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[미국특허] Treater systems and methods for generating moderate-to-high-pressure plasma discharges for treating materials and related treated materials 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H05H-001/00
출원번호 US-0947716 (1997-10-09)
발명자 / 주소
  • Spence Paul
  • Lynch John
출원인 / 주소
  • The University of Tennessee Research Corporation
대리인 / 주소
    Mendelsohn
인용정보 피인용 횟수 : 44  인용 특허 : 28

초록 ▼

Continuous-feed plasma treater systems are designed to treat continuous substrates, such as webs or films, by continuously feeding the substrates through an enclosure having a plasma discharge that alters the substrate's surface properties in some desirable fashion. According to the present inventio

대표청구항 ▼

[ What is claimed is:] [1.] A continuous-feed plasma treater system, comprising:(a) an enclosure;(b) one or more electrode assemblies housed within the enclosure;(c) a pressure control system adapted to control the pressure of a working gas within the enclosure within a range from about 10 Torr to a

이 특허에 인용된 특허 (28) 인용/피인용 타임라인 분석

  1. Tanisaki Tatsuzo (Onomichi JPX), Apparatus for atmospheric plasma treatment of a sheet-like structure.
    상세보기
  2. Behn Reinhard (Munich DEX) Heywang Hermann (Munich DEX) Pachonik Horst (Unterhaching DEX), Apparatus for generating layers on a carrier foil.
    상세보기
  3. Koyama Motoyasu (Kurashiki JPX) Teraoka Hidetoshi (Soja JPX) Akagi Takao (Kurashiki JPX) Yamaguchi Shinji (Kurashiki JPX) Sakamoto Itsuki (Hiroshima JPX) Namba Akira (Okayama JPX) Okagaki Isao (Okaya, Apparatus for plasma treatment of a sheet-like structure.
    상세보기
  4. Brown Robert W. (Ivanhoe AUX) Coopes Ian H. (Camberwell AUX) Fusca Joseph (Macleod West AUX) Gifkins Kenneth J. (Victoria AUX) Irvin John A. (Applecross AUX), Apparatus for plasma treatment of continuous material.
    상세보기
  5. Felts John T. (Alameda CA) Chatham ; III Hood (Fairfield CA) Countrywood Joseph (Napa CA) Nelson Robert J. (Walnut Creek CA), Apparatus for rapid plasma treatments and method.
    상세보기
  6. Yoshikawa Masato (No. 20-11 ; Takaidohigashi 2-chome Kodaira JPX) Kusano Yukihiro (No. 20-11 ; Takaidohigashi 2-chome Tokorozawa JPX) Niwa Hideyuki (No. 20-11 ; Takaidohigashi 2-chome Sayama JPX) Fuk, Apparatus for the continuous surface treatment of sheet material.
    상세보기
  7. Marie Bruno (Maurepas FRX) Guerin Daniel (Chelles FRX) Larquet Christian (Guyancourt FRX), Apparatus for the formation of excited or unstable gaseous molecules and uses of such an apparatus.
    상세보기
  8. Sando Yoshikazu (Wakayama JPX) Ishidoshiro Hiroshi (Wakayama JPX) Minakata Matsuo (Wakayama JPX) Goto Tokuju (Nara JPX), Apparatus for treating a textile product continuously with the use of low-temperature plasma.
    상세보기
  9. Imada, Kiyoshi; Ueno, Susumu; Nomura, Hirokazu; Tohkai, Masaie; Hata, Yoshitada; Kato, Kenichi, Continuous vacuum treating apparatus.
    상세보기
  10. Dinter Peter (Hallgarten DEX) Kolbe Andreas (Wiesbaden DEX), Corona device and method for using same.
    상세보기
  11. Ferrarini Ezio (Via Melotta ; 19 Soncino ; Cremona ITX), Corona effect surface treatment apparatus for sheet.
    상세보기
  12. Schuster Frdric (Saint Germain En Laye FRX) Piet Grard (Bezons FRX), Device for the continuous coating of a metallic material in motion with a polymer deposition having a composition gradie.
