초록 ▼

A sputter source has at least two electrically mutually isolated stationary bar-shaped target arrangements mounted one alongside the other and separated by respective slits. Each of the target arrangements includes a respective electric pad so that each target arrangement may be operated electricall

A sputter source has at least two electrically mutually isolated stationary bar-shaped target arrangements mounted one alongside the other and separated by respective slits. Each of the target arrangements includes a respective electric pad so that each target arrangement may be operated electrically independently from the other target arrangement. Each target arrangement also has a controlled magnet arrangement for generating a time-varying magnetron field upon the respective target arrangement. The magnet arrangements may be controlled independently from each other. The source further has an anode arrangement with anodes alongside and between the target arrangements and/or along smaller sides of the target arrangements.

대표청구항 ▼

[ What is claimed is:] [1.] A sputter source with at least two electrically mutually isolated stationary bar-shaped target arrangements mounted one alongside the other and separated by respective slits, each of said target arrangements comprising a respective electric pad so that each of said target

[ What is claimed is:] [1.] A sputter source with at least two electrically mutually isolated stationary bar-shaped target arrangements mounted one alongside the other and separated by respective slits, each of said target arrangements comprising a respective electric pad so that each of said target arrangements may be operated electrically independently from the other target arrangement and wherein each target arrangement comprises a controlled magnet arrangement generating a time-varying magnetron field upon the respective target arrangement and wherein the magnet arrangements are controlled independently from each other.