초록 ▼

A method for forming semiconductor devices involves defining a pattern of microspheres on a first structure and transferring that pattern of microspheres to a semiconductor structure. The microspheres may then be used as a mask to define features on the semiconductor structure. In this way, it is po

A method for forming semiconductor devices involves defining a pattern of microspheres on a first structure and transferring that pattern of microspheres to a semiconductor structure. The microspheres may then be used as a mask to define features on the semiconductor structure. In this way, it is possible to form semiconductor devices without necessarily using a stepper. This may result in substantial capital savings in semiconductor manufacturing processes.

대표청구항 ▼

[ What is claimed is:] [1.] A method of forming a semiconductor device comprising:defining a microsphere pattern by forming a plurality of cavities in the surface of a microsphere supporting structure;depositing microspheres randomly on said structure;collecting microspheres in said cavities;using s

[ What is claimed is:] [1.] A method of forming a semiconductor device comprising:defining a microsphere pattern by forming a plurality of cavities in the surface of a microsphere supporting structure;depositing microspheres randomly on said structure;collecting microspheres in said cavities;using said collected microspheres as a mask to define features in said semiconductor device.