초록 ▼

A gas preheater for use in a CVI/CVD furnace that receives a reactant gas from a gas inlet, comprising a sealed baffle structure disposed within the furnace. The sealed baffle structure has a baffle structure inlet and baffle structure outlet. A sealed duct structure is disposed within the furnace,

A gas preheater for use in a CVI/CVD furnace that receives a reactant gas from a gas inlet, comprising a sealed baffle structure disposed within the furnace. The sealed baffle structure has a baffle structure inlet and baffle structure outlet. A sealed duct structure is disposed within the furnace, said sealed duct structure being sealed around the gas inlet and said baffle structure such that substantially all of the reaction gas received from the gas inlet is directed to and forced to flow through said sealed baffle structure to said baffle structure outlet.

대표청구항 ▼

[ What is claimed is:] [1.] A gas preheater for use in a CVI/CVD furnace that receives a reactant gas from a gas inlet, comprising:a sealed baffle structure disposed within the furnace, said sealed baffle structure having a baffle structure inlet and a baffle structure outlet; and,a sealed duct stru

[ What is claimed is:] [1.] A gas preheater for use in a CVI/CVD furnace that receives a reactant gas from a gas inlet, comprising:a sealed baffle structure disposed within the furnace, said sealed baffle structure having a baffle structure inlet and a baffle structure outlet; and,a sealed duct structure disposed within the furnace, said sealed duct structure being sealed around the gas inlet and said baffle structure inlet such that substantially all of the reactant gas received from the gas inlet is directed to and forced to flow through said sealed baffle structure to said baffle structure outlet, wherein the furnace comprises a susceptor that defines a susceptor wall, and a portion of said sealed baffle structure is exposed in close proximity to said susceptor wall.