초록 ▼

A method and apparatus is disclosed for cooling a substrate between high temperature thermal processing steps. In the disclosed embodiment, one or more cooling stations are located off-line within a wafer handling chamber, just outside the thermal processing chamber. After thermal processing, a hot

A method and apparatus is disclosed for cooling a substrate between high temperature thermal processing steps. In the disclosed embodiment, one or more cooling stations are located off-line within a wafer handling chamber, just outside the thermal processing chamber. After thermal processing, a hot wafer can be loaded on to the cooling station, where the wafer is subjected to forced convection cooling. In particular, the wafer is subjected to cooling gas from above and below through perforated upper and lower shower head assemblies. The wafer can thus be cooled rapidly on a cooling station while other wafers are transferred into and out of the processing chamber. Desirably, the wafer is cooled on the cooling station to a point at which it can be handled by a low temperature wafer handler and stored in a low temperature cassette.

대표청구항 ▼

[ What is claimed is:] [8.] A method of cooling substrates that have been subjected to high temperature processing, comprising:providing a substrate handler capable of transporting substrates into and out of a high temperature process chamber;withdrawing a hot substrate from the process chamber with

[ What is claimed is:] [8.] A method of cooling substrates that have been subjected to high temperature processing, comprising:providing a substrate handler capable of transporting substrates into and out of a high temperature process chamber;withdrawing a hot substrate from the process chamber with said substrate handler and transporting said hot substrate into a cooling station accessible by the handler; andinserting a second substrate into the process chamber with said handler while the first mentioned substrate is cooling in the cooling station.