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[미국특허] Vibration isolator and method of isolating vibration 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03B-027/42
  • F16M-013/00
출원번호 US-0920010 (1997-08-29)
우선권정보 JP-0239013 (1996-09-10)
발명자 / 주소
  • Hayashi Yutaka,JPX
출원인 / 주소
  • Nikon Corporation, JPX
대리인 / 주소
    Morgan, Lewis & Bockius LLP
인용정보 피인용 횟수 : 75  인용 특허 : 6

초록 ▼

A vibration isolation mount is provided for supporting an apparatus with respect to an installation surface and for controlling vibration of the apparatus. The vibration isolation mount includes a support mount having a first end connected to the installation surface and a second end fixed to the ap

대표청구항 ▼

[ What is claimed is:] [1.] A vibration isolator for suppressing vibration of a body, comprising:a first actuator configured to suppress first components of the vibration of the body that belong to a first frequency band;a second actuator having a stator and a movable member to suppress second compo

이 특허에 인용된 특허 (6) 인용/피인용 타임라인 분석

  1. Mayama Takehiko,JPX, Anti-vibration system.
    상세보기
  2. Wakui Shinji (Kawasaki JPX), Control apparatus for vertical vibration elimination table.
    상세보기
  3. Billoud Guy (Phoenix AZ), Method and apparatus for active damping of vibration.
    상세보기
  4. Gonzalez Walter (Rancho Palos Verdes CA) Gniady John A. (Albuquerque NM), Optical table active leveling and vibration cancellation system.
    상세보기
  5. Schutten Herman P. (Whitefish Bay WI) Weiss Arnold (Minneapolis MN), Seismic isolation system with reaction mass.
    상세보기
  6. Takahashi Masato,JPX, Vibration-preventive apparatus and exposure apparatus.
    상세보기

