[특허]Positioning apparatus and exposure apparatus using the same

[미국특허] Positioning apparatus and exposure apparatus using the same 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	H01L-021/00
출원번호	US-0061245 (1998-04-17)
우선권정보	JP-0366721 (1997-12-26)
발명자 / 주소	Osanai Eiji,JPX Akutsu Kotaro,JPX Ito Hirohito,JPX
출원인 / 주소	Canon Kabushiki Kaisha, JPX
대리인 / 주소	Fitzpatrick, Cella, Harper & Scinto
인용정보	피인용 횟수 : 58 인용 특허 : 11

초록 ▼

A positioning apparatus includes a movable stage, a first linear motor for moving the stage in a predetermined direction, a platform for supporting the first linear motor, and an inertial force application mechanism for applying a force for canceling a force acting on the platform, which is generated when the stage is moved by the first linear motor. The inertial force application mechanism includes amass body, a guide for supporting and guiding the mass body, a second linear motor for moving the mass body, and a controller for controlling the second linear motor. Since the inertial force application mechanism of the positioning apparatus prevents transmission of vibration generated by an increase in an exciting force of the stage, rapid and precise positioning can be performed.

대표청구항 ▼

[ What is claimed is:] [1.] A positioning apparatus comprising:a platform having a reference surface;a movable stage;a first linear motor for moving said stage in a predetermined direction; andinertial force application means for generating an inertial force, said inertial force application means comprising a mass body, a guide for supporting and guiding said mass body by a static pressure bearing, a second linear motor for moving said mass body, and control means for controlling said second linear motor.

이 특허에 인용된 특허 (11) 인용/피인용 타임라인 분석

Ohishi Shinji (Yokohama JPX) Akutsu Kotaro (Machida JPX) Sakai Toshikazu (Yokohama JPX), Device for positioning control.
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Osanai Eiji (Yokohama JPX), Exposure apparatus including an antivibration control system.
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Kagawa Toshiaki (Tenri JPX), Linear motor device having vibration reduction unit.
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Sakino Shigeo (Yokohama JPX) Osanai Eiji (Yokohama JPX) Negishi Mahito (Yokohama JPX) Horikoshi Michio (Ushiku JPX) Inoue Mitsuru (Kawasaki JPX) Ono Kazuya (Tokyo JPX), Movement guiding mechanism.
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Chiba Shinichi,JPX ; Akutsu Kotaro,JPX, Moving stage apparatus and system using the same.
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Osanai Eiji (Yokohama JPX), Positioning apparatus including a hydrostatic bearing for spacing apart a supporting surface and a guide surface.
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Kubo Tadayuki (Tsuchiura JPX) Osanai Eiji (Yokohama JPX), Positioning mechanism.
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Kobayashi Atsuhisa (Hyogo JPX) Tokunaga Haruhiko (Kanagawa JPX) Moriyama Hitoshi (Kanagawa JPX), Shuttle apparatus for printer.
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Akutsu Kotarao,JPX ; Osanai Eiji,JPX, Stage apparatus and method of mounting a substrate on a substrate holding surface of a substrate chuck in which a subst.
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Akutsu Kotaro (Machida JPX), Static pressure bearing device.
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Akutsu Kotaro (Soka JPX) Osanai Eiji (Yokohama JPX) Kamata Shigeto (Yokohama JPX), Weight supporting apparatus.
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이 특허를 인용한 특허 (58) 인용/피인용 타임라인 분석