    상세보기
  13. Kumihashi Takao (Musashino JPX) Tsujimoto Kazunori (Higashiyamato JPX) Tachi Shinichi (Sayama JPX), Dry etching apparatus and method.
    상세보기
  14. Iwata Akinori (Osaka JPX) Moriyama Makoto (Osaka JPX) Kuwano Kouichi (Osaka JPX) Akutsu Kensuke (Osaka JPX) Ueki Koji (Osaka JPX) Tochizawa Ikuo (Hyogo JPX) Koge Hirohiko (Hiroshima JPX) Hara Takanor, Method and apparatus for corona discharge processing.
    상세보기
  15. Roth John Reece (Knoxville TN), Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof.
    상세보기
  16. Matsuda Koichi (Nara JPX) Kondo Takaharu (Tsuzuki-gun JPX) Miyamoto Yusuke (Tsuzuki-gun JPX), Method and apparatus for forming deposited film.
    상세보기
  17. Sando Yoshiteru (Wakayama JPX) Nakano Eiichi (Wakayama JPX) Ishidoshiro Hiroshi (Wakayama JPX) Sando Koji (Wakayama JPX), Method and apparatus for the pretreatment of a cloth.
    상세보기
  18. Doehler Joachim (Union Lake MI) Hudgens Stephen J. (Southfield MI) Ovshinsky Stanford R. (Bloomfield Hills MI) Dotter ; II Buddie (Utica MI) Peedin Lester R. (Oak Park MI) Krisko Jeffrey M. (Highland, Method of creating a high flux of activated species for reaction with a remotely located substrate.
    상세보기
  19. Glocker David A. (West Henrietta NY) Romach Mark M. (Rochester NY), Near atmospheric pressure treatment of polymers using helium discharges.
    상세보기
  20. Itoh Kenji (Kanagawa JPX), Plasma processing apparatus and plasma processing method.
    상세보기
  21. Otsubo Toru (Fujisawa JPX) Aiuchi Susumu (Yokohama JPX) Kamimura Takashi (Yokohama JPX) Noguchi Minoru (Yokohama JPX) Fujii Teru (Chigasaki JPX), Plasma processing method and apparatus for carrying out the same.
    상세보기
  22. Kokaku Yuichi (Yokohama JPX) Kitoh Makoto (Yokohama JPX) Honda Yoshinori (Fujisawa JPX), Plasma surface treatment method and apparatus.
    상세보기
  23. Kanai Masahiro (Tokyo JPX) Matsuyama Jinsho (Nagahama JPX) Nakagawa Katsumi (Nagahama JPX) Kariya Toshimitsu (Nagahama JPX) Fujioka Yasushi (Nagahama JPX) Takei Tetsuya (Naghama JPX) Echizen Hiroshi , Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable.
    상세보기
  24. Slootman Frank (Saint Cyr L\Ecole FRX) Bouard Pascal (Fontenay Le Fleury FRX) Coeuret Franois (Guyancourt FRX) Jouvaud Dominique (Paris FRX) Prinz Eckhard (Hamfelde DEX), Process for creating a deposit of silicon oxide on a traveling solid substrate.
    상세보기
  25. Slootman Frank (St Cyr L\Ecole FRX) Bouard Pascal (Draveil FRX), Process for producing a silicon oxide deposit on the surface of a metallic or metallized polymer substrate using corona.
    상세보기
  26. Gastiger Michel-Jacques (Orsay FRX) Slootman Franciscus (Le Chesnay FRX) Bouard Pascal (Draveil FRX) Willemot Antoine (Sceaux FRX), Process of depositing a layer of silicon oxide bonded to a substrate of polymeric material using high pressure and elect.
    상세보기
  27. Danilychev Vladimir A. (Irvine CA) Wakalopulos George (Pacific Palisades CA), Pulsed discharge surface treatment apparatus and process.
    상세보기
  28. Ueno Susumu (Ibaraki JPX) Kuroda Kouiti (Ibaraki JPX) Kitamura Hajime (Ichihara JPX) Tohkai Masaie (Ibaraki JPX) Kato Ken-ichi (Tokyo JPX) Hiraishi Nobuyuki (Katsuta JPX), Roll seal boxes for continuous vacuum treating apparatus.
    상세보기

