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Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01L-007/00
  • G01M-003/02
  • C23F-001/02
출원번호 US-0957547 (1997-10-24)
발명자 / 주소
  • French
  • Jr. Norman L.
출원인 / 주소
  • Cypress Semiconductor Corp.
대리인 / 주소
    Daffer
인용정보 피인용 횟수 : 1  인용 특허 : 36

초록

An improved door closure indicator is provided. The indicator operates on pressure levels read within a pressurized chamber rather than from proximity switches coupled between the chamber and the door. If the door seals to the chamber, pressure within the chamber will quickly change, and the change

대표청구항

[ What is claimed is:] [1.] An apparatus for determining closure of a door, comprising:a chamber having first and second apertures extending into the chamber;a pressure delivery unit coupled to the first aperture; anda pressure monitor coupled in gaseous communication with the pressure delivery unit

이 특허에 인용된 특허 (36)

  1. Shioya Yoshimi (Yokohama JPX) Maeda Mamoru (Tama JPX) Ohyama Yasushi (Kodaira JPX) Takagi Mikio (Kawasaki JPX), Apparatus for plasma chemical vapor deposition.
  2. English Roe E. (Euless TX) Kilgore Michael A. (McKinney TX) Crone Jerry A. (Kaufman TX), Automated diagnostic system.
  3. Davis Cecil J. (Greenville TX) Johnson Randall E. (Carrollton TX) Spencer John E. (Plano TX), Automated plasma reactor.
  4. Houzay Francoise (Bagneux FRX) Moison Jean-Marie (Croissy/Seine FRX) Nissim Yves (Paris FRX), Autonomous container for the vacuum treatment of an object and its transfer lock.
  5. Nakayama Satoshi (Isehara JPX) Takeuchi Hideaki (Isehara JPX) Murota Junichi (Isehara JPX) Hurukado Tatuhiko (Hachioji JPX) Takeda Shigeru (Hamura JPX) Suzuki Masuo (Fussa JPX) Kurokawa Harushige (Hi, Chemical vapor deposition apparatus.
  6. Crabb Richard (Mesa AZ) Robinson McDonald (Paradise Valley AZ) Hawkins Mark R. (Mesa AZ) Goodwin Dennis L. (Tempe AZ) Ferro Armand P. (Scottsdale AZ) deBoer Wiebe B. (Eersel OR NLX) Ozias Albert E. (, Chemical vapor desposition system.
  7. Kunz Anton (Triesenberg LIX), Electrical current lead-in device at a vacuum chamber.
  8. Guarino Nicholas (Arlington MA) Onorio Gabriel (Gloucester MA) Ward Billy W. (Rockport MA), Evacuable chamber enclosing.
  9. Walde Michael (Rodenbach DEX) Zeidler Peter (Hanau DEX) Domroese Dirk (Bispingen-Behringen DEX), Installation for charging and discharging substrates out of a vacuum tank.
  10. Lazzari Jean-Pierre (Corenc FRX) Cortial Henri (Sassenage FRX), Installation for the storage and transfer of objects in a very clean atmosphere.
  11. Banholzer Thomas (San Jose CA) Marohl Dan (San Jose CA) Tepman Avi (Cupertino CA) Mintz Donald M. (Sunnyvale CA), Lid and door for a vacuum chamber and pretreatment therefor.
  12. Banholzer Thomas (San Jose CA) Marohl Dan (San Jose CA) Tepman Avi (Cupertino CA) Mintz Donald M. (Sunnyvale CA), Lid and door for a vacuum chamber and pretreatment therefor.
  13. Johnson Randall E. (Carrollton TX) Peters Louis E. (Dallas TX) Simmons Lowell E. (Garland TX), Low particulate vacuum chamber input/output valve.
  14. Clarke John R. (Cary NC), Method and apparatus for reducing particulate contamination in processing chambers.
  15. Cur Nihat O. (Royalton Township MI) Kirby David B. (St. Joseph Township ; both of Berrien County MI), Method and apparatus for testing vacuum insulation panel quality.