Zhai, Bao Nian; Kwan, Ka Shing Kenny; Chen, Wen; Ou, Gang; Liao, You Yong, Active vibration attenuation.
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Nesch,Ivan N.; Morrison,Timothy I., Apparatus and method for precise angular positioning.
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Kwan, Yim Bun P., Balanced positioning system for use in lithographic apparatus.
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Kwan, Yim Bun P., Balanced positioning system for use in lithographic apparatus.
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Kwan, Yim Bun P.; van de Wiel, Wilhelmus J. T. P., Balanced positioning system for use in lithographic apparatus.
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Kwan,Yim Bun P.; van de Wiel,Wilhelmus J. T. P., Balanced positioning system for use in lithographic apparatus.
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Kwan,Yim Bun P.; van de Wiel,Wilhelmus J. T. P., Balanced positioning system for use in lithographic apparatus.
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Yim Bun P. Kwan NL, Balanced positioning system for use lithographic apparatus.
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Novak, W. Thomas; Kovalerchik, Michael, Cantilever stage.
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Sekiguchi, Hiroyuki, Driving apparatus, exposure apparatus, and device manufacturing method.
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Hazelton Andrew J., Driving motors attached to a stage that are magnetically coupled through a chamber.
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Endo, Katsuhisa; Fujita, Takashi; Iida, Kazuhiro, Electric actuator and method of controlling the same.
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Lee Martin E., Exposure apparatus having reaction frame.
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Sercel, Jeffrey P.; Mendes, Marco; Murphy, Jr., Terrence A.; Roberts, Lawrence F.; Szczapa, Paul, Laser machining systems and methods with moving laser scanning stage(s) providing force cancellation.
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Sercel, Jeffrey P.; Mendes, Marco; Murphy, Jr., Terrence A.; Roberts, Lawrence; Song, Xiangyang; Von Dadelszen, Michael, Laser machining systems and methods with multiple beamlet laser beam delivery systems.
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Sercel, Jeffrey P.; Lemmo, Donald J.; Murphy, Jr., Terrence A.; Roberts, Lawrence; Loomis, Tom; Sokol, Miroslaw, Laser machining systems and methods with vision correction and/or tracking.
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Sercel, Jeffrey P.; Lemmo, Donald J.; Murphy, Jr., Terrence A.; Roberts, Lawrence; Loomis, Tom; Sokol, Miroslaw, Laser machining systems and methods with vision correction and/or tracking.
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Roes, Fransiscus Martines, Lithographic apparatus and device manufacturing method.
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Hol, Sven Antoin Johan; Van Eijk, Jan; De Klerk, Angelo Cesar Peter; Van Der Schoot, Harmen Klaas, Lithographic apparatus and motor for use in the apparatus.
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Hol, Sven Antoin Johan; Van Eijk, Jan; De Klerk, Angelo Oscar Peter; Van Der Schoot, Harmen Klaas, Lithographic apparatus and motor for use in the apparatus.
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Hosaka, Akio, Machine tool.
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Poon, Alex Ka Tim; Kho, Leonard Wai Fung; Yang, Pai-Hsueh; Chang, Ping-Wei, Modular stage with reaction force cancellation.
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Vangal-Ramamurthy, Jambunathan; Yan, Kam Fung, Moveable slider for use in a device assembly process.
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Yang, Pai-Hsueh; Yuan, Bausan; Masaki, Kazuo; Hirano, Kazuhiro; Yang, Xiao-Feng; Coakley, Scott; Binnard, Michael B., On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage.
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Sai, Choshoku; Sakino, Shigeo; Asada, Katsumi; Ito, Hirohito; Uchida, Shinji, Optical unit and exposure apparatus having the same.
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Donaher, J. Casey; Simpson, Craig; Dufault, Peter John Gerard, Planar motor system with increased efficiency.
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Waskiewicz Warren K. ; Werder Kurt S., Planar movable stage mechanism.
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Nawata,Ryo; Ito,Hiroshi, Positioning device, exposure apparatus using the positioning device, and device production method.
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Hirohito Ito JP; Kotaro Akutsu JP, Positioning device, exposure device, and device manufacturing method.
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Butler, Hans; Cuijpers, Martinus Agnes Willem; Hoogendam, Christiaan Alexander; De Jongh, Robertus Johannes Marinus; Renkens, Michael Jozef Mathijs; Van Der Wijst, Marc Wilhelmus Maria; Wijckmans, Maurice Willem Jozef Etiënne; Tousain, Robertus Leonardus; Faassen, Ronald Petrus Hendricus; Koevoets, Adrianus Hendrik, Positioning system, lithographic apparatus and device manufacturing method.
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Butler, Hans; Cuijpers, Martinus Agnes Willem; Hoogendam, Christiaan Alexander; De Jongh, Robertus Johannes Marinus; Renkens, Michael Jozef Mathijs; Van Der Wijst, Marc Wilhelmus Maria; Wijckmans, Maurice Willem Jozef Etiënne; Tousain, Robertus Leonardus; Faassen, Ronald Petrus Hendricus; Koevoets, Adrianus Hendrik, Positioning system, lithographic apparatus and device manufacturing method.
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Kniknie, Thijs; Stokkermans, Jozef Petrus Wilhelmus, Semiconductor device positioning system and method for semiconductor device positioning.
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Yukiharu Okubo JP, Stage apparatus and inspection apparatus having stage apparatus.
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Sasaki,Yasuhito; Miyajima,Yoshikazu; Nishimura,Naosuke; Tanaka,Hideo; Nishida,Toshihiko, Stage apparatus, exposure apparatus, and device manufacturing method.
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Asano, Toshiya; Ukaji, Takao, Stage apparatus, exposure apparatus, and device production method.
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Nishi, Kenji, Stage apparatus, scanning type exposure apparatus, and device produced with the same.
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Ono, Kazuya; Hazelton, Andrew J., Stage assembly including a damping assembly.
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Shin Matsui JP; Shinji Ohishi JP; Eiji Osanai JP; Tadayuki Kubo JP, Stage system and exposure apparatus with the same.
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IPC	Description
A	생활필수품
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A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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[미국특허] Positioning apparatus and exposure apparatus using the same 원문보기