초록 ▼

The inventive dispenser mechanism uniformly develops a photosensitive layer on a substrate. The mechanism uses a developer head that moves in a substantially linear relative motion with respect to the substrate and dispenses a developer at a controlled rate. Contact of the developer material with th

The inventive dispenser mechanism uniformly develops a photosensitive layer on a substrate. The mechanism uses a developer head that moves in a substantially linear relative motion with respect to the substrate and dispenses a developer at a controlled rate. Contact of the developer material with the photosensitive layer commences a chemical reaction of developing. The mechanism also uses a rinse head that has the same motion as the developer head and travels at the same velocity. The rinse head dispenses a rinse material at a controlled rate. Contact of the rinse material with the developer material on the photosensitive layer retards the chemical reaction of developing. The rinse head waits for a predetermined dwell period after the developer head has dispensed the developer material before dispensing the rinse material. The mechanism may also use a suction head that has the same motion and velocity and removes loose material on a surface of the substrate.

대표청구항 ▼

[ What is claimed is:] [1.] A method for uniformly developing a photosensitive layer on a substrate, the method comprising the steps of:moving a developer head in a substantially linear relative motion with respect to the photosensitive layer on the substrate, wherein the step of moving the develope

[ What is claimed is:] [1.] A method for uniformly developing a photosensitive layer on a substrate, the method comprising the steps of:moving a developer head in a substantially linear relative motion with respect to the photosensitive layer on the substrate, wherein the step of moving the developer head is initiated at a first end of the substrate and is performed at a velocity;dispensing a developer material at a first controlled rate from the developer head during the step of moving the developer head; wherein contact of the developer material with the photosensitive layer commences a chemical reaction of developing;moving a rinse head in the substantially linear relative motion with respect to the photosensitive layer on the substrate, wherein the step of moving the rinse head is initiated at the first end of the substrate and is performed at the velocity; anddispensing a rinse material at a second controlled rate from the rinse head during the step of moving the rinse head; wherein contact of the rinse material with the developer material on the photosensitive layer retards the chemical reaction of developing.