Method for improving electrical conductivity of metals, metal alloys and metal oxides
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H05H-001/48
B05D-005/12
출원번호
US-0174132
(1998-10-16)
발명자
/ 주소
Muffoletto Barry C.
Shah Ashish
출원인 / 주소
Wilson Greatbatch Ltd.
대리인 / 주소
Hodgson, Russ, Andrews, Woods & Goodyear LLP
인용정보
피인용 횟수 :
17인용 특허 :
10
초록▼
A method for improving the electrical conductivity of a substrate of metal, metal alloy or metal oxide comprising depositing a small or minor amount of metal or metals from Group VIIIA metals (Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt) or from Group IA metals (Cu, Ag, Au) on a substrate of metal, metal all
A method for improving the electrical conductivity of a substrate of metal, metal alloy or metal oxide comprising depositing a small or minor amount of metal or metals from Group VIIIA metals (Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt) or from Group IA metals (Cu, Ag, Au) on a substrate of metal, metal alloys and/or metal oxide from Group IVA metals (Ti, Zr, Hf), Group VA metals (V, Nb, Ta), Group VIA metals (Cr, Mo, W) and Al, Mn, Ni and Cu. The native oxide layer of the substrate is changed from electrically insulating to electrically conductive. The step of depositing is carried out by a low temperature arc vapor deposition process. The deposition may be performed on either treated or untreated substrate. The substrate with native oxide layer made electrically conductive is useable in the manufacture of electrodes for devices such as capacitors and batteries.
대표청구항▼
[ What is claimed is:] [1.] A method of improving electrical conductivity of metals, metal alloys and metal oxides comprising:a) providing a substrate having an electrically insulating native oxide layer on a surface thereof, said substrate being selected from the group consisting of Group IVA, Grou
[ What is claimed is:] [1.] A method of improving electrical conductivity of metals, metal alloys and metal oxides comprising:a) providing a substrate having an electrically insulating native oxide layer on a surface thereof, said substrate being selected from the group consisting of Group IVA, Group VA and Group VIA metals, aluminum, manganese, nickel, copper and stainless steel; andb) utilizing a low temperature arc vapor deposition process to deposit on said native oxide layer a metal selected from the group consisting of Group IA and Group VIIIA metals;c) whereby said native oxide layer is changed from being electrically insulating to being more electrically conductive.
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이 특허에 인용된 특허 (10)
Welty Richard P. (Boulder CO), Apparatus and method for coating a substrate using vacuum arc evaporation.
Pinkhasov Eduard (Forest Hills NY), Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum.
Wu Juei-kuo,TWX ; Chen Kuen-Chu,TWX ; Chen Weng-Yi,TWX, Method of fabricating a conductive plug with a low junction resistance in an integrated circuit.
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