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[미국특허] Plasma focus high energy photon source 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-035/20
출원번호 US-0093416 (1998-06-08)
발명자 / 주소
  • Partlo William N.
출원인 / 주소
  • Cymer, Inc.
대리인 / 주소
    Ross, Esq.
인용정보 피인용 횟수 : 67  인용 특허 : 29

초록 ▼

A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical di

대표청구항 ▼

[ What is claimed is:] [1.] A high energy photon source comprising:A. a vacuum chamber,B. at least two electrodes located within said vacuum chamber and defining an electrical discharge region and arranged to create high frequency plasma pinches upon electrical discharge,C. a working gas comprising

이 특허에 인용된 특허 (29) 인용/피인용 타임라인 분석

  1. Mallozzi Philip J. (Columbus OH) Epstein Harold M. (Columbus OH) Jung Richard G. (Columbus OH) Applebaum David C. (Columbus OH) Fairand Barry P. (Columbus OH) Gallagher William J. (Worthington OH) Ue, Applying radiation.
    상세보기
  2. Cirri Gianfranco (Firenze ITX), Cyclotron resonance ion engine.
    상세보기
  3. Neff Willi (Kelmis BEX) Holz Raymond (Herzogenrath DEX) Lebert Rainer (Aachen DEX) Richter Franz (Olching DEX), Device for generating X-radiation with a plasma source.
    상세보기
  4. Silfvast William T. (Winter Springs FL), Efficient narrow spectral width soft-X-ray discharge sources.
    상세보기
  5. Ward Michael A. V. (Arlington MA), Electromagnetic ignition－an ignition system producing a large size and intense capacitive and inductive spark with an i.
    상세보기
  6. Riordan John C. (Carlsbad CA) Pearlman Jay S. (San Diego CA), Filter apparatus for use with an x-ray source.
    상세보기
  7. Gupta Rajendra P. (Gloucester CAX) Kekez Mladen M. (Ottawa CAX) Lau John H. (Gloucester CAX) Lougheed Gary D. (Gloucester CAX), Gas discharge derived annular plasma pinch x-ray source.
    상세보기
  8. Birx Daniel L. (Oakley CA), High voltage pulsed power source.
    상세보기
  9. Lee Ja Hyun (37 E. Governer Drive Newport News VA 23602), Hypocycloidal pinch device.
    상세보기
  10. Asik Joseph R. (Bloomfield Hills MI), Ignition system employing plasma spray.
    상세보기
  11. Roberts Thomas G. (Huntsville AL) Shatas Romas A. (Huntsville AL) Meyer ; III Harry C. (Huntsville AL) Stettler John D. (Huntsville AL), Intense, energetic electron beam assisted X-ray generator.
    상세보기
  12. Asmussen Jes (Okemos MI) Root Joseph J. (East Lansing MI), Ion generating apparatus and method for the use thereof.
    상세보기
  13. Cartz Louis (Milwaukee WI) Weiss Arnold (Minneapolis MN) Schutten Herman P. (Milwaukee WI) Spellman Gordon B. (Mequon WI) Jaskolski Stanley V. (Sussex WI) Wackman ; deceased Peter H. (late of Wauwato, Laser beam plasma pinch X-ray system.
    상세보기
  14. Hammer David A. (Ithaca NY) Kalantar Daniel H. (Ithaca NY) Qi Nian-Sheng (Freeville NY), Method and apparatus for microlithography using x-pinch x-ray source.
    상세보기
  15. Gupta Rajendra P. (Gloucester CAX) Kekez Mladen M. (Ottawa CAX) Lau John H. (Gloucester CAX) Lougheed Gary D. (Gloucester CAX), Multiple vacuum arc derived plasma pinch x-ray source.
    상세보기
  16. McGeoch Malcolm W. (Brookline MA), Plasma X-ray source.
    상세보기
  17. Partlo William Norman, Plasma focus high energy photon source.
    상세보기
  18. Birx Daniel, Plasma gun and methods for the use thereof.
    상세보기
  19. Endo Hiroshi (Yokosuka JPX), Plasma ignition system.
    상세보기
  20. Giardini Dante S. (Dearborn Hts. MI), Plasma jet ignition engine and method.
    상세보기
  21. Weiss, Arnold; Schutten, Herman P.; Cartz, Louis; Spellman, Gordon B.; Jaskolski, Stanley V.; Wackman, deceased, Peter H., Plasma pinch X-ray apparatus.
    상세보기
  22. Weiss Arnold (Minneapolis MN) Schutten Herman P. (Milwaukee WI) Cartz Louis (Milwaukee WI) Spellman Gordon B. (Mequon WI) Jaskolski Stanley V. (Sussex WI) Wackman ; deceased Peter H. (late of Wauwato, Plasma pinch X-ray method.
    상세보기
  23. Anderson William G. (Lancaster PA), Reaction motor structure and method of construction.
    상세보기
  24. Kumakhov Muradin A. (Moscow SUX), Use of a Kumakhov lens for X-ray lithography.
    상세보기
  25. Ward, Michael A. V., Winged reentrant electromagnetic combustion chamber.
    상세보기
  26. Dawson John M. (Los Angeles CA), X-ray generator.
    상세보기
  27. Weiss Arnold (Minneapolis MN) Schutten Herman P. (Milwaukee WI) Cartz Louis (Milwaukee WI) Spellman Gordon B. (Mequon WI) Jaskolski Stanley V. (Sussex WI) Wackman ; deceased Peter H. (late of Wauwato, X-ray lithography system.
    상세보기
  28. Iwamatsu, Seiichi, X-ray source.
    상세보기
  29. Okada Ikuo (Isehara JPX) Saitoh Yasunao (Isehara JPX) Yoshihara Hideo (Yokohama JPX) Nakayama Satoshi (Sayama JPX), X-ray source and X-ray lithography method.
    상세보기