이 특허를 인용한 특허 (44) 인용/피인용 타임라인 분석

  1. Buller, Benyamin; Lappas, Tasso; Korepanov, Sergey; Lappen, Alan Rick, Accurate three-dimensional printing.
    상세보기
  2. Kagoshima, Akira; Yamamoto, Hideyuki; Torii, Yoshimi; Usui, Tatehito, Apparatus and method for producing semiconductors.
    상세보기
  3. Buller, Benyamin; Milshtein, Erel; Seelinger, Sherman, Apparatuses, systems and methods for three-dimensional printing.
    상세보기
  4. Gabelnick, Aaron M.; Fox, Richard T.; Hu, Ing-Feng; Dinega, Dmitry P., Corona-generated chemical vapor deposition on a substrate.
    상세보기
  5. Lee, Sangheon; Choi, Dae-Han; Kim, Jisoo; Cirigliano, Peter; Huang, Zhisong; Charatan, Robert; Sadjadi, S. M. Reza, Critical dimension reduction and roughness control.
    상세보기
  6. Lee, Sangheon; Choi, Dae-Han; Kim, Jisoo; Cirigliano, Peter; Huang, Zhisong; Charatan, Robert; Sadjadi, S. M. Reza, Critical dimension reduction and roughness control.
    상세보기
  7. Iwamaru,Shunichi, Dielectric-coated electrode, plasma discharge treatment apparatus and method for forming thin film.
    상세보기
  8. dos Santos Pereira Ribeiro, Carlos Antonio, Laminate system, a process for the production thereof and use thereof.
    상세보기
  9. Selwyn, Gary S., Large area, atmospheric pressure plasma for downstream processing.
    상세보기
  10. Buynoski, Matthew S., Method for manufacturing a memory element.
    상세보기
  11. Tsai,Chang Hu, Method for reducing critical dimension and semiconductor etching method.
    상세보기
  12. Cocolios,Panayotis; Coeuret,Fran？ois; Forster,Franck; Gelot,Jean Louis; Martens,Bernd; Prinz,Eckhard; Rames Langlade,G？raldine; Villermet,Alain, Method for surface treatment of polymeric substrates.
    상세보기
  13. Jung, Hyun-Chul; Joung, Jae-Woo, Method for surface treatment of substrate and method for forming fine wiring.
    상세보기
  14. Chaleix, Daniel; Choquet, Patrick; Baravian, Gerard; Lacour, Bernard; Puech, Vincent, Method of cleaning the surface of a material coated with an organic substance and generator and device for carrying out said method.
    상세보기
  15. Chaleix, Daniel; Choquet, Patrick; Baravian, Gérard; Lacour, Bernard; Puech, Vincent, Method of cleaning the surface of a material coated with an organic substrate and a generator and device for carrying out said method.
    상세보기
  16. Lee, Mark S.; Chang, Keunsuk P., Method of making biaxially oriented polyolefin film for cold seal applications.
    상세보기
  17. Daniel Gelbart CA, Method of surface preparation using plasma in air.
    상세보기
  18. Richard R. Hammen ; Donald V. Rundberg, Multi-mode treater with internal air cooling system.
    상세보기
  19. Hales, Stephen J.; Alexa, Joel A.; Jensen, Brian J.; Cano, Roberto J.; Lillehei, Peter T., Nanoparticle hybrid composites by RF plasma spray deposition.
    상세보기
  20. Washebeck, Richard J.; Kleinschmidt, Robert A., Narrow web corona treater.
    상세보기
  21. Schaefer, Suzanne E.; Winsor, Jeremy Lee; Zeyn, Paul V., Ozone applicator and method for polymer oxidation.
    상세보기
  22. Padmapani C. Nallan ; Ajay Kumar ; Jeffrey D. Chinn, Plasma etching of silicon using a chlorine chemistry augmented with sulfur dioxide.
    상세보기
  23. Matsuura, Shin, Plasma processing apparatus, plasma processing method, and non-transitory computer-readable medium.
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  24. Takeuchi, Hiroaki; Okuda, Tohru, Plasma processing method.
