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III-V arsenide-nitride semiconductor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-033/00
  • H01L-031/0304
출원번호 US-0908766 (1997-08-07)
발명자 / 주소
  • Major Jo S.
  • Welch David F.
  • Scifres Donald R.
출원인 / 주소
  • SDL, Inc.
대리인 / 주소
    Carothers, Jr.
인용정보 피인용 횟수 : 38  인용 특허 : 13

초록

III-V arsenide-nitride semiconductor are disclosed. Group III elements are combined with group V elements, including at least nitrogen and arsenic, in concentrations chosen to lattice match commercially available crystalline substrates. Epitaxial growth of these III-V crystals results in direct band

대표청구항

[ We claim:] [1.] A Group III-As.sub.1-x N.sub.x semiconductor comprising:a semiconductor substrate;at least one region formed on said substrate comprising one or more monolayers substantially of N with at least one Group III element interspersed with one or more monolayers comprised substantially o

이 특허에 인용된 특허 (13)

  1. Ohba Yasuo (Yokohama JPX) Izumiya Toshihide (Tokyo JPX) Hatano Ako (Tokyo JPX), AlGaN compound semiconductor material.
  2. Khan Muhammad A. (White Bear Lake MN) VanHove James M. (Eagan MN) Olson Donald T. (Circle Pines MN), Aluminum gallium nitride laser.
  3. Arimoto Satoshi (Itami JPX), Crystal growth method.
  4. Khan Muhammed A. (White Bear Lake) VanHove James M. (Eagan) Kuznia Jon N. (Fridley) Olson Donald T. (Circle Pines MN), High electron mobility transistor with GaN/AlxGa1-xN heterojunctions.
  5. Khan Muhammad A. (White Bear Lake MN) Kuznia Jonathon N. (Bloomington MN) Van Hove James M. (Eagan MN), Narrow band algan filter.
  6. Ruehrwein Robert Arthur (181 Hudson Ave. Tenafly NJ 07670), Process for III-V compound epitaxial crystals utilizing inert carrier gas.
  7. Hatano Ako (Tokyo JPX) Izumiya Toshihide (Tokyo JPX) Ohba Yasuo (Yokohama JPX), Semiconductor laser using five-element compound semiconductor.
  8. Ota Hiroyuki (Iruma JPX) Watanabe Atsushi (Iruma JPX), Semiconductor light emitting device.
  9. Pankove Jacques I. (Boulder CO), Semiconductor light emitting device.
  10. Ota Hiroyuki (Iruma JPX) Watanabe Atsushi (Iruma JPX), Semiconductor light emitting element.
  11. Manabe Katsuhide (Ichinomiya JPX) Kato Hisaki (Komaki JPX) Akasaki Isamu (Machida JPX) Hiramatsu Kazumasa (Yokkaichi JPX) Amano Hiroshi (Hamamatsu JPX), Substrate for growing gallium nitride compound-semiconductor device and light emitting diode.
  12. Van de Walle Chris (Menlo Park CA) Bour David P. (Cupertino CA), TM-polarized laser emitter using III-V alloy with nitrogen.
  13. Khan M. Asif (Burnsville MN) Schulze Richard G. (Hopkins MN) Skogman Richard A. (Plymouth MN), Tunable cut-off UV detector based on the aluminum gallium nitride material system.

이 특허를 인용한 특허 (38)