이 특허를 인용한 특허 (67) 인용/피인용 타임라인 분석

  1. Bowering,Norbert R.; Khodykin,Oleh V.; Bykanov,Alexander N.; Fomenkov,Igor V., Alternative fuels for EUV light source.
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  2. Atkinson,David A.; Mottishaw,Paul, Analytical instruments, ionization sources, and ionization methods.
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  3. Ahmad, Imtiaz; Schriever, Guido; Kleinschmidt, Juergen, Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge.
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  4. Hergenhan, Guido; Ziener, Christian, Arrangement for generating extreme ultraviolet radiation by means of an electrically operated gas discharge.
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  5. Bowering,Norbert, Collector for EUV light source.
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  6. Partlo,William N.; Algots,John Martin; Blumenstock,Gerry M.; Bowering,Norbert; Ershov,Alexander I.; Fomenkov,Igor V.; Pan,Xiaojiang, Collector for EUV light source.
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  7. Sandstrom,Richard L.; Algots,John Martin; Brown,Joshua C.; Cybulski,Raymond F.; Dunlop,John; Howey,James K.; Morton,Richard G.; Pan,Xiaojiang; Partlo,William N.; Putris,Firas F.; Watson,Tom A.; Yager,Thomas A., DUV light source optical element improvements.
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  8. Bykanov, Alexander N.; Ershov, Alexander I., Debris protection system having a magnetic field for an EUV light source.
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  9. Jacob,Jonah; Mangano,Joseph A.; Moran,James; Bykanov,Alexander; Petr,Rodney; Rokni,Mordechai, Dense plasma focus radiation source.
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  10. Silfvast William T. ; Klosner Marc A., Discharge lamp sources apparatus and methods.
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  11. Fomenkov,Igor V.; Partlo,William N.; Blumenstock,Gerry M.; Bowering,Nortbert; Oliver,I. Roger; Pan,Xiaojiang; Simmons,Rodney D., Discharge produced plasma EUV light source.
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  12. Walker,John; Webb,R. Kyle; Khodykin,Oleh, Discharge produced plasma EUV light source.
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  13. Partlo, William N.; Sandstrom, Richard L.; Fomenkov, Igor V.; Ershov, Alexander I.; Oldham, William; Marx, William F.; Hemberg, Oscar, EUV collector debris management.
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  14. Bowering,Norbert R.; Hansson,Bjorn A. M.; Simmons,Rodney D., EUV light source.
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  15. Fomenkov,Igor V.; Ershov,Alexander I., EUV light source.
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  16. Fomenkov,Igor V.; Ershov,Alexander I., EUV light source.
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  17. Oliver,I. Roger; Partlo,William N.; Fomenkov,Igor V.; Ershov,Alexander I.; Bowering,Norbert; Viatella,John; Myers,David W., EUV light source.
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  18. Partlo,William N.; Bowering,Norbert; Ershov,Alexander I.; Fomenkov,Igor V.; Myers,David W.; Oliver,Ian Roger; Viatella,John; Jacques,Robert N., EUV light source.
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  19. Partlo,William N.; Ershov,Alexander I.; Fomenkov,Igor V., EUV light source collector erosion mitigation.
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  20. Partlo,William N.; Ershov,Alexander I.; Fomenkov,Igor V.; Myers,David W.; Oldham,William, EUV light source collector erosion mitigation.
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  21. Partlo,William N.; Ershov,Alexander I.; Fomenkov,Igor V.; Khodykin,Oleh, EUV light source collector lifetime improvements.
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  22. Bowering,Norbert R.; Ershov,Alexander I.; Dyer,Timothy S.; Grinolds,Hugh R., EUV light source optical elements.
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  23. Hill, Alan E., Electric oxygen iodine laser.
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  24. Sandstrom, Richard L.; Chung, Tae (Mark) H.; Ujazdowski, Richard C., Extendable electrode for gas discharge laser.
