara, Adhesive of epoxy compound, epoxy-reactive monomer and tri- and tetra-functional acrylate accelerators.
  4. Klein, Howard P.; Renken, Terry L.; Renner, Martin J.; Burton, Bruce L.; Darragas, Katty, Etheramines and their use as intermediates for polymer synthesis.
  5. Klein, Howard P.; Renken, Terry L.; Renner, Martin J.; Burton, Bruce L.; Darragas, Katty, Etheramines containing flexible and rigid segments and their use as intermediates for polymer synthesis.
  6. Johnson, David; Fong, John Wai, Method of making a 3-D object from photocurable compositions containing reactive polysiloxane particles.
  7. Rolland, Jason P.; Chen, Kai; Poelma, Justin; Goodrich, James; Pinschmidt, Robert; DeSimone, Joseph M.; Robeson, Lloyd M., Methods of producing EPOXY three-dimensional objects from materials having multiple mechanisms of hardening.
  8. Rolland, Jason P.; Chen, Kai; Poelma, Justin; Goodrich, James; Pinschmidt, Robert; DeSimone, Joseph M.; Robeson, Lloyd M., Methods of producing polyurea three-dimensional objects from materials having multiple mechanisms of hardening.
  9. Rolland, Jason P.; Chen, Kai; Poelma, Justin; Goodrich, James; Pinschmidt, Robert; DeSimone, Joseph M.; Robeson, Lloyd M., Methods of producing polyurethane three-dimensional objects from materials having multiple mechanisms of hardening.
  10. Rolland, Jason P.; Chen, Kai; Poelma, Justin; Goodrich, James; Pinschmidt, Robert; DeSimone, Joseph M.; Robeson, Lloyd M., Methods of producing three-dimensional objects from materials having multiple mechanisms of hardening.
  11. Johnson, David L.; Tran, Frank; Fong, John; Leyden, Richard; Patel, Ranjana, Photocurable compositions for articles having stable tensile properties.
  12. Johnson,David; Tran,Frank; Fong,John; Leyden,Richard; Patel,Ranjana, Photocurable compositions for articles having stable tensile properties.
  13. Leyden, Richard N.; Messe, Laurence; Tran, Frank; Johnson, David L.; Fong, John Wai; Chapelat, Carole; Patel, Ranjana C., Photocurable compositions for preparing ABS-like articles.
  14. Fong, John Wai, Photocurable resin composition for producing three dimensional articles having high clarity.
  15. Knocke, Frank, Photopolymerisable composition.
  16. Rolland, Jason P.; Chen, Kai; Poelma, Justin; Goodrich, James; Pinschmidt, Robert; DeSimone, Joseph M.; Robeson, Lloyd M., Polyurea resins having multiple mechanisms of hardening for use in producing three-dimensional objects.
  17. Thies,Jens C; Dias,Aylvin J. A. A.; Lawton,John A.; Winmill,David L.; Xu,Jigeng; You,Xiaorong, Radiation curable resin composition and rapid prototyping process using the same.
  18. Lawton, John A., Radiation-curable resin composition and rapid prototyping process using the same.
  19. Reynolds, Gary Lee; Hunter, Don Frederick, Rapid prototyping and manufacturing system and method.
  20. Wahlstrom, Ben, Rapid prototyping and manufacturing system and method.
  21. Wahlstrom, Ben, Rapid prototyping and manufacturing system and method.
  22. Wahlstrom, Ben; Hunter, Don Frederick, Rapid prototyping and manufacturing system and method.
  23. Wahlstrom, Ben; Stonesmith, Matthew; Hunter, Don Frederick, Rapid prototyping and manufacturing system and method.
  24. Lawton, John Alan, Solid imaging compositions for preparing polyethylene-like articles.
  25. John A. Lawton ; Chander P. Chawla, Solid imaging compositions for preparing polypropylene-like articles.
  26. Lawton, John A.; Chawla, Chander P., Solid imaging compositions for preparing polypropylene-like articles.
  27. Lawton, John A.; Chawla, Chander P., Solid imaging compositions for preparing polypropylene-like articles.
  28. He, Mingbo; Rundlett, Beth; Ren, Kangtai; Liu, Caroline; Lee, Tai Yeon, Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication.
  29. Holmboe, Scott B.; Reynolds, Gary L.; Stonesmith, Matthew K.; Hull, Charles W.; Reichental, Abraham N., Stereolithographic apparatus.
  30. Steinmann,Bettina, Stereolithographic resins with high temperature and high impact resistance.
  31. Moussa, Khalil M.; Liu, Jiaching, Toughened stereolithographic resin compositions.
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