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  25. O'Brien, Jeffrey J., Porous plasma treated sheet material.
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  26. Besson, Sophie; Duran, Maxime; Garre, Emmanuel; Gentilhomme, Carole; Viasnoff, Emilie; Victor, Corinne; Gay, Thierry, Process for depositing a thin layer and product obtained thereby.
    상세보기
  27. Roth, J. Reece, Remote exposure of workpieces using a plasma.
    상세보기
  28. J. Reece Roth, Remote exposure of workpieces using a recirculated plasma.
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  29. Powell,Don C., Semiconductor devices and methods for depositing a dielectric film.
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  30. Buller, Benyamin; Lappas, Tasso; Mendelsberg, Rueben; Lappen, Alan Rick, Skillful three-dimensional printing.
    상세보기
  31. Buller, Benyamin; Milshtein, Erel; Brezoczky, Thomas Blasius; Murphree, Zachary Ryan; Christiansen, Daniel; Lappen, Alan Rick, Skillful three-dimensional printing.
    상세보기
  32. Buller, Benyamin; Milshtein, Erel; Brezoczky, Thomas Blasius; Murphree, Zachary Ryan; Christiansen, Daniel; Lappen, Alan Rick, Skillful three-dimensional printing.
    상세보기
  33. Kalwara, Joseph J.; Fieldhouse, John W., Static dissipative release liner.
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  34. Chono,Yasuhiro, Substrate processing system and substrate processing method.
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  35. Ciliske, Scott L.; King, Gregory F.; Strobel, Mark A.; Getschel, Joel A.; Chien, Bert T., System for forming multi-layer films using corona treatments.
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  36. Buller, Benyamin; Milshtein, Erel; Brezoczky, Thomas Blasius; Christiansen, Daniel; Lappen, Alan Rick, Systems for three-dimensional printing.
    상세보기
  37. Blacker, Richard; Wang, Hong, Techniques for applying mar reducing overcoats to articles having layer stacks disposed thereon.
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  38. Maeda, Kikuo; Toda, Yoshiro; Fukazawa, Koji, Thin film forming apparatus.
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  39. Buller, Benyamin; Murphree, Zachary Ryan; Romano, Richard Joseph; Brezoczky, Thomas Blasius; Lappen, Alan Rick, Three-dimensional printing and three-dimensional printers.
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  40. Buller, Benyamin; Murphree, Zachary Ryan; Romano, Richard Joseph; Brezoczky, Thomas Blasius; Lappen, Alan Rick, Three-dimensional printing and three-dimensional printers.
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  41. Buller, Benyamin; Lappas, Tasso; Mendelsberg, Rueben; Korepanov, Sergey, Three-dimensional printing in real time.
    상세보기
  42. Buller, Benyamin; Murphree, Zachary Ryan, Three-dimensional printing systems and methods of their use.
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  43. Selwyn, Gary S.; Barnes, Matthew R.; Vidoli, Caterina; Vaz, Heathcliff L., Treatment of fibrous materials using atmospheric pressure plasma polymerization.
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  44. Jung, Suk-Won; Huh, Myung-Soo; Jang, Choel-Min, Vapor deposition apparatus, deposition method, and method of manufacturing organic light-emitting display apparatus by using the same.
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