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Make-up air handler and method for supplying boron-free outside air to clean rooms 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-015/02
출원번호 US-0099458 (1998-06-18)
발명자 / 주소
  • Johnson Roy P.
출원인 / 주소
  • SEH America, Inc.
대리인 / 주소
    Oliff & Berridge, PLC
인용정보 피인용 횟수 : 17  인용 특허 : 31

초록

A make-up air handler for supplying outside air to clean environments such as clean rooms in semiconductor fabrication facilities includes a flow passage through which the outside air is passed. At least one filter is disposed to filter the outside air passing through the flow passage. The make-up a

대표청구항

[ What is claimed is:] [1.] An air filtration system for supplying filtered air to a clean environment, comprising:a make-up air handler, including:a flow passage having an inlet end through which outside air is introduced into the flow passage and an outlet end through which the outside air is exha

이 특허에 인용된 특허 (31)

  1. Pelosi ; Jr. Michael H. (520 Abbott Drive Broomall PA 19008), Air distribution ceiling.
  2. O\Keefe Donald L. (Wyoming MI) Belka ; Jr. Thomas J. (Dorr MI), Air filtration unit.
  3. Welch Henry W. (5332 Riverbriar Knoxville TN 37919) Bloomfield Theodore G. (1140 Buxton Dr. Knoxville TN 37922), Air handling system and method for an operating room.
  4. Marsh R. Claude (Albuquerque NM), Air handling system for laminar flow clean enclosure.
  5. Peters Max D. (Plymouth MN), Clean air cabinet.
  6. Kinkead Devon A. (10 Hector Ave. Cumberland RI 02864) Rezuke Robert W. (127 Worcester Rd. North Grafton MA 01536) Higley John K. (14 Saddlebrook Rd. Sherborn MA 01770), Clean room air filtering.
  7. Kleinsek Don A. (W5036N CTH A Elkhart Lake WI 53020), Clean room and clean room containment center.
  8. Hedrick Geoffrey S. (Malvern PA), Clean room ceiling grid system.
  9. Goossens Harry J. (Grandville MI) Kamper Frederic E. (Redlands CA), Clean room head assembly.
  10. Hashimoto Takayoshi (Kanagawa JPX), Clean room system.
  11. Johnson Roy P. ; Wilkinson Donald L., Clean storage unit air flow system.
  12. Davis, George B., Compact blower and filter assemblies for use in clean air environments.
  13. Hansen David J., Filling machine having a microfiltrated clean air supply system.
  14. Deckas Peter C. (Edina MN) Cooper James A. (New Hope MN) Leebens ; Jr. James V. (Minneapolis MN), Filter assembly for clean air rooms and work stations.
  15. Monson Donald R. (West St. Paul MN) Leblanc James A. (Eden Prairie MN), Filter cap for clean room ceiling grid system.
  16. Schuler Frederick E. (St. Paul MN), Filter element support member.
  17. Riutta Raine (1727 Island Avenue Vancouver ; British Columbia CAX V5P 2S5), Filtration apparatus with bag-like plenum chamber.
  18. Rosen Richard M. (5730 NW. 60th Pl. Parkland FL 33067), Gasketed multi-media air cleaner.
  19. Hedrick Geoffrey S. (Malvern PA), Integral grid structure for providing negative pressure plenum.
  20. Mateson Mark E. (905 Berkeley Rd. Wilmington DE 19807), Laminar air flow hazardous materials abatement method and system.
  21. Vross Anthony R. ; Sipos Jeffrey J. ; Simon ; Jr. James J., Mobile vessel for removal of noxious fumes.
  22. Austin Frank X. (Plymouth MI), Modular clean room structure.
  23. Decker Donald W. (Millbrook NY) Pepe Edward L. (Middletown NY), Planar clean room ceiling structure.
  24. Palmer David W. (200 Berkeley Rd. North Andover MA 01845), Process-chamber flow control system.
  25. Monson Donald R. (West St. Paul MN) LeBlanc James A. (Eden Prairie MN) Tokar Joseph C. (Apple Valley MN), Support for clean room ceiling grid system.
  26. Vross Anthony R. (Youngstown OH) Fagan George V. (Woodbridge NJ), System for removal of noxious fumes.
  27. Howeth D. Franklin (233 Chuck Wagon Trail Fort Worth TX 76108), Top loading and inverted backflushed air filter systems.
  28. Greisz Mark J., Two-stage air filter for use with electronic enclosures.
  29. George Nelson A. (North East MD) Sutsko Michael G. (Glen Mills PA) McKenna Douglas B. (Dover DE), ULPA filter.
  30. Shuler Bernard R. (Louisville KY), Ventilated ceiling construction.
  31. Shuler Bernard R. (Louisville KY), Ventilating air filtering and distributing device.

이 특허를 인용한 특허 (17)

  1. Osborne, Michael W.; Rahmathullah, M. Aflal; Ng, Cheah Wei, Air handling filtration equipment with adjustable media bed and method of use.
  2. Osborne, Michael W.; Rahmathullah, M. Aflal; Ng, Cheah Wei, Air handling filtration equipment with adjustable media bed and method of use.
  3. Sangi, Daryoush, Aseptic bottling or container filling plant with a clean room arrangement enclosing the aseptic bottling or container filling plant and a filter unit for filtering air entering the clean room, and a method of operation thereof.
  4. Ryan, Raymond F.; McNally, John H., Bag in, bag out filter assembly.
  5. Nakano,Hitoshi; Arakawa,Kiyoshi, Chemical filter arrangement for a semiconductor manufacturing apparatus.
  6. Renz Manfred,DEX, Clean room.
  7. Fassel, Robert Scott; Christie, Scott Aaron, Filtration system.
  8. Fassel, Robert Scott; Christie, Scott Aaron, Filtration system.
  9. Fassel, Robert Scott; Christie, Scott Aaron, Filtration system.
  10. Fassel, Robert Scott; Christie, Scott Aaron, Filtration system.
  11. Ryan, Raymond F.; McNally, John H., Lateral-flow biohazard safety enclosure.
  12. Lanham, Gerry; Lanham, Kenneth E., Method and apparatus for filtering airborne contaminants.
  13. Hauville, Francois, Method and apparatus for operating ducted fumehoods with increased energy efficiency.
  14. Stanley G. Wiedmeyer ; Arthur A. Frigo ; Daniel Preuss ; Edward F. Bielick ; Richard F. Malecha, Method and apparatus for the clean replacement of contaminated HEPA filters.
  15. Maruyama, Fumiaki; Naito, Naoki; Uchiyama, Atsuo, Silicon wafer and a silicon epitaxial wafer having a polycrystal silicon layer formed on a major surface including boron concentration of the polycrystal silicon layer being 1×1015 atom/cm3 or less.
  16. Chuang, Tzu-Sou; Hwang, James Jeng-Jyi, Ultra-pure air system for nano wafer environment.
  17. Maruyama, Fumiaki; Naito, Naoki; Uchiyama, Atsuo, Wafer and epitaxial wafer, and manufacturing processes therefor.
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