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Method of depositing a low k dielectric with organo silane 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/31
출원번호 US-0021788 (1998-02-11)
발명자 / 주소
  • Yau Wai-Fan
  • Cheung David
  • Jeng Shin-Puu
  • Liu Kuowei
  • Yu Yung-Cheng
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Thomason, Moser & Patterson
인용정보 피인용 횟수 : 349  인용 특허 : 50

초록 ▼

A method and apparatus for depositing a low dielectric constant film by reaction of an organo silane compound and an oxidizing gas. The oxidized organo silane film has excellent barrier properties for use as a liner or cap layer adjacent other dielectric layers. The oxidized organo silane film can a

대표청구항 ▼

[ What is claimed is:] [1.] A method for depositing a low dielectric constant film, comprising reacting an organo silane compound and an oxidizing gas at plasma conditions sufficient to deposit a film on a substrate, the plasma conditions comprising a high frequency RF power density from about 0.16

이 특허에 인용된 특허 (50)

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  6. Hochberg Arthur K. (1037 Santa Queta Solana Beach CA 92075) O\Meara David L. (632 S. Freeman Oceanside CA 92054), Deposition of silicon oxide films using alkylsilane liquid sources.
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  11. Petrmichl Rudolph H. (Center Valley PA) Knapp Bradley J. (Kutztown PA) Kimock Fred M. (Macungie PA) Daniels Brian K. (Emmaus PA), Highly abrasion-resistant, flexible coatings for soft substrates.
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  13. Petrmichl Rudolph Hugo ; Mahoney Leonard Joseph ; Venable III Ray Hays ; Galvin Norman Donald ; Knapp Bradley J. ; Kimock Fred Michael, Ion beam process for deposition of highly wear-resistant optical coatings.
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  27. Havemann Robert H. ; Stoltz Richard A., Method of dual masking for selective gap fill of submicron interconnects.
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  38. Wang David N. (Cupertino CA) White John M. (Hayward CA) Law Kam S. (Union City CA) Leung Cissy (Union City CA) Umotoy Salvador P. (Pittsburg CA) Collins Kenneth S. (San Jose CA) Adamik John A. (San R, Plasma-enhanced CVD process using TEOS for depositing silicon oxide.
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  50. Wood Thomas E. (Chandler AZ) Hughes Henry G. (Scottsdale AZ), Spin-on glass for use in semiconductor processing.
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