  16. Furukawa Heizaburo (Hiroshima JPX) Wake Kanji (Hiroshima JPX) Shimozato Yoshio (Hiroshima JPX) Yanagi Kenichi (Hiroshima JPX) Katoh Mitsuo (Hiroshima JPX) Wada Tetsuyoshi (Hiroshima JPX) Tsukiji Nori, Method and apparatus for vacuum deposition plating.
  17. Motta Antonino (Milan ITX), Method for decontamination of a chamber used in vacuum processes for deposition, etching and/or growth of high purity fi.
  18. Talieh Humoyoun (Santa Clara) Gilboa Haim (Palo Alto) Mintz Donald M. (Sunnyvale CA), Method for preparing a shield to reduce particles in a physical vapor deposition chamber.
  19. Carlson David K. (Santa Clara CA) Riley Norma B. (Pleasanton CA), Method for servicing vacuum chamber using non-reactive gas-filled maintenance enclosure.
  20. Chen Aihua (Sunnyvale CA) Chapman Robert A. (Sunnyvale CA), Method of purging and pumping vacuum chamber to ultra-high vacuum.
  21. Wang David N. (Cupertino CA) White John M. (Hayward CA) Law Kam S. (Union City CA) Leung Cissy (Union City CA) Umotoy Salvador P. (Pittsburg CA) Collins Kenneth S. (San Jose CA) Adamik John A. (San R, Plasma-enhanced CVD process using TEOS for depositing silicon oxide.
  22. Davis Cecil J. (Greenville TX) Freeman Dean W. (Garland TX) Matthews Robert T. (Plano TX) Tomlin Joel T. (Garland TX), Processing apparatus for wafers.
  23. Iizuka Kazuo (Yokohama JPX), Reticle conveying device.
  24. White John M. (Hayward CA), Single substrate vacuum processing apparatus having improved exhaust system.
  25. Ikeda Jiro (Shizuoka JPX), Sputtering apparatus.
  26. Blake Julian G. (Cambridge MA) Muka Richard S. (Topsfield MA) Younger Peter R. (Newton MA), Sputtering system.
  27. Crabb Richard (Mesa AZ) Robinson McDonald (Paradise Valley AZ) Hawkins Mark R. (Mesa AZ) Goodwin Dennis L. (Tempe AZ) Ferro Armand P. (Scottsdale AZ) deBoer Wiebe B. (Eersel OR NLX) Ozias Albert E. (, Substrate loading apparatus for a CVD process.
  28. Toshima Masato (Campbell CA), Vacuum chamber slit valve.
  29. Nakayama Izumi (Hiratsuka JPX) Suzuki Akitoshi (Chigasaki JPX) Nawa Hiroyuki (Chigasaki JPX) Kaneko Motohiro (Fujisawa JPX), Vacuum processing apparatus.
  30. Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Hildenbrand Randall C. (Richardson TX), Vacuum processing system.
  31. Takeuchi Noriyuki (Fujisawa JPX) Kajiyama Masaaki (Fujisawa JPX) Kondo Fumio (Fujisawa JPX) Matsumura Masao (Fujisawa JPX) Yoshioka Takeshi (Fujisawa JPX), Vacuum processing system.
  32. Mellink Willem F. (Eindhoven NLX) Janssen Peter J. G. M. (Nijmegen NLX) Zwier Jan (Eindhoven NLX) Lotterman Harm (Nijmegen NLX), Vacuum system.
  33. Weinberg Richard S. (Palo Alto CA), Vacuum vessel.
  34. Szalai Laszlo (Campbell CA), Valve closure mechanism for semiconductor deposition apparatus.
  35. Chrisos John M. (Beverly MA) Fowler ; Jr. Bertram F. (Danvers MA) Muka Richard S. (Topsfield MA), Wafer handling apparatus.
  36. Davis Cecil J. (Greenville TX) Loewenstein Lee M. (Plano TX) Matthews Robert T. (Plano TX) Jones John I. (Plano TX) Jucha Rhett B. (Celeste TX), Wafer processing apparatus and method.

이 특허를 인용한 특허 (1)

  1. Kurita,Shinichi; Lee,Ke Ling; Blonigan,Wendell T, Methods and apparatus for sealing an opening of a processing chamber.
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