초록 ▼

A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which the reagent is at lea

A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which the reagent is at least partially vaporized into a vapor phase, and contacting the vapor phase of the reagent to a substrate resulting in the deposition, at least in part from the vapor phase, of a coating of the reagent which can be controlled so as to have a preferred orientation on the substrate, and an apparatus to accomplish this method.

대표청구항 ▼

[ What is claimed is:] [1.] A method for applying a thin film coating selected from the group consisting of a metal and an oxide to substrates using combustion chemical vapor deposition comprising the steps of:(a) providing a substrate having at least one surface to be coated;(b) selecting a reagent

[ What is claimed is:] [1.] A method for applying a thin film coating selected from the group consisting of a metal and an oxide to substrates using combustion chemical vapor deposition comprising the steps of:(a) providing a substrate having at least one surface to be coated;(b) selecting a reagent and a carrier medium and mixing together said reagent and said carrier medium to form a reagent mixture, the reagent being selected such that at least a portion of the reagent forms the thin film coating selected from the group consisting of the metal and the oxide;(c) combusting at least a portion of said reagent mixture thereby vaporizing a majority of said reagent to form a vapor phase of said reagent;(d) locating said substrate in a zone such that the substrate is heated sufficiently to allow said vapor phase to form the thin film coating on said substrate; and(e) contacting said vapor phase of said reagent with said substrate in said zone for forming the thin film coating selected from the group consisting of the metal and the oxide onto said substrate.