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Cerium oxide with pores having a lamellar structure, preparation method therefor and use thereof in catalysis 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01J-025/00
  • B01J-020/34
  • B01J-021/04
  • B01J-008/02
  • C04B-035/50
출원번호 US-0077812 (1999-03-01)
우선권정보 FR-0014291 (1995-12-04)
국제출원번호 PCT/FR96/01918 (1996-12-03)
§371/§102 date 19990301 (19990301)
국제공개번호 WO-9720772 (1997-06-12)
발명자 / 주소
  • Bonneau Lionel,FRX
  • Ferlin Patrick,FRX
  • Zing Christophe,FRX
출원인 / 주소
  • Rhodia Chimie, FRX
대리인 / 주소
    Shedden
인용정보 피인용 횟수 : 24  인용 특허 : 15

초록 ▼

A cerium oxide with pores having a uniform lamellar structure. The pores may be at least partially arranged in substantially parallel directions and may also extend throughout the grain. The method for preparing said cerium oxide comprises heat treating a compound that essentially consists of cerium

대표청구항

[ What is claimed is:] [1.] A cerium oxide grain exhibiting pores having a lamellar structure.

이 특허에 인용된 특허 (15)

  1. Wan Chung-Zong (Somerset NJ) Dettling Joseph C. (Howell NJ), Aluminum-stabilized ceria catalyst compositions, and methods of making the same.
    상세보기
  2. Rajaram Raj R. (Slough GBX) Hayes John W. (Reading GBX) Ansell Graham P. (Twyford GBX) Hatcher Helen A. (Reading GBX), Catalyst.
    상세보기
  3. Park Sang-cheol,KRX ; Pak Chan-ho,KRX, Catalyst and fabrication method of same for purifying exhaust gases of automobile.
    상세보기
  4. Nakatsuji Tadao,JPX ; Shimizu Hiromitsu,JPX ; Yasukawa Ritsu,JPX ; Miyamoto Katsumi,JPX ; Tsuchida Hiroshi,JPX, Catalyst for catalytic reduction of nitrogen oxides.
    상세보기
  5. Matson Dean W. (Kennewick WA) Fulton John L. (Richland WA) Linehan John C. (Richland WA) Bean Roger M. (Richland WA) Brewer Thomas D. (Richland WA) Werpy Todd A. (Richland WA) Darab John G. (Richland, Catalyst material and method of making.
    상세보기
  6. Cuif Jean Pierre, Cerium and zirconium oxides, mixed oxides and solid solutions having improved thermal stability.
    상세보기
  7. Yasaki Shigeru (Tokyo-to JPX) Yoshino Yasutaka (Machida JPX) Ihara Kazunori (Iwakuni JPX), Exhaust gas purifying catalyst for use in an internal combustion engine.
    상세보기
  8. Saito Fumihiko,JPX ; Sakai Shigeru,JPX, Hydroxide-coated rare earth oxide particles.
    상세보기
  9. Bedford Raymond E. (Burton MI) Tsang Chih-Hao M. (Davison MI), Method of making a support containing an alumina-ceria washcoat for a noble metal catalyst.
    상세보기
  10. Voss Kenneth E. (Somerville NJ) Yavuz Bulent O. (Plainfield NJ) Farrauto Robert J. (Westfield NJ) Galligan Michael P. (Clark NJ), Oxidation catalyst with bulk ceria, a second bulk metal oxide, and platinum.
    상세보기
  11. Wang Jiun-Fang (Piscataway NJ), Oxide particles and method for producing them.
    상세보기
  12. Andrean Herv (Paris FRX) Junino Alex (Livry-Gargan FRX), Product based on inorganic or organic lamellar particles, containing a melanotic pigment, process for preparing it and i.
    상세보기
  13. Tajima Shigenobu (Kiyose JPX) Ishii Masatoshi (Fukui JPX) Kimura Yuji (Takefu JPX), Spherical grains of rare earth oxides and a manufacturing method therefor.
    상세보기
  14. Bonneau Lionel (Angliers FRX) Pijolat Michle (La Talaudiere FRX) Prin Marie (Moirans FRX) Soustelle Michel (Saint Etienne FRX) Touret Olivier (Aubervilliers FRX), Thermally stable ceric oxide-based compositions and process for their preparation.
    상세보기
  15. Chopin Thierry (Saint Denis FRX) Vilmin Gabriel (Princeton NJ), Zirconium/cerium mixed oxide catalyst/catalyst support compositions having high/stable specific surfaces.
    상세보기

