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Process chamber with inner support 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0637616 (1996-04-25)
발명자 / 주소
  • Wengert John F.
  • Jacobs Loren R.
  • Halpin Michael W.
  • Foster Derrick W.
  • van der Jeugd Cornelius A.
  • Vyne Robert M.
  • Hawkins Mark R.
출원인 / 주소
  • ASM America, Inc.
대리인 / 주소
    Knobbe, Martens, Olson & Bear, LLP
인용정보 피인용 횟수 : 67  인용 특허 : 48

초록 ▼

An improved chemical vapor deposition reaction chamber having an internal support plate to enable reduced pressure processing. The chamber has a vertical-lateral lenticular cross-section with a wide horizontal dimension and a shorter vertical dimension between bi-convex upper and lower walls. A cent

대표청구항 ▼

[ What is claimed is:] [1.] A reduced pressure chamber able to withstand external forces on the chamber which occur when the exterior pressure is greater than the chamber interior pressure comprising:a quartz wall;a quartz lower wall spaced from the upper wall, each wall having a convex outer surfac

이 특허에 인용된 특허 (48)

  1. Kusumoto Yoshiro (Kanagawa JPX) Takakuwa Kazuo (Kanagawa JPX) Ikuta Tetsuya (Kanagawa JPX) Suzuki Akitoshi (Kanagawa JPX) Nakayama Izumi (Kanagawa JPX), ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate.
    상세보기
  2. Anderson Roger N. (San Jose CA) Deacon Thomas E. (San Jose CA) Carlson David K. (Santa Clara CA), Apparatus and method for substrate heating utilizing various infrared means to achieve uniform intensity.
    상세보기
  3. Nakayama Izumi (Hiratsuka JPX) Suzuki Akitoshi (Chigasaki JPX) Nawa Hiroyuki (Chigasaki JPX) Kaneko Motohiro (Fujisawa JPX) Kusumoto Yoshiro (Chigasaki JPX) Takakuwa Kazuo (Chigasaki JPX) Ikuta Tetsu, Apparatus for chemical vapor deposition.
    상세보기
  4. Eichman Eric C. (Phoenix AZ) Sommer Bruce A. (Phoenix AZ) Churley Michael J. (Tempe AZ) Ramsey W. Chuck (Tempe AZ), Apparatus for elimination of low temperature ammonia salts in TiCl4 NH3 CVD reaction.
    상세보기
  5. Schladitz ; Hermann Johannes, Apparatus for metallizing strips, sheets or the like.
    상세보기
  6. Shigeki Susumu (Fukuoka JPX), Apparatus for producing semiconductor devices.
    상세보기
  7. Pawlakowitsch Anton (Mmbris DEX) Schnherr Bernhard (Offenbach am Main DEX), Apparatus to reduce the sagging of the outside walls of vacuum tanks.
    상세보기
  8. Whiffin Peter A. C. (Horsham GB2) Maxey Christopher D. (Crawley GB2) Easton Brian C. (Reigate GBX), CVD reactor vessel for forming a solid state electronic device.
    상세보기
  9. Lee Hsing-Chung (Woodland Hills CA), CVD reactor with uniform layer depositing ability.
    상세보기
  10. Campbell, Bryant A.; DuBois, Dale R.; Manriquez, Ralph F.; Miller, Nicholas E., Chemical vapor deposition apparatus.
    상세보기
  11. Campbell, Bryant A.; Miller, Nicholas E., Chemical vapor deposition apparatus.
    상세보기
  12. Monkowski Joseph R. (Carlsbad CA) Logan Mark A. (Carlsbad CA), Chemical vapor deposition method.
    상세보기
  13. Whiffin Peter A. C. (Horsham GB2) Maxey Christopher D. (Crawley GB2) Easton Brian C. (Reigate GBX), Chemical vapor deposition of cadmium mercury telluride.
    상세보기
  14. Gale Ronald P. (Sharon MA) Fan John C. C. (Chestnut Hill MA), Chemical vapor deposition reactor.
    상세보기
  15. Watanabe Atsushi (Nijigaoka-higashidanchi Room No. 19-103 ; No. 21 ; Kamioka-machi 2-chome ; Meitou-ku Tsurugashima JPX) Amano Hiroshi (Nijigaoka-higashidanchi Room No. 19-103 ; No. 21 ; Kamioka-mach, Compound semiconductor vapor phase epitaxial device.
    상세보기
  16. Andrews Reginald Henry (New Milton EN), Construction of containers or tanks.
    상세보기
  17. Anderson Roger N. (Santa Clara CA) Martin John G. (Cranford NJ) Meyer Douglas (Tempe AZ) West Daniel (Sunnyvale CA) Bowman Russell (San Jose CA) Adams David V. (San Jose CA), Double-dome reactor for semiconductor processing.
    상세보기
  18. Hawkins Mark R. (Mesa AZ) Robinson McDonald (Paradise Valley AZ), Gas injectors for reaction chambers in CVD systems.
    상세보기
  19. Nakagawa Keiji (Kadoma JPX) Nakatani Ikuyoshi (Hazukashi JPX) Sakai Takamasa (Kusatsu JPX) Muraoka Yusuke (Osaka JPX), Heat processing apparatus for semiconductor manufacturing.
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  20. Akimoto Tatsuo (Otsu JPX) Ogasawara Masafumi (Otsu JPX), Heat treatment apparatus.
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  21. Robinson McDonald (Paradise Valley AZ) Ozias Albert E. (Aumsville OR), Heating system for reaction chamber of chemical vapor deposition equipment.
    상세보기
  22. Christensen Robert W. (Monte Sereno CA), Induction heated pancake epitaxial reactor.
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  23. Chang Mei (Cupertino CA) Wang David N. K. (Cupertino CA) White John M. (Hayward CA) Maydan Dan (Los Altos Hills CA), Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films.
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  24. Carlson David K. (Santa Clara CA) Hey H. Peter W. (San Jose CA) Hann James C. (Santa Clara CA), Low temperature etching in cold-wall CVD systems.
