[특허]Catadioptric optical system

[미국특허] Catadioptric optical system 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G02B-017/00
출원번호	US-0286376 (1999-04-05)
우선권정보	JP-0111509 (1998-04-07)
발명자 / 주소	Takahashi Tomowaki,JPX Misawa Junichi,JPX
출원인 / 주소	Nikon Corporation, JPX
대리인 / 주소	Oliff & Berridge, PLC
인용정보	피인용 횟수 : 39 인용 특허 : 6

초록 ▼

A catadioptric optical system (10, 110) capable of forming an image of an object. The system comprises a first optical axis (Z.sub.1) having a first end (12) and a second end (14), with a concave mirror (M.sub.C) arranged at the first end. A second surface (P.sub.2) orthogonal to the first optical axis is provided at the second end. A reflective surface (M) is arranged between the concave mirror and the second surface. A first imaging optical system (A) comprising a first plurality of lenses (L.sub.1 -L.sub.4) is arranged between the reflective surface and the concave mirror. A second imaging optical system (B) comprising a second plurality of lenses (L.sub.5 -L.sub.9) is arranged between the reflective surface and the second surface. The system further includes a second optical axis (Z.sub.2) intersecting the first optical axis at the reflective surface and having a first surface (P.sub.1) disposed along and orthogonal to the secondary optical axis. The first surface is divided into first and second regions (30 and 32) by a line of intersection Q.sub.1, between the first surface and a plane containing the first optical axis and the second optical axis. The object is arranged in one of the first and second regions of the first surface. The image is formed in one of first and second regions (36 and 38) of the second surface formed by a line of intersection Q.sub.2 between the second surface and a plane containing the first optical axis and the second optical axis. Alternatively, the first and second regions of the first and second surface are formed by a line of intersection between the first and second surface and a plane orthogonal to the first optical axis that includes the second optical axis. Also, an intermediate image (C) of the object is formed in the vicinity of the reflective surface. The system also preferably satisfies a number of design conditions.

대표청구항 ▼

[ What is claimed is:] [1.] A catadioptric optical system capable of forming an image of an object, comprising:a) a first optical axis having a first end and a second end, with a concave mirror arranged at said first end, and a second surface orthogonal to said first optical axis at said second end;b) a reflective surface arranged between said concave mirror and said second surface;c) a first imaging optical system comprising a first plurality of lenses arranged between said reflective surface and said concave mirror;d) a second imaging optical system comprising a second plurality of lenses arranged between said reflective surface and said second surface;e) a second optical axis intersecting said first optical axis at said reflective surface and having a first surface disposed along and orthogonal to said second optical axis and removed from said reflective surface, said first surface being divided into first and second regions by a line of intersection between said first surface and a plane containing said first optical axis and said second optical axis;f) wherein the object is arranged in one of said first and second regions of said first surface or first and second regions of said second surface, and the image is formed in one of said first and second regions of the opposite one of said first or said second surface, said first and second regions of said second surface being formed by dividing said second surface by a line of intersection between said second surface and the plane containing said first optical axis and said second optical axis; andg) wherein an intermediate image of the object is formed in the vicinity of said reflective surface.

이 특허에 인용된 특허 (6) 인용/피인용 타임라인 분석

Takahashi Tomowaki (Yokohama JPX), Catadioptric optical system and exposure apparatus having the same.
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Takahashi Tomowaki (Yokohama JPX), Catadioptric optical system and exposure apparatus having the same.
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Hashimoto Sumio (Tokyo JPX) Ichihara Yutaka (Yokohama JPX), Catadioptric reduction projection optical system.
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Takahashi Tetsuo,JPX ; Omura Yasuhiro,JPX, Catadioptric system for photolithography.
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Schoenmakers Wijnand P. (Belmont CA), Off-axis catadioptric projection system.
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Friedman Irwin (Weston CT), Single mirror projection optical system.
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이 특허를 인용한 특허 (39) 인용/피인용 타임라인 분석

Sewell, Harry; Ivaldi, Jorge; Shamaly, John, Catadioptric lithography system and method with reticle stage orthogonal to wafer stage.
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Sewell, Harry; Ivaldi, Jorge; Shamaly, John, Catadioptric lithography system and method with reticle stage orthogonal to wafer stage.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
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Shafer,David; Ulrich,Wilhelm; Dodoc,Aurelian; Von Buenau,Rudolf; Mann,Hans Juergen; Epple,Alexander, Catadioptric projection objective.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective including an aspherized plate.
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Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
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Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
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Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
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Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
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Epple, Alexander; Ulrich, Wilhelm; Dodoc, Aurelian; Mann, Hans-Juergen; Shafer, David, Catadioptric projection objective with mirror group.
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Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; von Buenau, Rudolf Murai; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective with parallel, offset optical axes.
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Takahashi,Tomowaki, Catadioptric system and exposure device having this system.
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Shafer, David R.; Ulrich, Wilhelm; Dodoc, Aurelian; von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Immersion catadioptric projection objective having two intermediate images.
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Ohtomo Fumio,JPX ; Ishinabe Ikuo,JPX ; Kodaira Jun-ichi,JPX, Laser beam direction correcting optical system for a surveying instrument.
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Shafer, David R.; Hudyma, Russell; Ulrich, Wilhelm, Microlithographic reduction projection catadioptric objective.
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Schuster, Karl-Heinz; Clauss, Wilfried, Microlithography projection objective with crystal lens.
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Kamenow,Vladimir; Kraehmer,Daniel; Totzeck,Michael; Gruner,Toralf; Dodoc,Aurelian; Shafer,David; Ulrich,Wilhelm; von Buenau,Rudolf; Mann,Hans Juergen; Epple,Alexander, Projection exposure apparatus.
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Omura, Yasuhiro, Projection exposure apparatus and method.
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Omura, Yasuhiro; Takahashi, Tetsuo; Ikeda, Masatoshi; Li, Shiwen, Projection exposure apparatus and method.
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Takahashi, Tomowaki; Tsukamoto, Hiroyuki, Projection exposure apparatus, projection exposure method and catadioptric optical system.
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Beder, Susanne; Singer, Wolfgang; Schuster, Karl-Heinz, Projection objective having a high aperture and a planar end surface.
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Beder,Susanne; Singer,Wolfgang; Schuster,Karl Heinz, Projection objective having a high aperture and a planar end surface.
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Rostalski,Hans Juergen; Schuster,Karl Heinz; Hudyma,Russell; Ulrich,Wilhelm; Freimann,Rolf, Refractive projection objective.
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Rostalski,Hans Juergen; Schuster,Karl Heinz; Hudyma,Russell; Ulrich,Wilhelm; Freimann,Rolf, Refractive projection objective.
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Shafer, David R.; Armstrong, J. Joseph; Chuang, Yung-Ho, Small ultra-high NA catadioptric objective using aspheric surfaces.
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Schuster,Karl Heinz, Very high-aperture projection objective.
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Schuster,Karl Heinz, Very high-aperture projection objective.
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Schuster,Karl Heinz, Very-high aperture projection objective.
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Schuster,Karl Heinz, Very-high aperture projection objective.
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[미국특허] Catadioptric optical system 원문보기

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이 특허에 인용된 특허 (6) 인용/피인용 타임라인 분석

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