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  25. Sandstrom, Richard L.; Chung, Tae (Mark) H.; Ujazdowski, Richard C., Extendable electrode for gas discharge laser.
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  26. Sandstrom, Richard L.; Chung, Tae (Mark) H.; Ujazdowski, Richard C., Extendable electrode for gas discharge laser.
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  27. Nagai, Shinji; Abe, Tamotsu; Ishihara, Takanobu; Wakabayashi, Osamu, Extreme ultraviolet light generation apparatus.
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  28. Melnychuk, Stephan T.; Partlo, William N.; Fomenkov, Igor V.; Oliver, I. Roger; Ness, Richard M.; Bowering, Norbert; Khodykin, Oleh; Rettig, Curtis L.; Blumenstock, Gerry M.; Dyer, Timothy S.; Simmon, Extreme ultraviolet light source.
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  29. Melnychuk,Stephan T.; Partlo,William N.; Fomenkov,Igor V.; Oliver,I. Roger; Ness,Richard M.; Bowering,Norbert R.; Khodykin,Oleh; Rettig,Curtis L.; Blumenstock,Gerry M.; Dyer,Timothy S.; Simmons,Rodney D.; Hoffman,Jerzy R.; Johnson,R. Mark, Extreme ultraviolet light source.
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  30. Partio, William N.; Fomenkov, Igor V.; Khodykin, Oleh, Extreme ultraviolet light source.
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  31. Bykanov, Alexander N.; Ershov, Alexander I.; Fomenkov, Igor V.; Brandt, David C., Gas management system for a laser-produced-plasma EUV light source.
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  32. Bykanov, Alexander N.; Ershov, Alexander I.; Fomenkov, Igor V.; Brandt, David C., Gas management system for a laser-produced-plasma EUV light source.
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  33. Akins,Robert P.; Sandstrom,Richard L.; Partlo,William N.; Fomenkov,Igor V., High repetition rate laser produced plasma EUV light source.
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  34. Akins,Robert P.; Sandstrom,Richard L.; Partlo,William N.; Fomenkov,Igor V.; Algots,John Martin; Jacques,Robert N.; Palenschat,Frederick; Song,Jun, High repetition rate laser produced plasma EUV light source.
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  35. Bowering, Norbert, High repetition rate laser produced plasma EUV light source.
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  36. Kandaka, Noriaki; Komatsuda, Hideki, High-intensity sources of short-wavelength electromagnetic radiation for microlithography and other uses.
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  37. Simmons,Rodney D.; Viatella,John W.; Hoffman,Jerzy R.; Webb,R. Kyle; Bykanov,Alexander N.; Khodykin,Oleh, LPP EUV drive laser input system.
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  38. Partlo,William N.; Brown,Daniel J. W.; Fomenkov,Igor V.; Ershov,Alexander I.; Myers,David W., LPP EUV light source.
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  39. Ershov, Alexander I.; Bykanov, Alexander N.; Khodykin, Oleh V.; Fomenkov, Igor V., LPP EUV light source drive laser system.
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  40. Ershov,Alexander I.; Bykanov,Alexander N.; Khodykin,Oleh; Fomenkov,Igor V., LPP EUV light source drive laser system.
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  41. Ershov,Alexander I.; Bykanov,Alexander N.; Khodykin,Oleh; Fomenkov,Igor V., LPP EUV light source drive laser system.
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  42. Bykanov, Alexander N.; Algots, J. Martin; Khodykin, Oleh V.; Hemberg, Oscar; Bowering, Norbert R., LPP EUV plasma source material target delivery system.
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  43. Bykanov,Alexander N.; Algots,J. Martin; Khodykin,Oleh; Hemberg,Oscar, LPP EUV plasma source material target delivery system.
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  44. Bykanov, Alexander N.; Bowering, Norbert; Fomenkov, Igor V.; Brandt, David C.; Ershov, Alexander I.; Khodykin, Oleh; Partlo, William N., Laser produced plasma EUV light source.
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  45. Bykanov, Alexander N.; Bowering, Norbert; Fomenkov, Igor V.; Ershov, Alexander I.; Khodykin, Oleh, Laser produced plasma EUV light source.