이 특허를 인용한 특허 (24)

  1. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  2. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  3. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  4. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  5. Yoshida,Masato; Ashizawa,Toranosuke; Terazaki,Hiroki; Ootuki,Yuuto; Kurata,Yasushi; Matsuzawa,Jun; Tanno,Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  6. Masato Yoshida JP; Toranosuke Ashizawa JP; Hiroki Terazaki JP; Yuuto Ootuki JP; Yasushi Kurata JP; Jun Matsuzawa JP; Kiyohito Tanno JP, Abrasive, method of polishing wafer, and method of producing semiconductor device.
    상세보기
  7. Burba, III, John L.; Hassler, Carl R.; O'Kelley, C. Brock; Lupo, Joseph A.; Pascoe, Joseph R., Apparatus for treating a flow of an aqueous solution containing arsenic.
    상세보기
  8. Paik, Un Gyu; Park, Jea Gun; Kim, Sang Kyun; Kim, Ye Hwan; Suh, Myoung Won; Kim, Dae Hyeong, CMP slurry, preparation method thereof and method of polishing substrate using the same.
    상세보기
  9. Oh, Myoung Hwan; Nho, Jun Seok; Kim, Jong Pil; Kim, Jang Yul; Cho, Seung Beom, Cerium carbonate powder, method for preparing the same, cerium oxide powder made therefrom, method for preparing the same, and CMP slurry comprising the same.
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  10. Ota,Isao; Tanimoto,Kenji; Takakuma,Noriyuki, Cerium oxide particles and production method therefor.
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  11. Ikeda, Norihiko; Ueno, Tomikazu, Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersion.
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  12. Witham, Richard Donald; McNew, Edward Bayer; Burba, III, John Leslie, Composition for removing arsenic from aqueous streams.
    상세보기
  13. Burba, III, John L., Composition for treating a fluid.
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  14. Oh, Myoung-hwan; Nho, Jun-seok; Kim, Jang-yul; Kim, Jong-pil; Cho, Seung-beom; Ko, Min-Jin, Method for preparing of cerium oxide powder for chemical mechanical polishing and method for preparing of chemical mechanical polishing slurry using the same.
    상세보기
  15. Schweizer,Albert E.; Jones,Mark E.; Hickman,Daniel A., Oxidative halogenation and optional dehydrogenation of c3+hydrocarbons.
    상세보기
  16. Gulotty, Jr., Robert J.; Jones, Mark E.; Hickman, Daniel A., Oxyhalogenation process using catalyst having porous rare earth halide support.
    상세보기
  17. Gulotty, Jr., Robert J.; Jones, Mark E.; Hickman, Daniel A., Oxyhalogenation process using catalyst having porous rare earth halide support.
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  18. Burba, III, John L.; Oriard, Tim L., Process and apparatus for treating a gas containing a contaminant.
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  19. Jones, Mark E.; Olken, Michael M.; Hickman, Daniel A., Process for the conversion of ethylene to vinyl chloride and novel catalyst compositions useful for such process.
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  20. Hickman, Daniel A.; Henley, John P.; Jones, Mark E.; Marshall, Kenric A.; Reed, Daniel J.; Clarke, William D.; Olken, Michael M.; Walko, Lee E., Process for vinyl chloride manufacture from ethane and ethylene with immediate HCl recovery from reactor effluent.
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  21. Henley, John P.; Jones, Mark E.; Hickman, Daniel A.; Marshall, Kenric A.; Reed, Daniel J.; Clarke, William D.; Olken, Michael M.; Walko, Lee E., Process for vinyl chloride manufacture from ethane and ethylene with partial CHl recovery from reactor effluent.
    상세보기
  22. Cable, Robert; Hassler, Carl; Burba, John, Rare earth removal of hydrated and hydroxyl species.
    상세보기
  23. Psaras, Dimitrios; Gao, Yuan; Haneline, Mason; Lupo, Joseph; Landi, Carol, Removal of arsenic from aqueous streams with cerium (IV) oxide compositions.
    상세보기
  24. Witham, Richard Donald; McNew, Edward Bayer; Burba, III, John Leslie, Water purification device for arsenic removal.
    상세보기

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