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Laser gas analyzer and a method of operating the laser to reduce non-linearity errors 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B23K-026/00
출원번호 US-0879276 (1997-06-19)
발명자 / 주소
  • Kidd Gary,CAX
출원인 / 주소
  • KWare Software Systems Inc., CAX
대리인 / 주소
    Marshall, O'Toole, Gerstein, Murray & Borun
인용정보 피인용 횟수 : 19  인용 특허 : 12

초록

A method of operating a laser and a gas analyzer to reduce low frequency and high frequency power non-linearity errors passes a laser beam through a sample gas to a detector. Intensity measurements are taken and compared to a reference set of measurements. The reference set of measurements can be ca

대표청구항

[ I claim:] [1.] A method of reducing low frequency and high frequency power non-linearity errors from components of a spectroscopic absorbance function in operating a laser in a gas analyzer to determine light absorption characteristics of a sample gas, said laser being wavenumber tunable and being

이 특허에 인용된 특허 (12)

  1. Grasdepot Francois (Fontenay-aux-Roses FRX), Method and apparatus for determining the absorption of electromagnetic radiation by a gas.
  2. Wang Annie Q. (Pittsburgh PA), Method and apparatus for determining the concentration of a gas.
  3. Kaiblinger Heinz J. (Munich DEX), Method and apparatus for measuring the concentration of at least one material in a fluid medium mixed materials.
  4. Whittaker Edward A. (Hoboken NJ) Sun Hoi C. (Bloomfield NJ), Method and apparatus for reducing fringe interference in laser spectroscopy.
  5. Tell Robert (Gteborg SEX) Andersson Torbjrn (Gteborg SEX) Lundqvist Stefan (Askim SEX) Ahlberg Henrik (Gteborg SEX), Method and apparatus for spectroscopic measurement of the concentration of a gas.
  6. Hammerich Mads (Hilleroed DKX) Henningsen Jes (Stenloese DKX) Olafsson Ari (Reykjavik ISX), Method and apparatus for the detection of a gas using photoacoustic spectroscopy.
  7. Koch Edmund (Lbeck DEX), Method and arrangement for spectroscopically measuring the concentration of a component of a gas sample.
  8. Baum Marc M. ; Lord Harry C., Optical substance analyzer and data processor.
  9. Schulz Torsten (Karlsruhe DEX) Faubel Werner (Eggenstein-L. DEX), Photo-thermal sensor including an expansion lens in a light beam path through a sample for determining the concentration.
  10. Beck Kent F. ; Owen Charles V., Raman gas analysis system with cavity/boss assembly for precision optical alignment.
  11. Hagans Karla (Livermore CA) Berzins Leon (Livermore CA) Galkowski Joseph (Livermore CA) Seng Rita (Tracy CA), Self-tuning method for monitoring the density of a gas vapor component using a tunable laser.
  12. Thurtell George (38 University Ave. West Guelph ; Ontario CAX N1G 1N4) Kidd Gary (11 Batterswood Ct. Kitchener ; Ontario CAX N2A 3S3) Edwards Grant (378 Willard Ave. Toronto ; Ontario CAX M6S 3R5), Tunable diode laser gas analyzer.

이 특허를 인용한 특허 (19)

  1. Ryan,Daniel J.; Pienkowski,Tom, Apparatus for monitoring the operating status of a laser.
  2. Willuweit, Thomas; Sack, Achim; Griesbach, Ralf, Bulbless spectrometer.
  3. Gytri, Lisa Marie; Lau, Stephen Yu-Hong; Lee, James Forest, Exhaust flow spreading baffle-riser to optimize remote plasma window clean.
  4. Ido, Takuya; Mori, Tetsuya, Gas measurement apparatus and the setting method of width of wavelength modulation in gas measurement apparatus.
  5. Stolle, Ralf; Stark, Hartmut, Gas sensor with open optical measurement path.
  6. Willuweit, Thomas; Griesbach, Ralf, Measuring apparatus, measuring and evaluation apparatus and measurement data system.
  7. Smargiassi, Eugene; Kenane, Boaz; Lee, James; Chen, Xiaolan, Measuring in-situ UV intensity in UV cure tool.
  8. Gytri, Lisa; Gordon, Jeff; Lee, James; Balderrama, Carmen; Harris, Joseph Brett; Smargiassi, Eugene; Lau, Stephen Yu-Hong; Kamian, George D.; Xi, Ming, Method and apparatuses for reducing porogen accumulation from a UV-cure chamber.
  9. Gytri, Lisa; Gordon, Jeff; Lee, James; Balderrama, Carmen; Harris, Joseph Brett; Smargiassi, Eugene; Lau, Stephen Yu-Hong; Kamian, George D.; Xi, Ming, Method for reducing porogen accumulation from a UV-cure chamber.
  10. Liu, Xiaoyong; Huang, Yufeng; Poole, John McKinley; Berkowitz, Gene Smith; Kowal, Anthony; Wehe, Shawn D.; Li, Hejie, Method of calibrating a wavelength-modulation spectroscopy apparatus using a first, second and third gas to determine temperature and pressure values to calculate concentrations of analytes in a gas.
  11. Liu, Xiaoyong; Huang, Yufeng; Poole, John McKinley; Berkowitz, Gene Smith; Kowal, Anthony; Wehe, Shawn D.; Li, Hejie, Method of calibrating a wavelength-modulation spectroscopy apparatus using a first, second, and third gas to determine temperature values to calculate concentrations of an analyte in a gas.
  12. Shrinivasan, Krishnan; Rivkin, Michael; Smargiassi, Eugene; Sabri, Mohamed, Multi-station sequential curing of dielectric films.
  13. Shrinivasan, Krishnan; Rivkin, Michael; Smargiassi, Eugene; Sabri, Mohamed, Multi-station sequential curing of dielectric films.
  14. Smargiassi, Eugene; Lau, Stephen Yu-Hong; Kamian, George D.; Xi, Ming, Purging of porogen from UV cure chamber.
  15. Smargiassi, Eugene; Lau, Stephen Yu-Hong; Kamian, George D.; Xi, Ming, Purging of porogen from UV cure chamber.
  16. Smargiassi, Eugene; Lau, Stephen Yu-Hong; Kamian, George D.; Xi, Ming, Purging of porogen from UV cure chamber.
  17. Shrinivasan, Krishnan; Wang, Feng; Kamian, George; Gentile, Steve; Yam, Mark, Single-chamber sequential curing of semiconductor wafers.
  18. Widen, Kenneth C., Systems and methods for characterizing laser beam quality.
  19. Widen,Kenneth C., Systems and methods for characterizing laser beam quality.
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