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  46. Ershov, Alexander I.; Partlo, William N.; Bowering, Norbert; Hansson, Bjorn, Laser produced plasma EUV light source.
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  47. Hill,Alan E., Matched impedance controlled avalanche driver.
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  48. Hill,Alan E., Matched impedance controlled avalanche driver.
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  49. Algots,J. Martin; Hemberg,Oscar; Chung,Tae H., Method and apparatus for EUV light source target material handling.
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  50. Algots, J. Martin; Fomenkov, Igor V.; Ershov, Alexander I.; Partlo, William N.; Sandstrom, Richard L.; Hemberg, Oscar; Bykanov, Alexander N.; Cobb, Dennis W., Method and apparatus for EUV plasma source target delivery.
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  51. Algots,J. Martin; Fomenkov,Igor V.; Ershov,Alexander I.; Partlo,William N.; Sandstrom,Richard L.; Hemberg,Oscar; Bykanov,Alexander N.; Cobb,Dennis W., Method and apparatus for EUV plasma source target delivery.
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  52. Bykanov,Alexander N., Method and apparatus for EUV plasma source target delivery target material handling.
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  53. Derra,Guenther Hans; Niemann,Ulrich, Method of generating extreme ultraviolet radiation.
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  54. Vladimir Mikhailovich Borisov RU; Oleg Borisovich Khristoforov RU, Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it.
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  55. Melnychuk, Stephan T.; Partlo, William N.; Fomenkov, Igor V.; Oliver, I. Roger; Ness, Richard M.; Bowering, Norbert; Khodykin, Oleh, Plasma focus light source with improved pulse power system.
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  56. Sandstrom,Richard L.; Partlo,William N.; Brown,Daniel J. W.; Yager,Thomas A.; Ershov,Alexander I.; Rafac,Robert J.; Rylov,German E., Relax gas discharge laser lithography light source.
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  57. Bykanov,Alexander N.; Khodykin,Oleh, Source material dispenser for EUV light source.
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  58. Schriever,Guido, Stable energy detector for extreme ultraviolet radiation detection.
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  59. Bykanov, Alexander N.; Brandt, David C.; Fomenkov, Igor V.; Partlo, William N., System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus.
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  60. Bowering,Norbert R.; Hoffman,Jerzy R., Systems and methods for EUV light source metrology.
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  61. Bykanov,Alexander N.; Marx,William F., Systems and methods for cleaning a chamber window of an EUV light source.
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  62. Rettig,Curtis L.; Hoffman,Jerzy R.; Vargas,Ernesto L., Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source.
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  63. Ershov, Alexander I.; Marx, William F.; Bowering, Norbert; Hansson, Bjorn A. M.; Khodykin, Oleh; Fomenkov, Igor V., Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source.
    상세보기
  64. Ershov,Alexander I.; Marx,William F., Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source.
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  65. Bowering,Norbert; Hansson,Bjorn A. M., Systems for protecting internal components of a EUV light source from plasma-generated debris.
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  66. Bowering,Norbert R.; Hansson,Bjorn A. M.; Bykanov,Alexander N.; Khodykin,Oleh; Ershov,Alexander I.; Partlo,William N., Systems for protecting internal components of an EUV light source from plasma-generated debris.
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  67. Ershov,Alexander I.; Partlo,William N., Systems for protecting internal components of an EUV light source from plasma-generated debris.
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