초록 ▼

Process and apparatus controlling the cross-sectional flow distribution within a flowing stream such as a copper flux in an electrolytic copper deposition process. The flow distribution is controlled by a baffle comprised of two plates overlying one another, each having a set of openings, wherein th

Process and apparatus controlling the cross-sectional flow distribution within a flowing stream such as a copper flux in an electrolytic copper deposition process. The flow distribution is controlled by a baffle comprised of two plates overlying one another, each having a set of openings, wherein the openings in the two plates generally correspond to one another but are slightly offset therefrom or varied in size in a non-uniform way along the radius of the plates such as to effect a modification of the uniformity or non-uniformity of the velocity flow rates across the cross section of the flowing stream in which the baffle is interposed.

대표청구항 ▼

[ What is claimed:] [1.] In a method of treating a planar substrate wherein said treatment is effected by causing a material to flow toward said substrate from a location spaced therefrom, the improvement comprising:interposing between said location and said substrate a baffle for modifying the unif

[ What is claimed:] [1.] In a method of treating a planar substrate wherein said treatment is effected by causing a material to flow toward said substrate from a location spaced therefrom, the improvement comprising:interposing between said location and said substrate a baffle for modifying the uniformity of material flow in a plane parallel to said substrate, said baffle including at least two planar members disposed parallel to said substrate, each of said planar members having at least one opening therethrough, at least one of said planar members being independently movable within its respective plane, said movement and the disposition of said openings causing at least one such opening on one of said members to move selectively into and out of registry with an opening on the other of said members;adjusting said movable baffle plate to a predetermined position of registration between said openings, wherein the registration of openings on one of said plates with openings on the other of said plates is controllably varied with the radial position thereof; andcausing material to flow from said location toward said substrate and through said baffle, said baffle causing a redistribution of the flow rate of said material toward said substrate in the plane of said baffle and thereby effecting the uniformity of treatment thereof.