이 특허를 인용한 특허 (75) 인용/피인용 타임라인 분석

  1. Hanagan, Linda M., Active floor vibration control system.
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  2. Houghton, Jr., Worthington Bowie; Anderson, Eric; Marcinkowski, Jack; Ryaboy, Vyacheslav, Active isolation module.
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  3. Nakajima,Kichio; Busujima,Akira; Ito,Yasushi; Suzuki,Nobuhiko; Yuki,Toru, Active mass damper.
    상세보기
  4. Choy, Ping Kong; Huang, Jinchun; Xing, Xianghua; Yung, Hoi Yue, Active vibration absorber.
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  5. Heiland, Peter, Active vibration isolation system.
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  6. Teel, Andrew Richard; Zaccarian, Luca; Marcinkowski, Jacek Justyn, Active vibration isolation systems with nonlinear compensation to account for actuator saturation.
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  7. Hara, Hiromichi, Anti-vibration system for exposure apparatus.
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  8. Hara, Hiromichi, Anti-vibration system for exposure apparatus.
    상세보기
  9. Shinji Wakui JP; Michio Yanagisawa JP; Takehiko Mayama JP, Anti-vibration system in exposure apparatus.
    상세보기
  10. Morisada,Masahiro, Anti-vibration technique.
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  11. Morisada,Masahiro, Anti-vibration technique.
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  12. Sewell, Harry; Ivaldi, Jorge; Shamaly, John, Catadioptric lithography system and method with reticle stage orthogonal to wafer stage.
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  13. Sewell, Harry; Ivaldi, Jorge; Shamaly, John, Catadioptric lithography system and method with reticle stage orthogonal to wafer stage.
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  14. Heiland, Peter, Combined motion sensor for use in feedback control systems for vibration isolation.
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  15. Kloesch, Peter; Ringel, Michael; Weiss, Markus, Device for damping vibrations in projection exposure apparatuses for semiconductor lithography.
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  16. Bueter, Andreas; Janssen, Enrico; Gaisbauer, Samuel, Device for the purpose of influencing the transfer of vibration between two units.
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  17. Yukio Tokuda JP; Nobuyoshi Deguchi JP; Shigeyuki Uzawa JP; Yukio Takabayashi JP; Hiromichi Hara JP, Driving apparatus and exposure apparatus.
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  18. Griffin William S., Electro-pneumatic actuator and servo-valve for use therewith.
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  19. Malcolm A. Swinbanks GB; Christopher E. Ruckman, Electromagnet support system.
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  20. Kobayashi, Shigeo, Exposure apparatus and method.
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  21. Kayama, Yasunaga, Exposure apparatus and method that exposes a pattern onto a substrate.
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  22. Kawamura, Shuji, Exposure apparatus, producing method of exposure apparatus, and producing method of microdevice.
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  23. Runyon,John Frederick, Fluid isolator assembly and floating elastomeric damping element.
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  24. Nelson, Peter G., High center of gravity stable pneumatic isolator.
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  25. Wang,Yu; Laskaris,Evangelos Trifon; Ranze,Richard Andrew, High field open MRI magnet isolation system and method.
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  26. Wang,Yu; Laskaris,Evangelos Trifon; Ranze,Richard Andrew, High field open MRI magnet isolation system and method.
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  27. Watson, Douglas C.; Bow, Travis, High heat load optics with vibration isolated hoses in an extreme ultraviolet lithography system.
    상세보기
  28. Shimoda, Daisuke; Motoyuki, Katsumi; Watanabe, Yoshio, Linear encoder.
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  29. Franken, Dominicus Jacobus Petrus A.; Loopstra, Erik Roelof; Bartray, Pertrus Rutgerus; Van Der Wijst, Marc Wilhelmus Maria; Renkens, Michael Jozef Mathijs; Van Schothorst, Gerard; Dries, Johan Juliana, Lithographic apparatus and device manufacturing method.
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  30. Franken,Dominicus Jacobus Petrus Adrianus; Loopstra,Erik Roelof; Bartray,Pertrus Rutgerus; Van Der Wijst,Marc Wilhelmus Maria; Renkens,Michael Jozefa Mathijs; Van Schothorst,Gerard; Dries,Johan Julia, Lithographic apparatus and device manufacturing method.
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  31. Butler, Hans; Verbeek, Thijs Rein, Lithographic apparatus and method.
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  32. Galburt, Daniel N.; Kochersperger, Peter C., Lithographic tool with dual isolation system and method for configuring the same.
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  33. Galburt, Daniel N.; Kochersperger, Peter C., Lithographic tool with dual isolation system and method for configuring the same.
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  34. Galburt,Daniel N.; Kochersperger,Peter C., Lithographic tool with dual isolation system and method for configuring the same.
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  35. Galburt,Daniel N.; Kochersperger,Peter C., Lithographic tool with dual isolation system and method for configuring the same.
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  36. Binnard, Michael, Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systems.
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  37. Ueta, Toshio; Binnard, Michael, Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systems.
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  38. Fl철ck,Thomas; Hamann,Jens, Method and apparatus for the diagnosis of natural vibrations in a mechatronic system.
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  39. Kube, Andreas, Method and device for controlling a rotational speed of a drive.
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  40. Hunter, Bradley L.; Cahill, Steven P.; Ehrmann, Jonathan S.; Plotkin, Michael, Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site.
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  41. Hunter,Bradley L.; Cahill,Steven P.; Ehrmann,Jonathan S.; Plotkin,Michael, Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site.
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  42. Shen, Lawrence, Method of animating structural vibration under operational conditions.
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  43. Sato, Kazuo, Method of automatically setting vibration suppression filter.
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  44. Galburt, Daniel N., Method, system, and apparatus for management of reaction loads in a lithography system.
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  45. Galburt, Daniel N., Method, system, and apparatus for management of reaction loads in a lithography system.
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  46. Galburt,Daniel N., Method, system, and apparatus for management of reaction loads in a lithography system.
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  47. Ryaboy, Vyacheslav M.; Kasturi, Prakash S.; Nastase, Adrian S., Methods and devices for active vibration damping of an optical structure.
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  48. Ryaboy, Vyacheslav M.; Kasturi, Prakash S.; Nastase, Adrian S., Methods and devices for active vibration damping of an optical structure.
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  49. Cordingley, James J.; Griffiths, Joseph J.; Smart, Donald V., Methods and systems for precisely relatively positioning a waist of a pulsed laser beam and method and system for controlling energy delivered to a target structure.
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  50. Cordingley,James J.; Griffiths,Joseph J.; Smart,Donald V., Methods and systems for precisely relatively positioning a waist of a pulsed laser beam and method and system for controlling energy delivered to a target structure.
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  51. Watson, Douglas C.; Phillips, Alton H., Modular exposure apparatus with removable optical device and improved isolation of the optical device.
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  52. Binnard, Mike; Watson, Douglas C., Multiple chamber fluid mount.
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  53. Phillips,Alton H.; Watson,Douglas C.; Hazelton,Andrew J., Multiple system vibration isolator.
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  54. Aarts, Jan W.; Baartman, Jan P.; Van Rosmalen, Gerard E., Optical scanning device with parallel-controlled actuators.
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  55. Hof, Albrecht; Maul, Guenter; Muehlbeyer, Michael; Mehlkopp, Klaus, Optical system with isolated measuring structure.
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  56. Mayama, Takehiko, Oscillation isolator.
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  57. Nelson, Peter G., Pneumatic isolator with barometric insensitivity.
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  58. Remington, Paul J.; Knight, John Scott; Murray, Bruce Stuart, Predictive active compensation systems.
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  59. Fu, Jyun-Horng, Robust timed switching control with state measurement.
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  60. van Deuren, Frans H.; Visser, Hendrick Dirk; Stommen, Bernard; van Aert, Jeroen; Mateboer, Aart Johannes, Six degree of freedom (DOF) actuator reaction mass.
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  61. Sato, Mikio, Stage apparatus, exposure apparatus, and device manufacturing method.
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  62. Kropp, Peter A.; Kluth, Peter, Stationary vibration isolation system and method for controlling a vibration isolation system.
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  63. Klopper, Robert, System and method for determining inertia properties of a rigid body.
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  64. Hughes, John G.; Higgins, Thomas E.; Griffin, Jr., Lloyd Daniel, System and method for providing vibration isolation by magnetic levitation.
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  65. Shiraishi, Naomasa, Temperature control method and exposure apparatus thereby.
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  66. Ryaboy, Vyacheslav M., Tunable vibration dampers and methods of manufacture and tuning.
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  67. Chen, Xiaohong; Huang, Shanzhi; Zhou, Hua, Uniform turnover mechanism and method for controlling the same.
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  70. Herren, Andrew James; Barron, Joel, Vibration and sound dampener for heavy machinery.
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  71. Jacques, Robert N.; Warkentin, David J., Vibration control utilizing signal detrending.
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  72. Takahashi, Masato; Ono, Kazuya, Vibration eliminator, exposure apparatus and projection exposure method.
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  73. Michael J. Radziun ; Scott T. Mansell ; David E. Dean ; Dewain A. Purgill, Vibration isolation apparatus for MR imaging system.
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  74. Binnard, Michael; Ono, Kazuya; Hazelton, Andrew J., Wafer stage with magnetic bearings.
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  75. Ogatsu,Toshinobu, Wafer support device and a wafer support method.
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