  1. Watanabe,Takayuki; Shibata,Yoshihiko; Ujihara,Tsuyoshi; Yoshida,Takashi; Oyama,Akihiko, Compound semiconductor multilayer structure, hall device, and hall device manufacturing method.
  2. Nakamura,Masahiro; Mino,Akiko, Cross-shaped Hall device having extensions with slits.
  3. Jeffrey D. Morse ; Gregory A. Cooper, Current isolating epitaxial buffer layers for high voltage photodiode array.
  4. Hasnain, Ghulam; Schneider, Richard P.; Corzine, Scott W.; Hueschen, Mark; Takeuchi, Tetsuya; Mars, Danny E., Efficiency GaN-based light emitting devices.
  5. Wang, Tao, GaN structures having low dislocation density and methods of manufacture.
  6. Otsuka, Nobuyuki; Mizuno, Koichi; Yoshii, Shigeo; Suzuki, Asamira, Gallium indium nitride arsenide based epitaxial wafer, a hetero field effect transistor using the wafer, and a method of fabricating the hetero field effect transistor.
  7. Nuyen, Linh T., Heterojunction III-V transistor, in particular HEMT field effect transistor or heterojunction bipolar transistor.
  8. Chen, Tze-Chiang; Hekmatshoartabari, Bahman; Sadana, Devendra K.; Shahidi, Ghavam G.; Shahrjerdi, Davood, Heterojunction light emitting diode.
  9. Chen, Tze-Chiang; Hekmatshoartabari, Bahman; Sadana, Devendra K.; Shahidi, Ghavam G.; Shahrjerdi, Davood, Heterojunction light emitting diode.
  10. Alberi, Kirstin; Mascarenhas, Angelo; Wanlass, Mark, High bandgap III-V alloys for high efficiency optoelectronics.
  11. Choi, Sang Hyouk; Park, Yeonjoon; King, Glen C.; Kim, Hyun-Jung; Lee, Kunik, High mobility transport layer structures for rhombohedral Si/Ge/SiGe devices.
  12. Choi, Sang Hyouk; Park, Yeonjoon; King, Glen C.; Kim, Hyun-Jung; Lee, Kunik, High mobility transport layer structures for rhombohedral Si/Ge/SiGe devices.
  13. Park, Yeonjoon; Choi, Sang H.; King, Glen C.; Elliott, James R., Hybrid bandgap engineering for super-hetero-epitaxial semiconductor materials, and products thereof.
  14. Chen, Tze-Chiang; Hekmatshoartabari, Bahman; Sadana, Devendra K.; Shahidi, Ghavam G.; Shahrjerdi, Davood, III-V heterojunction light emitting diode.
  15. Lu, Yicheng; Emanetoglu, Nuri W., Integrated tunable surface acoustic wave technology and sensors provided thereby.
  16. Kushibe, Mitsuhiro; Ohba, Yasuo; Hashimoto, Rei; Takaoka, Keiji, Laminated semiconductor substrate and optical semiconductor element.
  17. Kushibe,Mitsuhiro; Ohba,Yasuo; Hashimoto,Rei; Takaoka,Keiji, Laminated semiconductor substrate and optical semiconductor element.
  18. Koike,Masayoshi; Yamazaki,Shiro; Kojima,Akira, Light-emitting device using group III nitride group compound semiconductor.
  19. Johnson,Ralph H., Low temperature grown layers with migration enhanced epitaxy adjacent to an InGaAsN(Sb) based active region.
  20. Taylor, James A.; Tal, Oren; Tal, Reuven, Method and system for user prioritization within call completion services using a preferred allocation of resources.
  21. Lee, Sang Don, Method of producing multi-wavelength semiconductor laser device.
  22. Lee, Sang Don, Method of producing multi-wavelength semiconductor laser device.
  23. Johnson,Ralph H., Migration enhanced epitaxy fabrication of active regions having quantum wells.
  24. Johnson,Ralph H.; Blasingame,Virgil J., Migration enhanced epitaxy fabrication of quantum wells.
  25. Friedman,Daniel J.; Geisz,John F., Multi-junction solar cell device.
  26. Walukiewicz, Wladyslaw; Yu, Kin Man; Wu, Junqiao, Multiband semiconductor compositions for photovoltaic devices.
  27. Johnson,Ralph H., Multicomponent barrier layers in quantum well active regions to enhance confinement and speed.
  28. Fetzer, Christopher M.; King, Richard R.; Colter, Peter C., Multijunction solar cell having a lattice mismatched GrIII-GrV-X layer and a composition-graded buffer layer.
  29. Ishibashi, Akihiko; Yokogawa, Toshiya, Nitride semiconductor light-emitting device comprising multiple semiconductor layers having substantially uniform N-type dopant concentration.
  30. Nishida, Sosuke; Takatsuka, Toshinori, Position detection apparatus.
  31. Hanna,Mark Cooper; Reedy,Robert, Reactive codoping of GaAlInP compound semiconductors.
  32. Kamiyama Satoshi,JPX ; Kume Masahiro,JPX ; Miyanaga Ryoko,JPX ; Kidoguchi Isao,JPX ; Ban Yuzaburo,JPX ; Tsujimura Ayumu,JPX ; Hasegawa Yoshiaki,JPX ; Ishibashi Akihiko,JPX, Semiconductor laser device.
  33. Cotal, Hector L.; Sherif, Raed A., Solar cell having front grid metallization that does not contact the active layers.
  34. King, Richard R.; Fetzer, Christopher M.; Colter, Peter C., Solar cells having a transparent composition-graded buffer layer.
  35. King, Richard R.; Fetzer, Christopher M.; Colter, Peter C., Solar cells having a transparent composition-graded buffer layer.
  36. Johnson,Ralph H., Use of GaAs extended barrier layers between active regions containing nitrogen and AlGaAs confining layers.
  37. Johnson, Ralph H., Vertical cavity surface emitting laser having strain reduced quantum wells.
  38. Johnson, Ralph H.; Penner, R. Scott; Biard, James Robert, Vertical cavity surface emitting laser with undoped top mirror.

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