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  25. Ghanayem Steve (Sunnyvale CA) Rana Virendra (Los Gatos CA), Metal chemical vapor deposition process using a shadow ring.
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  26. Fujii Takuya (Isehara JPX) Yamazaki Susumu (Hadano JPX), Metal organic chemical vapor deposition method with controlled gas flow rate.
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  27. Dietze Gerald R. (Portland OR) Holman Erik D. (Vancouver WA), Method and apparatus for configuring an epitaxial reactor for reduced set-up time and improved layer quality.
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  28. Wakabayashi Tsuyoshi (Kofu JPX) Ibuka Shigehito (Higashiyamato JPX), Method and apparatus for heat-treating a substrate.
    상세보기
  29. Ozias Albert E. (Aumsville OR), Method for improving the reactant gas flow in a reaction chamber.
    상세보기
  30. Lee Hsing-Chung (Woodland Hills CA), Method of improving layer uniformity in a CVD reactor.
    상세보기
  31. Bonifield Thomas D. (Garland TX) Purdes Andrew J. (Garland TX), Plasma reactor sidewall shield.
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  32. Adams David V. (San Jose CA) Anderson Roger N. (Santa Clara CA) Deacon Thomas E. (San Jose CA), Pressure-resistant thermal reactor system for semiconductor processing.
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  33. Berg Charles A. (Buckfield ME), Process and apparatus for controllably exchanging heat between two bodies.
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  34. Schladitz ; Hermann Johannes, Process for metallizing strips, sheets or the like.
    상세보기
  35. Jrgensen Holger (Aachen DEX) Heyen Meino (Aachen DEX), Quartz-glass reactor for MOCVD systems.
    상세보기
  36. Shimizu Hiroshi (Yokohama JPX), Radiant heating apparatus.
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  37. Sandys Norman (16 Crescent Dr. Searingtown NY), Reactor for heating semiconductor substrates.
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  38. Hoke William E. (Wayland MA) Pan Noren (Nashua NH) Carter James R. (North Grafton MA), Reactor vessel for the growth of heterojunction devices.
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  39. Lenski Harald (Ueberlingen DEX), Reflector furnace.
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  40. deBoer Wiebe B. (Kromme Molenweg 10 5521 GB Eersel OR NLX) Ozias Albert E. (7515 Poet Rd. ; S.E. Aumsville OR 97325), Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment.
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  41. Anderson Roger N. (San Jose CA) Hey H. Peter W. (San Jose CA) Beinglass Israel (Sunnyvale CA) Venkatesan Mahalingam (San Jose CA), Semiconductor wafer process chamber with susceptor back coating.
    상세보기
  42. Lesk Israel A. (Phoenix AZ) Rice ; Jr. M. John (Tempe AZ) Sarma Kalluri R. (Mesa AZ), Silicon deposition process.
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  43. Crabb Richard (Mesa AZ) Robinson McDonald (Paradise Valley AZ) Hawkins Mark R. (Mesa AZ) Goodwin Dennis L. (Tempe AZ) Ferro Armand P. (Scottsdale AZ) deBoer Wiebe B. (Eersel OR NLX) Ozias Albert E. (, Substrate loading apparatus for a CVD process.
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  44. Perlov Ilya (Santa Clara CA), Susceptor drive and wafer displacement mechanism.
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  45. Kobayashi Toshiyuki (Amagasaki JPX) Koshinaka Masao (Amagasaki JPX) Kinoshita Yoshimi (Amagasaki JPX) Oda Masao (Amagasaki JPX) Yoshizawa Kenji (Amagasaki JPX), Thin film forming apparatus having a gas flow settling device.
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  46. Brittin Craig E. (Lockport NY), Vacuum brazing of aluminum alloy workpieces.
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  47. Nakamura Yoshiaki (Yokohama JPX), Vapor growth apparatus having a diffuser section containing a flow regulating member.
    상세보기
  48. Adams David V. (San Jose CA) Anderson Roger N. (San Jose CA), Wafer reactor vessel window with pressure-thermal compensation.
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  11. White, John M.; Verplancken, Donald; Kurita, Shinichi, Electronic device manufacturing chamber method.
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  12. Brabant, Paul D.; Italiano, Joseph P.; Arena, Chantal J.; Tomasini, Pierre; Raaijmakers, Ivo; Bauer, Matthias, Epitaxial semiconductor deposition methods and structures.
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  13. Brabant, Paul D.; Italiano, Joseph P.; Arena, Chantal J.; Tomasini, Pierre; Raaijmakers, Ivo; Bauer, Matthias, Epitaxial semiconductor deposition methods and structures.
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  14. Brabant,Paul D.; Italiano,Joseph P.; Arena,Chantal J.; Tomasini,Pierre; Raaijmakers,Ivo; Bauer,Matthias, Epitaxial semiconductor deposition methods and structures.
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